Self-aligned trimmed pole
    51.
    发明申请
    Self-aligned trimmed pole 失效
    自对准修边杆

    公开(公告)号:US20050168871A1

    公开(公告)日:2005-08-04

    申请号:US11091160

    申请日:2005-03-28

    IPC分类号: G11B5/31 G11B5/147

    摘要: A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.

    摘要翻译: 一种用于形成用于磁性写入头的修整的上极片的方法,所述极片在写间隙层上方和下方具有均匀的宽度。 使用离子束蚀刻将极片修剪到最终宽度的现有技术方法由于氧化铝写入间隙填充材料的耐蚀刻性质而产生具有厚度差异的极片。 本方法使用NiCr,NiFeCr或Ru作为写入间隙填充材料,其蚀刻速率基本上等于形成极片的其它层的蚀刻速率,并且具有高度耐腐蚀性。

    GMR configuration with enhanced spin filtering
    52.
    发明授权
    GMR configuration with enhanced spin filtering 失效
    GMR配置与增强的自旋过滤

    公开(公告)号:US06770382B1

    公开(公告)日:2004-08-03

    申请号:US09443447

    申请日:1999-11-22

    IPC分类号: G11B5127

    摘要: A Spin Valve GMR and Spin Filter SVGMR configuration where in the first embodiment an important buffer layer is composed of an metal oxide having a crystal lattice constant that is close the 1st FM free layer's crystal lattice constant and has the same crystal structure (e.g., FCC, BCC, etc.). The metal oxide buffer layer enhances the specular scattering. The spin valve giant magnetoresistance (SVGMR) sensor comprises: a seed layer over the substrate. An important metal oxide buffer layer (buffer layer) over the seed layer. The metal oxide layer preferably is comprised of NiO or alpha-Fe2O3. A free ferromagnetic layer over the metal oxide layer. A non-magnetic conductor spacer layer over the free ferromagnetic layer. A pinned ferromagnetic layer (2nd FM pinned) over the non-magnetic conductor spacer layer and a pinning material layer over the pinned ferromagnetic layer. In the second embodiment, a high conductivity layer (HCL) is formed over the buffer layer to create a spin filter -SVGMR. The HCL layer enhances the GMR ratio of the spin filter SVGMR. The third embodiment is a pinned FM layer comprised of a three layer structure of an lower AP layer, a spacer layer (e.g., Ru) and an upper AP layer.

    摘要翻译: 自旋阀GMR和自旋滤波器SVGMR配置,其中在第一实施例中,重要的缓冲层由具有接近第1个FM自由层的晶格常数的晶格常数的金属氧化物组成并且具有相同的晶体结构 例如FCC,BCC等)。 金属氧化物缓冲层增强了镜面散射。 自旋阀巨磁阻(SVGMR)传感器包括:衬底上的种子层。 种子层上重要的金属氧化物缓冲层(缓冲层)。 金属氧化物层优选由NiO或α-Fe2O3组成。 在金属氧化物层上的自由铁磁层。 在自由铁磁层上的非磁性导体间隔层。 在非磁性导体间隔层上方的钉扎铁磁层(第二个FM被钉住)和钉扎铁磁层上的钉扎材料层。 在第二实施例中,在缓冲层上形成高电导率层(HCL)以产生自旋滤波器-SVGMR。 HCL层增强了旋转过滤器SVGMR的GMR比。 第三实施例是由下AP层,间隔层(例如Ru)和上AP层组成的三层结构的钉扎FM层。

    Low resistance conductor leads for GMR heads
    53.
    发明授权
    Low resistance conductor leads for GMR heads 失效
    低电阻导体,用于GMR磁头

    公开(公告)号:US06706421B1

    公开(公告)日:2004-03-16

    申请号:US09483937

    申请日:2000-01-18

    IPC分类号: B32B1501

    摘要: A lead structure for use with a magneto-resistive sensing element in a magnetic disk system is described. The lead structure comprises a layer of ruthenium or rhodium sandwiched between layers of a nickel-chromium alloy. The lower nickel-chromium layer acts as a seed layer to ensure that the ruthenium and rhodium layers have crystal structures that correspond to low resistivity phases. The interfaces between these three layers introduce a minimum of interfacial scattering of the conduction electrons thereby keeping dimensional increases in resistivity to a minimum.

