公开(公告)号：US20100088042A1

公开(公告)日：2010-04-08

申请号：US12630307

申请日：2009-12-03

Applicant: Minori NOGUCHI ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuyai Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori NOGUCHI ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuyai Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N21/88 ,  G06F19/00

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the specimen, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks diffraction light resulting from patterns formed on the specimen, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the specimen, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.

Abstract translation: 用于检测试样缺陷的装置和方法包括：照射光学单元，其将聚焦在激光束上的激光倾斜投射在试样的表面上;照射单元，其安装试样并可移动的检测光学单元， 图像传感器，由从样本反射的光形成的光的图像，并且通过滤光器，该滤光器阻挡由形成在样本上的图案产生的衍射光;处理从检测光学单元的图像传感器输出的信号提取的信号处理器 样本的缺陷以及显示由信号处理器提取的缺陷的信息的显示单元。 过滤器可调。

公开(公告)号：US20100002227A1

公开(公告)日：2010-01-07

申请号：US12555610

申请日：2009-09-08

Applicant: Akira HAMAMATSU ,  Minori NOGUCHI ,  Hedetoshi NISHIYAMA ,  Yoshimasa OHSHIMA ,  Takahiro JINGU ,  Sachio UTO

Inventor： Akira HAMAMATSU ,  Minori NOGUCHI ,  Hedetoshi NISHIYAMA ,  Yoshimasa OHSHIMA ,  Takahiro JINGU ,  Sachio UTO

IPC: G01N21/88 ,  G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

Abstract: The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

Abstract translation: 本发明提供一种检查装置和检查方法。 检查装置包括用于支撑被检查物体的台架机构。 在检测光学系统中设置空间滤波器来检查物体。 打印机用于打印空间滤镜的结果。 空间滤波器可以以傅里叶变换图像的形式提供。

公开(公告)号：US07643138B2

公开(公告)日：2010-01-05

申请号：US12182438

申请日：2008-07-30

Applicant: Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

Inventor： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

IPC: G01N21/00 ,  G06K9/00

CPC classification number: G06T7/001 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8861 ,  G01N2021/8867 ,  G06T7/97 ,  G06T2207/10152 ,  G06T2207/30148

Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.

Abstract translation: 在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息 具有相应的检查条件。 多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的 获得。 对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

公开(公告)号：US07586594B2

公开(公告)日：2009-09-08

申请号：US11770217

申请日：2007-06-28

Applicant: Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

Inventor： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

Abstract: The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

Abstract translation: 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

公开(公告)号：US20070070337A1

公开(公告)日：2007-03-29

申请号：US11500421

申请日：2006-08-08

Applicant: Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

Inventor： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2201/0697

Abstract: As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

Abstract translation: 随着近年来电路图案变得越来越精细，需要提高缺陷检测灵敏度。 为了解决这个问题，使用具有UV波段波长的激光作为照射用激光，正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而，脉冲振荡激光器的峰值（最大输出）变得非常大，达到所需的平均输出功率。 例如，在平均输出功率2W，脉冲间隔10ns，脉冲宽度10ps的激光器的情况下，峰值（最大输出）变得高达2kW，并且存在对 一个样品。 因此，需要在保持平均输出功率的同时降低峰值（最大输出），从而不会对样品造成损害。 在本发明中，器件被配置成使得脉冲光被光学地分成几个脉冲，并且这些脉冲被给予各自的长度彼此不同的路径，从而峰值（最大输出）减小，而平均输出 保持价值。

公开(公告)号：US20060139629A1

公开(公告)日：2006-06-29

申请号：US11296290

申请日：2005-12-08

Applicant: Yoshimasa Ohshima ,  Hisafumi Iwata ,  Hiroyuki Nakano

Inventor： Yoshimasa Ohshima ,  Hisafumi Iwata ,  Hiroyuki Nakano

IPC: G01N21/88

CPC classification number: G01N21/47 ,  G01N21/21 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8825

Abstract: There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.

Abstract translation: 公开了一种将激光束聚焦并将其照射到待检查样品的表面上的缺陷检测装置，并且由于将光束照射到散射光上而检测存在于表面上的异物/缺陷 样品表面。 为了稳定地检测异物等缺陷，根据本发明的缺陷检测装置的结构是使用光束形状光学系统，通过该光束系统将从激光源发射的激光束成形为将照射强度从其高斯分布改变为 平坦分布，使得即使改变了缺陷/异物与激光束照射位置的相对位置，也能够稳定地产生检测信号。

公开(公告)号：US20060030060A1

公开(公告)日：2006-02-09

申请号：US11244080

申请日：2005-10-06

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01R31/26 ,  H01L21/66

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus for detecting defects on a specimen including am illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.

