公开(公告)号：US20120270159A1

公开(公告)日：2012-10-25

申请号：US13450867

申请日：2012-04-19

Applicant: Tomohiro Kobayashi ,  Takeshi Kinsho ,  Akihiro Seki ,  Kentaro Kumaki

Inventor： Tomohiro Kobayashi ,  Takeshi Kinsho ,  Akihiro Seki ,  Kentaro Kumaki

IPC: G03F7/20

CPC classification number: G03F7/0395 ,  G03F7/0397 ,  G03F7/203 ,  G03F7/2041 ,  G03F7/325

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer comprising recurring units having an acid labile group-protected carboxyl group and recurring units having a lactone structure displays a high dissolution contrast in organic solvent development, and exhibits high dry etch resistance even when the acid labile group is deprotected through exposure and PEB.

Abstract translation: 通过将抗蚀剂组合物涂布在基材上，烘烤，暴露于高能量辐射，烘烤（PEB）和在有机溶剂显影剂中曝光的抗蚀剂膜显影以选择性地溶解抗蚀剂膜的未曝光区域，形成负型图案。 包括含有酸不稳定基团保护的羧基的重复单元和具有内酯结构的重复单元的氢化ROMP聚合物的抗蚀剂组合物在有机溶剂显影中显示出高的溶解对比度，并且即使当酸不稳定基团为 通过暴露和PEB去保护。

公开(公告)号：US08283104B2

公开(公告)日：2012-10-09

申请号：US12706450

申请日：2010-02-16

Applicant: Masaki Ohashi ,  Takeshi Kinsho ,  Youichi Ohsawa

Inventor： Masaki Ohashi ,  Takeshi Kinsho ,  Youichi Ohsawa

IPC: G03F7/004 ,  C07C309/00

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/08 ,  C07C309/12 ,  C07C381/12 ,  C07C2603/74 ,  G03F1/50 ,  G03F7/0046 ,  G03F7/0392

Abstract: There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3−M+  (2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.

Abstract translation: 公开了由以下通式（2）表示的磺酸盐。 R1-COOC（CF3）2-CH2SO3-M +（2）（式中，R1表示任选含有杂原子的碳原子数1〜50的直链状，支链状或环状的一价烃基，M +表示阳离子。 ）可以提供：对抗蚀剂溶剂和树脂具有足够高的溶解度（相容性）的化学放大型抗蚀剂组合物有效的新型磺酸盐，良好的储存稳定性，PED稳定性，进一步更宽的聚焦深度， 良好的灵敏度，特别是高分辨率和良好的图案轮廓形式; 光敏酸发生器; 使用该抗蚀剂组合物 光掩模坯料和图案化工艺。

公开(公告)号：US20120252218A1

公开(公告)日：2012-10-04

申请号：US13424455

申请日：2012-03-20

Applicant: Daisuke Kori ,  Takeshi Kinsho ,  Katsuya Takemura ,  Tsutomu Ogihara ,  Takeru Watanabe ,  Hiroyuki Urano

Inventor： Daisuke Kori ,  Takeshi Kinsho ,  Katsuya Takemura ,  Tsutomu Ogihara ,  Takeru Watanabe ,  Hiroyuki Urano

IPC: H01L21/311 ,  C08G61/02 ,  C07C39/17 ,  C09D165/02 ,  C09D171/12 ,  C09D5/00 ,  H01L21/312 ,  C08G65/38

CPC classification number: C07C39/17 ,  C09D161/12 ,  G03F7/091 ,  G03F7/094

Abstract: A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.

Abstract translation: 提供具有式（1）的联苯衍生物，其中Ar1和Ar2表示苯或萘环，x和z各自为0或1.包含联苯衍生物或包含联苯衍生物的重复单元的聚合物的材料是旋涂 并进行热处理以形成具有改进性能，n和k的最佳值，台阶覆盖率，耐蚀刻性，耐热性，耐溶剂性和最小化除气的抗蚀剂底层。

公开(公告)号：US08216766B2

公开(公告)日：2012-07-10

申请号：US12411206

申请日：2009-03-25

Applicant: Takeru Watanabe ,  Takeshi Kinsho ,  Tomohiro Kobayashi ,  Tadahiro Sunaga ,  Yuichi Okawa ,  Hirofumi Io

Inventor： Takeru Watanabe ,  Takeshi Kinsho ,  Tomohiro Kobayashi ,  Tadahiro Sunaga ,  Yuichi Okawa ,  Hirofumi Io

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC classification number: C08F283/01 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/143

Abstract: A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.

Abstract translation: 提供了在酸作用下在碱性显影剂中溶解速率增加的聚合物。 聚合物通过在碱存在下使氢化ROMP聚合物与O-烷基化剂反应来制备。

公开(公告)号：US08062831B2

公开(公告)日：2011-11-22

申请号：US12434365

申请日：2009-05-01

Applicant: Satoshi Shinachi ,  Tsunehiro Nishi ,  Koji Hasegawa ,  Takeshi Kinsho ,  Seiichiro Tachibana ,  Takeru Watanabe

Inventor： Satoshi Shinachi ,  Tsunehiro Nishi ,  Koji Hasegawa ,  Takeshi Kinsho ,  Seiichiro Tachibana ,  Takeru Watanabe

IPC: G03F7/004 ,  G03F7/30 ,  C08F32/04

CPC classification number: G03F7/0397 ,  C07D307/77 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111

Abstract: Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and k2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

Abstract translation: 具有式（1）的含羧基的内酯化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是H或一价烃基，或者R 2和R 3可以一起形成脂族环，W是CH 2，O或 S，k1为0〜4的整数，k2为0或1.它们可用作单体，以生成对辐射透明的聚合物; 500nm。 包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，LER，图案密度依赖性和曝光余量。

公开(公告)号：US08017302B2

公开(公告)日：2011-09-13

申请号：US12355418

申请日：2009-01-16

Applicant: Youichi Ohsawa ,  Takeshi Kinsho ,  Takeru Watanabe

Inventor： Youichi Ohsawa ,  Takeshi Kinsho ,  Takeru Watanabe

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122

Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a minimal LER. Herein R1 is H or methyl, R2 is an acid labile group, R3 is CO2R4 when X is CH2, R3 is H or CO2R4 when X is O, R4 is a monovalent C1-C20 hydrocarbon group, and m is 1 or 2.