    摘要翻译: 描述了与磁盘系统中的磁阻感测元件一起使用的引线结构。 引线结构包括夹在镍 - 铬合金层之间的钌或铑层。 较低的镍 - 铬层用作种子层,以确保钌和铑层具有对应于低电阻率相的晶体结构。 这三层之间的界面引入了导电电子的最小的界面散射,从而将电阻率的尺寸增加保持在最小。

    Method to make a stitched writer for a giant magneto-resistive head
    55.
    发明授权
    Method to make a stitched writer for a giant magneto-resistive head 失效
    为巨型磁阻头制作缝合笔记的方法

    公开(公告)号:US06469874B1

    公开(公告)日:2002-10-22

    申请号:US09523993

    申请日:2000-03-13

    IPC分类号: G11B5127

    摘要: A high data-rate stitched pole inductive magnetic write head incorporating a non-magnetic spacer layer and a magnetic pole yoke that is recessed from the magnetic pole tip. Said spacer layer is deposited as part of a self-aligned, patterned photoresist process, wherein the spacer layer is deposited first and the P2 portion of the upper pole assembly is then plated over it to form the pole tip configuration. Increasing the thickness of the spacer layer, while keeping it within a specified tolerance range, allows the upper stitched P3 portion of the pole piece to be recessed relative to the tip of P2. The spacer layer shortens throat height, reduces saturation write current, and improves overwrite and side erasure performance.

    摘要翻译: 包含非磁性间隔层的高数据速率缝合磁极感应磁性写入头和从磁极尖端凹入的磁极轭。 所述间隔层沉积为自对准的图案化光刻胶工艺的一部分,其中首先沉积间隔层,然后将上极组件的P2部分电镀在其上以形成极尖构型。 增加间隔层的厚度,同时将其保持在规定的公差范围内,允许极片的上缝合P3部分相对于P2的尖端凹入。 间隔层缩短喉部高度,降低饱和写入电流,并提高覆盖和侧面擦除性能。

    Method of fabrication of striped magnetoresistive (SMR) and dual stripe magnetoresistive (DSMR) heads with anti-parallel exchange configuration
    56.
    发明授权
    Method of fabrication of striped magnetoresistive (SMR) and dual stripe magnetoresistive (DSMR) heads with anti-parallel exchange configuration 失效
    具有反并联交换配置的带状磁阻(SMR)和双条磁阻(DSMR)头的制造方法

    公开(公告)号:US06430015B2

    公开(公告)日:2002-08-06

    申请号:US09773743

    申请日:2001-02-02

    IPC分类号: G11B539

    摘要: A longitudinally magnetically biased dual stripe magnetoresistive (DSMR) sensor element comprises a first patterned magnetoresistive (MR) layer. There are contacts at the opposite ends of the patterned magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer, each of the stacks including a first Anti-Ferro-Magnetic (AFM) layer and a first lead layer. With the first MR layer in place the device was annealed in the presence of a longitudinal external magnetic field. A second patterned magnetoresistive (MR) layer was formed above the previous structure. There are contacts at the opposite ends of the second patterned magnetoresistive (MR) layer with a second pair of stacks defining a second track width of the second patterned magnetoresistive (MR) layer. Each of the second pair of stacks includes spacer layer is composed of a metal, a Ferro-Magnetic (FM) layer, a second Anti-Ferro-Magnetic (AFM) layer and a second lead layer. With the second MR layer in place, the device was annealed in the presence of a second longitudinal external magnetic field.