Abstract translation: 一种用于检测试样上的缺陷的装置，包括：am照明光学单元，其将激光倾斜地突出到在一个方向上比沿着与所述一个方向横切的方向在一个方向上长的区域;安装所述样本的台单元 检测光学单元，其利用图像传感器检测在所述图像传感器上形成有从所述一个方向的两个方向和横向方向反射的光形成的光，并且在所述图像传感器上形成两个方向的反射光 当所述表移动时，信号处理器处理从所述检测光学单元的所述图像传感器输出的信号，以提取所述样本的缺陷。 一种显示由所述信号处理器提取的缺陷信息的显示单元。

公开(公告)号：US06888959B2

公开(公告)日：2005-05-03

申请号：US09791682

申请日：2001-02-26

Applicant: Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

Inventor： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

IPC: G01N21/956 ,  G06T7/00 ,  H01L21/66 ,  G06K9/00

CPC classification number: G06T7/001 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8861 ,  G01N2021/8867 ,  G06T7/97 ,  G06T2207/10152 ,  G06T2207/30148

Abstract: In order to inspect a substance to be detected such as a foreign substance in accordance with the condition of the surface of a sample to be inspected such as a semiconductor substrate manufactured in various manufacturing processes under a suitable inspection condition, this method includes the steps of: inspecting a substance to be detected on a sample to be inspected under a plurality inspection conditions, which are previously set, as a single unit to detect at least the data of a detected substance for each of the plurality of inspection conditions; checking the data of the detected substance for the respective inspection conditions against each other to make check data; analyzing the detected substance based on the check data of the detected substance to classify the detected substance; adding the data of classified detected substance to the coordinate data of the detected substance for the respective inspection conditions to make data relating to the classified detected substance for the respective inspection conditions; and selecting a suitable inspection condition based on the data relating to the classified detected substance for the respective inspection conditions.

Abstract translation: 为了在适当的检查条件下，根据在各种制造工序中制造的半导体衬底等被检测样品的表面状况，检查异物等异物，该方法包括以下步骤： 在预先设定的多个检查条件下检查待检测样品上检测到的物质作为单个单元，至少检测多个检查条件中检测物质的数据; 检查相应检查条件的检测物质的数据，以进行检查数据; 基于检测到的物质的检查数据分析检测到的物质以对检测到的物质进行分类; 将各种检测条件的检测物质的坐标数据相加，对各检查条件进行分类检测物质的数据的添加; 以及基于与各检查条件的分类检测物质有关的数据来选择合适的检查条件。

公开(公告)号：US06731384B2

公开(公告)日：2004-05-04

申请号：US09973000

申请日：2001-10-10

Applicant: Yoshimasa Ohshima ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Kenji Mitomo ,  Takashi Okawa ,  Akira Hamamatsu ,  Shinichi Suzuki

Inventor： Yoshimasa Ohshima ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Kenji Mitomo ,  Takashi Okawa ,  Akira Hamamatsu ,  Shinichi Suzuki

IPC: G01N2100

CPC classification number: G01N21/94 ,  G01N21/8806

Abstract: An apparatus and method for detecting foreign particle and defect on an object in detection by means of a laser beam, in which the laser beams of different wavelengths are irradiated onto the surface of the object in detection from different angles and the state of foreign particle and defect is separately detected according to the output level of the scattered light reflected from that surface. Further, it is arranged such that the scattered light reflected from the object onto which the laser beam is irradiated from the sole source or the plurality of sources is detected in plural directions, which detecting result is compared for the detection of the directivity of said scattered light in reflection.

Abstract translation: 一种用于通过激光束检测物体中的异物和在物体上的缺陷的装置和方法，其中不同波长的激光束从不同的角度和外来粒子的状态被检测到被检测物体的表面，并且 根据从该表面反射的散射光的输出电平分别检测缺陷。 另外，从多个方向检测从单个源或多个源照射激光束的物体所反射的散射光，将该检测结果进行比较，以检测所述散射的方向性 光反射。

公开(公告)号：US5463459A

公开(公告)日：1995-10-31

申请号：US46720

申请日：1993-04-16

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  G01N21/89 ,  G02B27/46 ,  G06F15/46

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01R31/308 ,  H01J37/00 ,  H01L21/67253 ,  H01L21/67288 ,  G01N2021/8822 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L22/12

Abstract: A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

Abstract translation: 一种缺陷检测装置，包括用于将平面波的光线线性地发射到具有不同间距的重复图案的基板的照明系统; 聚焦光学系统，用于聚焦由照明系统照射的从基板反射的光图像; 设置在聚焦光学系统之间的空间滤光器，以便屏蔽来自基板上的小间距的重复图案的衍射光; 用于检测由聚焦光学系统形成的光图像的检测器; 擦除装置，用于根据由检测器检测到的信号，比较和擦除基于大间距的重复图案并通过空间滤波器获得的信号; 以及缺陷检测装置，用于根据由检测器检测的信号检测基板上的缺陷，以及应用于所述装置的方法。