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    EUV illumination system having a folding geometry
    51.
    发明申请
    EUV illumination system having a folding geometry 审中-公开
    EUV照明系统具有折叠几何形状

    公开(公告)号：US20080225258A1

    公开(公告)日：2008-09-18

    申请号：US12072592

    申请日：2008-02-27

    申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

    发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

    IPC分类号： G03B27/54

    CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

    摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

    摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    54.
    发明申请
    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置照明系统

    公开(公告)号：US20070024836A1

    公开(公告)日：2007-02-01

    申请号：US11460644

    申请日：2006-07-28

    申请人： Wolfgang Singer ,  Johannes Wangler

    发明人： Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70108 ,  G03F7/70158

    摘要： An Illumination system for a microlithographic projection exposure apparatus has a light source and a first optical raster element that is positioned in or in close proximity to a first plane. The first plane is conjugated to a pupil plane of the illumination system by Fourier transformation. A second optical raster element is positioned in or in close proximity to the pupil plane. A third optical raster element is positioned in or in close proximity to a second plane that is also conjugated to the pupil plane by Fourier transformation. The third optical raster element, which can be a diffractive optical element, introduces an additional degree of design freedom for the modification of the angular distribution of the projection light bundle.

    摘要翻译： 用于微光刻投影曝光装置的照明系统具有光源和位于第一平面中或紧邻第一平面的第一光栅元件。 第一平面通过傅里叶变换与照明系统的光瞳平面共轭。 第二光栅元件位于或靠近瞳孔平面。 第三光栅元件位于或接近第二平面，第二平面也通过傅里叶变换与光瞳平面共轭。 可以是衍射光学元件的第三光栅元件引入了用于修改投影光束的角分布的附加设计自由度。

    Illumination system of a microlithographic exposure apparatus
    58.
    发明授权
    Illumination system of a microlithographic exposure apparatus 有权
    微光刻曝光设备的照明系统

    公开(公告)号：US08134687B2

    公开(公告)日：2012-03-13

    申请号：US11660754

    申请日：2005-08-23

    申请人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

    发明人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70108 ,  G03F7/70183

    摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

    摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

    Illumination system having a nested collector for annular illumination of an exit pupil
    60.
    发明授权
    Illumination system having a nested collector for annular illumination of an exit pupil 失效
    具有用于出射光瞳的环形照明的嵌套收集器的照明系统

    公开(公告)号：US07312462B2

    公开(公告)日：2007-12-25

    申请号：US10930302

    申请日：2004-08-31

    申请人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

    发明人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

    IPC分类号： G03F7/20

    CPC分类号： B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70166

    摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.

    摘要翻译： 提供照明系统。 照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。 镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中 。