Abstract translation: 正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。 树脂（A）是包含由式（1）表示的特定重复单元的聚合物。 酸产生剂（B）是特定的锍盐化合物。 当通过光刻处理时，组合物的分辨率提高并且形成具有最小LER的图案。 本文中R1是H或甲基，R2是酸不稳定基团，当X是CH2时，R3是CO2R4，当X是O时，R3是H，CO2R4，R4是一价C1-C20烃基，m是1或2。

公开(公告)号：US20110160481A1

公开(公告)日：2011-06-30

申请号：US13043683

申请日：2011-03-09

Applicant: Katsuhiro KOBAYASHI ,  Youichi OHSAWA ,  Takeshi KINSHO ,  Takeru WATANABE

Inventor： Katsuhiro KOBAYASHI ,  Youichi OHSAWA ,  Takeshi KINSHO ,  Takeru WATANABE

IPC: C07C309/08

CPC classification number: C07C381/12 ,  C07C309/08 ,  C07C381/00 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041

Abstract: Sulfonate salts have the formula: HOCH2CH2CF2CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.

Abstract translation: 磺酸盐具有下式：HOCH2CH2CF2CF2SO3-M +，其中M +是Li，Na，K，铵或四甲基铵离子。 衍生自这些盐的鎓盐，肟磺酸盐和磺酰氧基酰亚胺是化学放大抗蚀剂组合物中有效的光酸产生剂。

公开(公告)号：US07879530B2

公开(公告)日：2011-02-01

申请号：US12239641

申请日：2008-09-26

Applicant: Seiichiro Tachibana ,  Kazumi Noda ,  Jun Hatakeyama ,  Takeshi Kinsho

Inventor： Seiichiro Tachibana ,  Kazumi Noda ,  Jun Hatakeyama ,  Takeshi Kinsho

IPC: G03F7/40 ,  G03F7/11 ,  G03F7/039

CPC classification number: G03F7/091 ,  C08L33/16 ,  C09D125/18 ,  C09D133/16 ,  Y10S438/952 ,  C08L2666/04 ,  C08L2666/02

Abstract: A composition comprising (A) a polymer having an alcohol structure with plural fluorine atoms substituted at α- and α′-positions and having k=0.01-0.4 and (B) an aromatic ring-containing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.

Abstract translation: 一种组合物，其包含（A）具有在α-和α'-位取代的具有多个氟原子并具有k = 0.01-0.4的醇结构的聚合物和（B）具有k = 0.3-1.2的含芳环的聚合物 以形成抗反射涂层。 ARC形成组合物可以通过与现有技术ARC相同的方法沉积。 所得到的ARC有效地防止曝光光在光刻中的反射并且具有可接受的干蚀刻速率。

公开(公告)号：US07868199B2

公开(公告)日：2011-01-11

申请号：US11699390

申请日：2007-01-30

Applicant: Koji Hasegawa ,  Takeshi Kinsho ,  Tsunehiro Nishi ,  Masaki Ohashi ,  Takeru Watanabe

Inventor： Koji Hasegawa ,  Takeshi Kinsho ,  Tsunehiro Nishi ,  Masaki Ohashi ,  Takeru Watanabe

IPC: C07C69/74

CPC classification number: G03F7/0395 ,  C07C29/147 ,  C07C69/54 ,  C07C69/653 ,  C07C69/753 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C08F220/24 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0397 ,  C07C31/44 ,  C07C31/42 ,  C07C35/48

Abstract: Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R1 is H or a monovalent C1-C20 hydrocarbon group in which any —CH2— moiety may be replaced by —O— or —C(═O)—, R2 is H or a monovalent C1-C6 hydrocarbon group, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, and M1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

Abstract translation: 通式（1）的氟化合物与式（2）和（3）的还原剂或式（2）和（3）的有机金属试剂反应制备式（4）的氟化醇，其中R1是H或一价C1-C20烃基， CH2-部分可以被-O-或-C（= O） - ，R2是H或一价C1-C6烃基，R3和R4是H或一价C1-C8烃基，M1是Li， Na，K，Mg，Zn，Al，B或Si。 从氟代醇化合物可以以简单且经济的方式制备氟化单体，其可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。

公开(公告)号：US20100304295A1

公开(公告)日：2010-12-02

申请号：US12787004

申请日：2010-05-25

Applicant: Takeshi Kinsho ,  Tomohiro Kobayashi ,  Masayoshi Sagehashi ,  Takeru Watanabe ,  Koji Hasegawa ,  Seiichiro Tachibana

Inventor： Takeshi Kinsho ,  Tomohiro Kobayashi ,  Masayoshi Sagehashi ,  Takeru Watanabe ,  Koji Hasegawa ,  Seiichiro Tachibana

IPC: G03F7/20 ,  C07C69/533 ,  C08F220/00 ,  C08F232/08 ,  G03F7/004

CPC classification number: C07C69/54 ,  C07C69/753 ,  C07C2602/42 ,  C07C2602/50 ,  C07C2603/94 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0397

Abstract: An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

Abstract translation: 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。