公开(公告)号：US20210193344A1

公开(公告)日：2021-06-24

申请号：US17077172

申请日：2020-10-22

申请人： Gigaphoton Inc.

发明人： Masahiko ANDO

IPC分类号： G21K1/06 ,  G02B19/00 ,  G02B5/08 ,  G02B1/14 ,  H05G2/00 ,  G03F7/20

摘要： An extreme ultraviolet light condensation mirror includes a substrate, and a multi-layer reflective film provided on the substrate, formed by alternately stacking an amorphous silicon layer and a layer having a refractive index different from a refractive index of the amorphous silicon layer, and configured to reflect extreme ultraviolet light, a layer on a most surface side in the multi-layer reflective film being the amorphous silicon layer containing a silicon atom bonded with a cyano radical.

公开(公告)号：US11039802B2

公开(公告)日：2021-06-22

申请号：US16281189

申请日：2019-02-21

申请人： Siemens Healthcare GmbH

发明人： Andrea Deutinger

IPC分类号： A61B6/00 ,  G21K1/02 ,  G21K1/06 ,  G02B5/18 ,  G01N23/083

摘要： In a method for producing a microstructure component, which is used in particular as an x-ray phase contrast grating in an x-ray device, a material absorbing x-rays is poured into a mold able at least to be deformed about one bending axis, which is formed by a silicon substrate and which has a plurality of cutouts running in a direction of the thickness of the silicon substrate with dimensions in the micrometer range. The mold into which the material is poured is heated up to a working temperature value lying above the room temperature and below a melting temperature value of the material which is poured into it and is formed into a final contour as per specifications.

公开(公告)号：US11026643B2

公开(公告)日：2021-06-08

申请号：US16463857

申请日：2017-11-30

申请人： KONINKLIJKE PHILIPS N.V.

发明人： Roland Proksa ,  Thomas Koehler

IPC分类号： A61B6/00 ,  A61B6/03 ,  G21K1/06

摘要： An interferometer grating support (118) of an imaging system (100) configured for grating-based x-ray imaging includes at least two elongate supports (302) separated from each other by a non-zero distance, wherein the at least two elongate supports have a first end (312) and a second end (316). The grating support further includes a first arc shaped grating (202) affixed to the first end and a second arc shaped grating (204) affixed to a second end (316). A non-transitory computer readable medium is configured with computer executable instructions which when executed by a processor of a computer cause the processor to: move a grating support, which supports G0 and G1 gratings of an interferometer and a bowtie filter, into a region between a low energy photon filter and a beam collimator, which are between a radiation source and an examination region, for a grating-based x-ray imaging scan.

公开(公告)号：US20210149093A1

公开(公告)日：2021-05-20

申请号：US17162439

申请日：2021-01-29

申请人： Carl Zeiss SMT GmbH

发明人： Claudia EKSTEIN ,  Holger MALTOR

IPC分类号： G02B5/08 ,  C22C9/00 ,  C22C32/00 ,  C22C21/00 ,  C22C29/00 ,  C22C1/05 ,  C22C14/00 ,  C22C21/12 ,  G21K1/06

摘要： Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer (6) is preferably provided on a polishing layer (3) of the substrate (1) of the EUV mirror (5).

公开(公告)号：US10976273B2

公开(公告)日：2021-04-13

申请号：US16226467

申请日：2018-12-19

申请人： Sigray, Inc.

发明人： Wenbing Yun ,  Srivatsan Seshadri ,  Janos Kirz ,  Sylvia Jia Yun Lewis

IPC分类号： G01N23/207 ,  G01N23/087 ,  G01N23/223 ,  G21K1/06 ,  H01J35/08 ,  H01J35/14 ,  H01J35/18

摘要： An x-ray spectrometer system includes an x-ray source, an x-ray optical system, a mount, and an x-ray spectrometer. The x-ray optical system is configured to receive, focus, and spectrally filter x-rays from the x-ray source to form an x-ray beam having a spectrum that is attenuated in an energy range above a predetermined energy and having a focus at a predetermined focal plane.

