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公开(公告)号：US20230415205A1
公开(公告)日：2023-12-28
申请号：US17848394
申请日：2022-06-24
发明人： Kota TOKUBI
CPC分类号： B08B3/026 , B08B13/00 , B08B2203/0223 , B08B2203/027
摘要： A washing device includes a motor having a shaft, a battery electrically connected to the motor, and a pump driven by the motor. The pump is adapted to pressurize a liquid. The pump is disposed on the motor so that the motor is disposed between the pump and a ground.
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公开(公告)号：US11853020B2
公开(公告)日：2023-12-26
申请号：US17132774
申请日：2020-12-23
发明人： Hyunyong Choi , Weonhee Lee , Woosung Chung
摘要： Disclosed herein is a display apparatus. The display apparatus includes a housing, a display configured to protrude out from the housing along a vertical axis, a lifting device configured to raise and to lower the display along the vertical axis with respect to the housing, and a position sensor disposed inside the housing and configured to sense a distance in which an upper portion of the display is moved along the vertical axis. The position sensor includes a first position sensor and a second position sensor spaced apart along a horizontal axis. The first position sensor and the second position sensor simultaneously sense a distance by which the display is raised.
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公开(公告)号：US20230405642A1
公开(公告)日：2023-12-21
申请号：US18192279
申请日：2023-03-29
发明人： Shan Hu , Peter D'Elia , Ronald Nasman
CPC分类号： B08B3/02 , H01L21/67028 , B08B2203/007 , B08B13/00 , F26B5/005 , H01L21/02057
摘要： Improved processing systems and methods are provided for wet and dry processing of a semiconductor wafer. Provided is an enclosed chamber for processing a semiconductor wafer within a processing space and a drainage system for directing processing fluids out of the processing space. The enclosed chamber includes a top plate and a bottom plate, which physically confine the processing fluids within a relatively small, enclosed processing space. This forces the processing fluids to flow radially across the wafer surface(s) without the need to rotate the wafer. The drainage system contains a conduit that is downstream from the processing space and configured to retain a portion of a processing fluid dispensed within the processing space. The portion retained within the conduit provides a pressure resistance against the processing fluid(s) dispensed within the processing space to improve wet and dry processing of the wafer surfaces.
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公开(公告)号：US20230405169A1
公开(公告)日：2023-12-21
申请号：US18325187
申请日：2023-05-30
发明人： Hao-Yu Cheng
CPC分类号： A61L2/22 , A61L2202/26 , B08B7/02 , B08B3/08 , B08B7/04 , B08B13/00 , A61L2/202 , A61L2/26 , A61L2202/17 , A61L2202/11 , A61L2202/122 , A61L2202/123 , A61L2202/15 , A61L2202/14 , B08B5/02
摘要： A helmet cleaning, sterilization, deodorization and drying system includes a main body, an ultraviolet lamp module, a fog generator, a warm air generator, a first exhaust module, a controlling system module, a helmet cleaning and sterilization compartment, a containing space, a cleaning liquid tank and a gas conduit. The controlling system module is electrically connected to the ultraviolet lamp module, the fog generator, the warm air generator and the first exhaust module. The helmet sterilization cleaning compartment is located in the main body and includes a storage space, a plate and a ventilation hole. The storage space is used for placing the helmet. The plate is located on the bottom of the storage space. The ventilation hole is located on the plate. The containing space is located in the main body. The cleaning liquid tank is used for containing the antibacterial fog cleaning liquid.
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公开(公告)号：US11845028B2
公开(公告)日：2023-12-19
申请号：US17557804
申请日：2021-12-21
申请人： Spraying Systems Co.
发明人： Joseph P. Szczap
CPC分类号： B01D41/04 , B08B9/023 , B08B9/0321 , B08B9/0323 , B08B13/00 , B08B2209/032
摘要： A system for cleaning filter cartridges having a cylindrically configured filter media. The cleaning system includes a tank for containing a cleaning liquid, and an open-sided cage for removably receiving and containing one of the filter cartridges to be cleaned. The cage is supported on a drive shaft of a motorized drive that is positionable for disposing the open-sided cage and filter cartridge contained therein in cleaning liquid in the tank and is selectively operable for rotating the open-sided cage and filter cartridge contained therein during a cleaning cycle for cleaning the filter media of the contained filter cartridge.
