公开(公告)号：US20150346609A1

公开(公告)日：2015-12-03

申请号：US14825728

申请日：2015-08-13

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF

IPC: G03F7/20 ,  G01N21/95 ,  G02B5/20 ,  G01J3/44

CPC classification number: G01J3/4412 ,  G01J3/44 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B5/205 ,  G03F7/70591 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7026

Abstract: A spectroscopic scatterometer detects both zero order and higher order radiation diffracted from an illuminated spot on a target grating. The apparatus forms and detects a spectrum of zero order (reflected) radiation, and separately forms and detects a spectrum of the higher order diffracted radiation. Each spectrum is formed using a symmetrical phase grating, so as to form and detect a symmetrical pair of spectra. The pair of spectra can be averaged to obtain a single spectrum with reduced focus sensitivity. Comparing the two spectra can yield information for improving height measurements in a subsequent lithographic step. The target grating is oriented obliquely so that the zero order and higher order radiation emanate from the spot in different planes. Two scatterometers can operate simultaneously, illuminating the target from different oblique directions. A radial transmission filter reduces sidelobes in the spot and reduces product crosstalk.

Abstract translation: 光谱散射仪检测从目标光栅上的照明光点衍射的零级和高阶辐射。 该装置形成和检测零级（反射）辐射的光谱，并分别形成和检测高阶衍射辐射的光谱。 每个光谱使用对称相位光栅形成，以便形成和检测对称的光谱对。 这对光谱可以被平均以获得具有降低的聚焦灵敏度的单个光谱。 比较两个光谱可以产生用于在随后的光刻步骤中改善高度测量的信息。 目标光栅倾斜定向，使得零级和高阶辐射从不同平面中的光点发出。 两个散射仪可以同时操作，从不同的倾斜方向照射目标。 径向传输过滤器可减少现场的旁瓣并减少产品串扰。

公开(公告)号：US20150346605A1

公开(公告)日：2015-12-03

申请号：US14656510

申请日：2015-03-12

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Kaustuve Bhattacharyya

IPC: G03F7/20 ,  G03F9/00 ,  H01L23/544

CPC classification number: G03F7/705 ,  G03F7/70158 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/708 ,  H01L23/544

Abstract: Metrology targets are formed by a lithographic process, each target comprising a bottom grating and a top grating. Overlay performance of the lithographic process can be measured by illuminating each target with radiation and observing asymmetry in diffracted radiation. Parameters of metrology recipe and target design are selected so as to maximize accuracy of measurement of overlay, rather than reproducibility. The method includes calculating at least one of a relative amplitude and a relative phase between (i) a first radiation component representing radiation diffracted by the top grating and (ii) a second radiation component representing radiation diffracted by the bottom grating after traveling through the top grating and intervening layers. The top grating design may be modified to bring the relative amplitude close to unity. The wavelength of illuminating radiation in the metrology recipe can be adjusted to bring the relative phase close to π/2 or 3π/2.

Abstract translation: 计量目标由光刻工艺形成，每个目标包括底部光栅和顶部光栅。 可以通过用辐射照射每个靶并观察衍射辐射的不对称性来测量光刻工艺的覆盖性能。 选择计量配方和目标设计的参数，以便最大化覆盖测量的准确性，而不是重现性。 该方法包括计算以下中的至少一个中的至少一个：（i）表示由顶部光栅衍射的辐射的第一辐射分量和（ii）表示在行进通过顶部之后由底部光栅衍射的辐射的第二辐射分量 光栅和中间层。 可以修改顶部光栅设计以使相对幅度接近于一致。 可以调整计量配方中照明辐射的波长，使相对相位接近于＆pgr / 2或3＆pgr / 2。

公开(公告)号：US20150131076A1

公开(公告)日：2015-05-14

申请号：US14536979

申请日：2014-11-10

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey DEN BOEF

IPC: G01B11/24 ,  G03F7/20

CPC classification number: G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.

Abstract translation: 公开了一种光刻设备。 光刻设备包括配置成测量衬底性质的散射仪。 散射仪包括被配置为在基板上的目标上产生辐射点的辐射源，其中辐射光点包括目标上的位置。 散射仪还包括检测器，其被配置为产生对应于辐射光斑的相应位置的测量信号和被配置为基于测量信号输出代表衬底性质的单个值的处理器。

公开(公告)号：US20140192338A1

公开(公告)日：2014-07-10

申请号：US14202825

申请日：2014-03-10

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF

IPC: G01N21/956 ,  G03F7/20

CPC classification number: G01N21/95607 ,  G03F7/7015 ,  G03F7/70633

Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.