    摘要翻译: 纵向磁偏置双条磁阻(DSMR)传感器元件包括第一图案化磁阻(MR)层。 在图案化磁阻(MR)层的相对端处存在触点,第一对叠层限定第一磁阻(MR)层的轨道宽度,第一对堆叠限定第一磁阻(MR)的磁道宽度, 层,每个堆叠包括第一抗铁磁(AFM)层和第一引线层。 在第一MR层就位的情况下,器件在存在纵向外部磁场的情况下退火。 在先前结构之上形成第二图案化磁阻(MR)层。 在第二图案化磁阻(MR)层的相对端具有限定第二图案化磁阻(MR)层的第二磁道宽度的第二对叠层的触点。 第二对堆叠中的每一个包括间隔层由金属,铁磁(FM)层,第二抗铁磁(AFM)层和第二引线层组成。 在第二MR层就位的情况下,器件在第二纵向外部磁场的存在下退火。

    Method of manufacture of a composite shared pole design for magnetoresistive merged heads
    57.
    发明授权
    Method of manufacture of a composite shared pole design for magnetoresistive merged heads 失效
    用于磁阻合并头的复合共轭极设计方法

    公开(公告)号:US06393692B1

    公开(公告)日:2002-05-28

    申请号:US09283840

    申请日:1999-04-01

    IPC分类号: H04R3100

    摘要: A merged read/write magnetic recording head comprises a low magnetic moment first magnetic shield layer over a substrate. A read gap layer with a magnetoresistive head is formed over the first shield layer. A shared pole comprises a low magnetic moment second magnetic shield layer plated on a sputtered seed PLM layer over the read gap layer, a non-magnetic layer plated over the PLM layer and a HMM lower pole layer plated over the second magnetic shield layer. A write gap layer is formed over the first high magnetic moment pole layer of the shared pole. An upper pole comprises a high magnetic moment pole layer over the write gap layer.

    摘要翻译: 合并的读/写磁记录头包括在衬底上的低磁矩第一磁屏蔽层。 在第一屏蔽层上形成具有磁阻头的读取间隙层。 共享极包括电镀在读取间隙层上的溅射种子PLM层上的低磁矩第二磁屏蔽层,镀在PLM层上的非磁性层和镀在第二磁屏蔽层上的HMM下极层。 在共享极的第一高磁矩极点上形成写间隙层。 上极包括写间隙层上的高磁矩极点层。

    Single stripe magnetoresistive (MR) head
    58.
    发明授权
    Single stripe magnetoresistive (MR) head 失效
    单条磁阻(MR)头

    公开(公告)号:US06373667B1

    公开(公告)日:2002-04-16

    申请号:US09637208

    申请日:2000-08-14

    IPC分类号: G11B5127

    摘要: A method for fabricating a soft adjacent layer (SAL) magnetoresistive (MR) sensor element and several soft adjacent layer (SAL) magnetoresistive (MR) sensor elements which may be fabricated employing the method. There is first provided a substrate. There is formed over the substrate a dielectric layer, where the dielectric layer has a first surface of the dielectric layer and a second surface of the dielectric layer opposite the first surface of the dielectric layer. There is also formed over the substrate a magnetoresistive (MR) layer contacting the first surface of the dielectric layer. There is also formed over the substrate a soft adjacent layer (SAL), where the soft adjacent layer (SAL) has a first surface of the soft adjacent layer (SAL) and a second surface of the soft adjacent layer (SAL). The first surface of the soft adjacent layer (SAL) contacts the second surface of the dielectric layer. Finally, there is also formed over the substrate a transverse magnetic biasing layer, where the transverse magnetic biasing layer contacts the second surface of the soft adjacent layer (SAL), and where at least one of the dielectric layer, the magnetoresistive (MR) layer, the soft adjacent layer (SAL) and the transverse magnetic biasing layer is a patterned layer formed employing an etch mask which serves as a lift-off stencil for forming a patterned second dielectric layer adjoining an edge of the patterned layer. The invention also contemplates a soft adjacent layer (SAL) magnetoresistive (MR) sensor element formed with the magnetoresistive (MR) layer interposed between the substrate and the soft adjacent layer (SAL). Similarly, the invention also contemplates a soft adjacent layer (SAL) magnetoresistive (MR) sensor element employing a transverse magnetic biasing layer formed of a hard bias permanent magnet material.