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公开(公告)号：US20230390813A1
公开(公告)日：2023-12-07
申请号：US17833814
申请日：2022-06-06
发明人： Yi Chen HO , Chih Ping LIAO , Ker-hsun LIAO , Chi-Hsun LIN
CPC分类号： B08B9/0321 , B08B13/00 , B08B2209/032
摘要： A method of cleaning includes placing a semiconductor device manufacturing tool component made of quartz on a support. A cleaning fluid inlet line is attached to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component. A cleaning fluid is applied to the semiconductor device manufacturing tool component by introducing the cleaning fluid through the cleaning fluid inlet line and the tubular quartz projection.
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公开(公告)号：US20230382046A1
公开(公告)日：2023-11-30
申请号：US18010133
申请日：2022-02-16
发明人： Jens TRÄGER
CPC分类号： B29C64/35 , B33Y40/20 , B08B3/104 , B08B13/00 , B08B3/08 , B08B3/14 , C11D11/0035 , C11D3/43
摘要： The invention relates to: an apparatus (1) for the post-cleaning of 3D objects (90), which are printed from a light-curing resin formulation and comprise uncured residues of the resin formulation which adhere to the surface and have non-translucent and insoluble particles; and the use of a corresponding apparatus. The apparatus (1) comprises a cleaning chamber (2), which can be filled with a liquid cleaning agent (20) and has an agitator (5), for receiving the 3D object (90) to be cleaned, wherein a contamination detector (8), which is connected to a control unit (11) and determines the optical density of the cleaning agent (20), is provided for checking the remaining cleaning capacity of the cleaning agent (20), wherein the contamination detector (8) is located in an area kept free of non-translucent and insoluble particles above a predefined size in the cleaning agent (20). The determined optical density is used to determine the cleaning capacity of the cleaning agent (20).
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公开(公告)号：US20230366126A1
公开(公告)日：2023-11-16
申请号：US18142117
申请日：2023-05-02
申请人： Gerald Henrici
发明人： Gerald Henrici
摘要： The present invention relates to a process and apparatus to inspect and clean orifices found on extrusion dies, spinnerets and other objects having small holes. Orifices are microscope imaged and digitally measured, and if required the invention performs non-contact orifice cleaning using carbon dioxide dry ice particles.
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公开(公告)号：US20230338798A1
公开(公告)日：2023-10-26
申请号：US17980768
申请日：2022-11-04
申请人： Jarrod A. Souza , Gerardo Alvarado
发明人： Jarrod A. Souza , Gerardo Alvarado
CPC分类号： A63B57/60 , A47K10/025 , B08B1/006 , B08B13/00 , A63B55/408
摘要： A towel system and method are provided that allow at least first and second towel portions of a main towel of the system to be quickly and easily distinguished from one another to enable the user to assign different purposes to the different towel portions. A differentiation mechanism of the system differentiates the towel portions from one another to allow a user of the system to readily differentiate the first towel portion from the second towel portion to facilitate different uses of the towel portions. At least a first quick attachment and detachment (attachment/detachment) feature of the system is secured to the main towel at a preselected location of the main towel. A towel system attachment mechanism is secured to the main towel and is configured to be removably attached to an external structure or device to allow the system to be removably attached to the external device or structure.
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60.发明授权公开(公告)号：US11798793B2
公开(公告)日：2023-10-24
申请号：US17583224
申请日：2022-01-25
发明人： Satoshi Ohuchida , Koki Mukaiyama , Yusuke Wako , Maju Tomura , Yoshihide Kihara
CPC分类号： H01J37/32724 , B08B3/08 , B08B5/00 , B08B13/00 , H01L21/0206 , H01L21/31138 , H01L21/31144 , H01J2237/334
摘要： A substrate processing method includes: (a) disposing a substrate on a substrate support provided in a chamber of a substrate processing apparatus; (b) supplying a processing gas including hydrogen fluoride gas into the chamber; (c) controlling a temperature of the substrate support to a first temperature, and a pressure of the hydrogen fluoride gas in the chamber to a first pressure; and (d) controlling the temperature of the substrate support to a second temperature, and the pressure of the hydrogen fluoride gas in the chamber to a second pressure. In a graph with a horizontal axis indicating a temperature and a vertical axis indicating a pressure, the first temperature and the first pressure are positioned in a first region above an adsorption equilibrium pressure curve of hydrogen fluoride, and the second temperature and the second pressure are positioned in a second region below the adsorption equilibrium pressure curve.
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