Abstract translation: 提供了系统，方法和装置，用于确定衬底上的图案的覆盖层，其中掩模图案限定在衬底上图案顶部上的抗蚀剂层中。 第一光栅设置在第二光栅下方，每个具有与另一光栅基本相同的间距，一起形成复合光栅。 沿着第一水平方向以入射角设置第一照明光束。 测量来自复合光栅的衍射光束的强度。 沿着第二水平方向的入射角设置第二照明光束。 第二水平方向与第一水平方向相反。 测量来自复合光栅的衍射光束的强度。 来自第一照明光束的衍射光束与来自第二照明光束的衍射光束之间的差异线性缩放导致重叠误差。

公开(公告)号：US20240004312A1

公开(公告)日：2024-01-04

申请号：US18253734

申请日：2021-10-28

Applicant: ASML Netherlands B.V. ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： Peter Michael KRAUS ,  Sylvianne Dorothea Christina ROSCAM ABBING ,  Filippo CAMPI ,  ZhuangYan ZHANG ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Stefan Michiel WITTE ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G02F1/35 ,  H05G2/00

CPC classification number: G03F7/70641 ,  G03F7/706849 ,  G02F1/353 ,  G02F1/3505 ,  G02F1/3507 ,  H05G2/00

Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.

公开(公告)号：US20230393490A1

公开(公告)日：2023-12-07

申请号：US18453531

申请日：2023-08-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Ronald Joseph Antonius VAN DEN OETELAAR

IPC: G03F7/00 ,  G01N21/21 ,  G03F9/00 ,  G01N21/47

CPC classification number: G03F7/70633 ,  G03F7/70625 ,  G03F7/70608 ,  G01N21/211 ,  G03F7/70683 ,  G03F9/7088 ,  G01N21/47 ,  G03F7/70641

Abstract: A computer program product causes a processor to execute a process of causing an optical system to illuminate at least one structure on a substrate that comprises first repetitive features at a first pitch in a first layer and second repetitive features at a second pitch in a second layer, the first repetitive features at least partially overlapping with the second repetitive features. The first pitch is different from the second pitch. The processor causes the optical system to receive radiation scattered by the at least one structure and transmit a portion of the received scattered radiation to a sensor arranged in an image plane of the optical system or in a plane conjugate with the image plane for detecting the received scattered radiation and configured to detect a characteristic of radiation impinging on the sensor. The processor then determines a characteristic of interest of the structure.

公开(公告)号：US20230341813A1

公开(公告)日：2023-10-26

申请号：US18034356

申请日：2021-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Hugo Augustinus Joseph CRAMER ,  Vasco Tomas TENNER

IPC: G03H1/26 ,  G03H1/04

CPC classification number: G03H1/0443 ,  G03H1/265 ,  G03H2001/005

Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope includes an illumination branch for providing illumination radiation to illuminate the structure; a detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by the structure; and a reference branch for providing reference radiation for interfering with the object radiation to obtain an image of an interference pattern formed by the illumination radiation and reference radiation. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the image within a field of view of the dark field digital holographic microscope at a detector plane.

公开(公告)号：US20230075781A1

公开(公告)日：2023-03-09

申请号：US18056073

申请日：2022-11-16

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF

IPC: G01N21/956 ,  G03F7/20

Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.

公开(公告)号：US20220276180A1

公开(公告)日：2022-09-01

申请号：US17634588

申请日：2020-07-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Simon Gijsbert Josephus MATHIJSSEN ,  Kaustuve BHATTACHARYYA ,  Arie Jeffrey DEN BOEF

IPC: G01N21/95 ,  G01J3/36 ,  G03F7/20 ,  G02B27/14 ,  G02B27/10

Abstract: An illumination and detection apparatus for a metrology tool, and associated method. The apparatus includes an illumination arrangement operable to produce measurement illumination having a plurality of discrete wavelength bands and having a spectrum having no more than a single peak within each wavelength band. The detection arrangement includes a detection beamsplitter to split scattered radiation into a plurality of channels, each channel corresponding to a different one of the wavelength bands; and at least one detector for separate detection of each channel.

公开(公告)号：US20220121127A1

公开(公告)日：2022-04-21

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marimus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Franciscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.