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841 条记录 (耗时 0.048 秒)

    Ejector
    62.
    发明授权
    Ejector 有权
    喷射器

    公开(公告)号：US07207190B2

    公开(公告)日：2007-04-24

    申请号：US11060618

    申请日：2005-02-17

    申请人： Takayuki Sugiura ,  Hirotsugu Takeuchi ,  Hiroshi Oshitani ,  Hiroshi Watanabe

    发明人： Takayuki Sugiura ,  Hirotsugu Takeuchi ,  Hiroshi Oshitani ,  Hiroshi Watanabe

    IPC分类号： F25B1/06

    CPC分类号： F04F5/461 ,  B41J2/17596 ,  B60H2001/3298 ,  F25B9/008 ,  F25B41/00 ,  F25B2309/061 ,  F25B2341/0011 ,  F25B2341/0013 ,  F25B2341/0653 ,  F25B2500/01 ,  Y02B30/72

    摘要： An ejector including a nozzle 17 having a high pressure space 18 into which a high pressure coolant flows from an inlet 17a and a throttle portion 17c for reducing a passage area of the high pressure coolant from the high pressure space 18 to jet port 17b, a needle valve 19 for changing opening of the throttle portion 17c by undergoing displacement in an axial direction R of the throttle portion 17c, and a suction space 22 in which a jet port 17b and a gaseous phase coolant inlet 22a are arranged, wherein an end portion 19c of the needle valve 19 on the side opposite to the jet port is arranged on an opposite side end portion space 21 as a space different from the high pressure space 18 and is communicated with the suction space 22.

    摘要翻译： 喷射器包括具有高压空间18的喷嘴17，高压冷却剂从入口17a流出并且节流部分17c用于将高压冷却剂从高压空间18的通道面积减小到喷射口17 b，用于通过在节流部分17c的轴向R上发生位移来改变节流部分17c的开口的针阀19和其中喷射口17b和气相冷却剂入口22a的吸入空间22 配置有针阀19的与喷射口相反的一侧的端部19c，作为与高压空间18不同的空间配置在相对侧端部空间21上，与吸引空间22连通 。

    Image monitor apparatus controlling camera and illumination in order to optimize luminance of picked-up image
    63.
    发明授权
    Image monitor apparatus controlling camera and illumination in order to optimize luminance of picked-up image 失效
    控制摄像机和照明的图像监视器装置，以便优化拾取图像的亮度

    公开(公告)号：US07202902B2

    公开(公告)日：2007-04-10

    申请号：US09821439

    申请日：2001-03-29

    申请人： Tsuyoshi Miura ,  Ichiro Kagami ,  Noriyuki Ihara ,  Hiroshi Watanabe

    发明人： Tsuyoshi Miura ,  Ichiro Kagami ,  Noriyuki Ihara ,  Hiroshi Watanabe

    IPC分类号： H04N5/222 ,  H04N5/235 ,  G03B7/00

    CPC分类号： H04N5/2354

    摘要： In an image monitor apparatus for monitoring an image: a camera picks up an image; an emission control unit controls at least one light emitting element; an image signal acquiring unit performs analog-to-digital conversion of the image picked up by the camera so as to generate a digitized image signal, and stores the digitized image signal; a luminance examining unit examines luminance of the image represented by the digitized image signal, and determines whether or not the amount of light detected and stored in an image-pickup plane of the camera is appropriate; and a luminance control unit controls at least one of the camera and the luminance control unit so that the amount of light stored in an image-pickup plane becomes appropriate.

    摘要翻译： 在用于监视图像的图像监视装置中：相机拾取图像; 排放控制单元控制至少一个发光元件; 图像信号获取单元执行由照相机拍摄的图像的模数转换，以产生数字化图像信号，并存储数字化的图像信号; 亮度检查单元检查由数字化图像信号表示的图像的亮度，并且确定在相机的图像拾取平面中检测和存储的光量是否合适; 并且亮度控制单元控制相机和亮度控制单元中的至少一个，使得存储在图像拾取平面中的光量变得适当。

    Substrate processing method
    68.
    发明申请
    Substrate processing method 审中-公开
    基板加工方法

    公开(公告)号：US20060231124A1

    公开(公告)日：2006-10-19

    申请号：US11433616

    申请日：2006-05-15

    申请人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

    发明人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

    IPC分类号： B08B3/00

    CPC分类号： H01L21/67086 ,  B08B3/10 ,  H05K3/26

    摘要： Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W−1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W−1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W−1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.

    摘要翻译： 提供了能够可靠地处理诸如沟槽，接触孔，深图案或多孔基材的孔的凹陷的内部的处理方法。 将化学溶液M供给到放置基板W的处理槽1中，并且处理槽1在低于大气压的压力下重复抽真空并加压数次。 使酒精X与基板W的表面接触并供给到凹部W-1中。 将化学溶液M供给到含有基板W的处理槽1中，直到化学溶液M达到浸渍基板W的水位，从而使化学溶液M进入凹部W-1。 从处理槽1排出化学溶液M，通过抽出处理槽1蒸发进入凹部W-1并与醇X混合的部分化学溶液M. 这个过程重复几次。

    Edge-emitting type semiconductor laser
    70.
    发明授权
    Edge-emitting type semiconductor laser 有权
    边缘发射型半导体激光器

    公开(公告)号：US07116691B2

    公开(公告)日：2006-10-03

    申请号：US10766035

    申请日：2004-01-29

    申请人： Masanobu Ando ,  Hiroshi Watanabe

    发明人： Masanobu Ando ,  Hiroshi Watanabe

    IPC分类号： H01S5/20

    CPC分类号： B82Y20/00 ,  H01S5/22 ,  H01S5/34 ,  H01S2301/18

    摘要： The interval Λ between each stripe of interference fringe generated in a conventional n-type contact layer is determined by a function (f(λ)=λ(n2−neq2)−1/2/2) wherein λ, n, and neq represent luminous wavelength λ of lights radiated from a light emitting part 104, refractive index n of the n-type contact layer, and equivalent refractive index neq of the n-type contact layer in guided wave mode, respectively. The remaining thickness δ of the n-type contact layer 102 at the concave part D which is formed at the back surface of the crystal growth substrate may be about Λ/2. When at least one portion of the n-type contact layer which is formed right beneath the laser cavity remains with about δ in thickness, the n-type contact layer arranged even right beneath the laser cavity can maintain excellent contact to a negative electrode. As a result, effective light confinement enables to adequately suppress ripples in FFP owing to lights leaked into the n-type contact layer, to thereby provide a semiconductor laser which oscillates stable lights.

    摘要翻译： 在常规n型接触层中产生的每条条纹干涉条纹之间的间隔Lλ由函数（f（λ）=λ（n≥0） 2/2）其中λ，n和n eq表示从发光部分辐射的光的发光波长λ 104，导向波模式中n型接触层的n型接触层的折射率n和等效折射率n eq eq 。 形成在晶体生长衬底的背面的凹部D处的n型接触层102的剩余厚度δ可以为约λ/ 2。 当在激光腔正下方形成的n型接触层的至少一部分保持厚度约为三角形时，即使在激光腔正下方布置的n型接触层可以保持与负电极的良好接触。 结果，有效的光限制能够充分地抑制由于光泄漏到n型接触层中的FFP中的波纹，从而提供振荡稳定的光的半导体激光器。