公开(公告)号：US20210065924A1

公开(公告)日：2021-03-04

申请号：US17097770

申请日：2020-11-13

申请人： Joyoni Dey ,  Narayan Bhusal ,  Leslie Butler ,  Jonathan P. Dowling ,  Kyungmin Ham ,  Varshni Singh

发明人： Joyoni Dey ,  Narayan Bhusal ,  Leslie Butler ,  Jonathan P. Dowling ,  Kyungmin Ham ,  Varshni Singh

IPC分类号： G21K1/06 ,  G01N23/041

摘要： A phase contrast X-ray imaging system includes: an illumination source adapted to illuminate a region of interest; a diffraction grating adapted to receive illumination from the illuminated region of interest, the diffraction grating comprising a spatial structure having a first periodicity superimposed with a second periodicity that is different from the first periodicity; and a detector adapted to detect illumination passing through the diffraction grating, wherein the spatial structure is defined by varying height and/or pitch, and wherein the spatial structure imparts a first phase dependence based on the first periodicity and an additional phase dependence based on the second periodicity on the illumination passing through the diffraction grating.

公开(公告)号：US20210065923A1

公开(公告)日：2021-03-04

申请号：US16644178

申请日：2018-08-24

申请人： KONINKLIJKE PHILIPS N.V.

发明人： THOMAS KOEHLER

IPC分类号： G21K1/06 ,  G01N23/041 ,  G01N23/20008 ,  A61B6/00

摘要： The present invention relates to a grating for X-ray phase contrast and/or dark-field imaging. It is described to form a photo-resist layer on a surface of a substrate. The photo-resist layer is illuminated with radiation using a mask representing a desired grating structure. The photo-resist layer is etched to remove parts of the photo-resist layer, to leave a plurality of trenches that are laterally spaced from one across the surface of the substrate. A plurality of material layers are formed on the surface of the substrate. Each layer is formed in a trench. A material layer comprises a plurality of materials, wherein the plurality of materials are formed one on top of the other in a direction perpendicular to the surface of the substrate. The plurality of materials comprises at least one material that has a k-edge absorption energy that is higher than the k-edge absorption energy of Gold and the plurality of materials comprises Gold.

公开(公告)号：US20210059035A1

公开(公告)日：2021-02-25

申请号：US16835708

申请日：2020-03-31

申请人： Samsung Electronics Co., Ltd.

发明人： Sunghyup KIM ,  Ho YU ,  Jeonggil KIM ,  Minseok CHOI

IPC分类号： H05G2/00 ,  G21K1/06 ,  G03F7/20

摘要： A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US10928734B2

公开(公告)日：2021-02-23

申请号：US16579398

申请日：2019-09-23

申请人： Carl Zeiss SMT GmbH

发明人： Michael Patra

IPC分类号： G03F7/20 ,  G02B5/02 ,  G02B5/08 ,  G02B6/10 ,  G02B17/06 ,  G02B27/28 ,  G21K1/06 ,  H01S3/09

摘要： An optical assembly guides an output beam of a free electron laser to a downstream illumination-optical assembly of an EUV projection exposure apparatus. The optical assembly has first and a second GI mirrors, each with a structured reflection surface to be impinged upon by the output beam. A first angle of incidence on the first GI mirror is between one mrd and 10 mrad. A maximum first scattering angle is produced, amounting to between 50% and 100% of the first angle of incidence. A second angle of incidence on the second GI mirror is at least twice as large as the first angle of incidence. A maximum second scattering angle of the output beam amounts to between 30% and 100% of the second angle of incidence. The two planes of incidence on the two GI mirrors include an angle with respect to one another that is greater than 45°.

公开(公告)号：US10908100B2

公开(公告)日：2021-02-02

申请号：US16140261

申请日：2018-09-24

申请人： The Boeing Company

发明人： Morteza Safai

IPC分类号： G01N23/203 ,  G01N23/20008 ,  G21K1/06

摘要： Disclosed herein is an apparatus for forming an x-ray beam. The apparatus comprises a plurality of links pivotably coupled together, in an end-to-end manner, to form a continuous loop. The plurality of links comprises two or more links configured to block a transmission of an x-ray emission. The plurality of links also comprises at least one link comprising an aperture that is configured to allow only a portion of the x-ray emission to pass through the aperture.