    摘要翻译: 一种用于制造软相邻层(SAL)磁阻(MR)传感器元件和若干软相邻层(SAL)磁阻(MR))传感器元件的方法,其可以使用该方法制造。 首先提供基板。 在衬底上形成介电层,其中电介质层具有电介质层的第一表面和电介质层与电介质层的第一表面相对的第二表面。 还在衬底上形成与电介质层的第一表面接触的磁阻(MR)层。 还在衬底上形成软相邻层(SAL),其中软相邻层(SAL)具有软相邻层(SAL)的第一表面和软相邻层(SAL)的第二表面。 软相邻层(SAL)的第一表面接触电介质层的第二表面。 最后,还在衬底上形成横向磁偏置层,横向磁偏置层接触软相邻层(SAL)的第二表面,并且其中介电层,磁阻(MR)层中的至少一个 ,软相邻层(SAL)和横向磁偏置层是使用蚀刻掩模形成的图案层,其用作用于形成与图案化层的边缘相邻的图案化的第二介电层的剥离模板。 本发明还考虑了由介于基板和软相邻层(SAL)之间的磁阻(MR)层形成的软相邻层(SAL)磁阻(MR)传感器元件。 类似地,本发明还考虑使用由硬偏磁永磁材料形成的横向磁偏置层的软相邻层(SAL)磁阻(MR)传感器元件。

    High ion beam etch selectivity for partial pole trim application
    59.
    发明授权
    High ion beam etch selectivity for partial pole trim application 失效
    高离子束蚀刻选择性用于部分极细修补应用

    公开(公告)号:US06243939B1

    公开(公告)日:2001-06-12

    申请号:US09412630

    申请日:1999-10-04

    IPC分类号: G11B542

    摘要: A method of manufacturing a magnetic transducer structure using a special pole etch using an IBE preferably with Kr or Xe, and a write gap material with a high IBE etch rate such as Ta, NiCu alloys, Pd, Pd—Cu alloys. A first layer of pole material and a write gap insulating layer are formed over the substrate. The write gap layer is composed of a material having a high ion beam etch rate compared to the first and second layers of pole material. The write gap insulating layer is preferably composed of Ni—Cu alloy, Pd, Pd—Cu alloys. Next, a second layer of pole material is formed on the first insulating layer. In a key step, we ion beam etch (IBE) the second pole; the write gap insulating layer and the first layer; the second pole serving as an etch mask during the ion beam etching to form a head. In a second preferred embodiment of the invention, the ion beam etching performed using a gas of Kr or Xe. The invention teaches a high IBE etch selectivity from the write gap dielectric to the upper pole (NeFe) for partial pole trim (PPT) applications by three embodiments: (a) selecting high IBE rate gap dielectric materials (e.g., NiCu alloys, Pd, and Pd—Cu alloys, (b) using an IBE gas Kr or Xr or both, instead of Ar, and (c) both (a) and (b).

    摘要翻译: 使用优选用Kr或Xe的IBE制造使用特殊极蚀刻的磁换能器结构的方法以及具有高IBE蚀刻速率的写间隙材料,例如Ta,NiCu合金,Pd,Pd-Cu合金。 第一层极材料层和写间隙绝缘层形成在衬底上。 写间隙层由与第一和第二极材料层相比具有高离子束蚀刻速率的材料组成。 写间隙绝缘层优选由Ni-Cu合金,Pd,Pd-Cu合金构成。 接下来,在第一绝缘层上形成第二极极材料层。 在关键的一步中,我们离子束蚀刻(IBE)是第二极; 写间隙绝缘层和第一层; 第二极在离子束蚀刻期间用作蚀刻掩模以形成头部。 在本发明的第二优选实施例中,使用Kr或Xe的气体进行离子束蚀刻。 本发明通过三个实施例教导了从写间隙电介质到上极(NeFe)的高IBE蚀刻选择性:(a)选择高IBE速率间隙电介质材料(例如,NiCu合金,Pd, 和Pd-Cu合金,(b)使用IBE气体Kr或Xr或两者代替Ar,和(c)(a)和(b)两者。