利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

78 条记录 (耗时 0.029 秒)

    APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING
    65.
    发明申请
    APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING 有权
    改善射频接地可靠性的装置和方法

    公开(公告)号：US20130126206A1

    公开(公告)日：2013-05-23

    申请号：US13302012

    申请日：2011-11-22

    申请人： Jianhua Zhou ,  Dale R. Du Bois ,  Mohamad A. Ayoub ,  Juan Carlos Rocha-Alvarez

    发明人： Jianhua Zhou ,  Dale R. Du Bois ,  Mohamad A. Ayoub ,  Juan Carlos Rocha-Alvarez

    IPC分类号： H02G3/04

    CPC分类号： H01J37/32091 ,  H01J37/32577

    摘要： Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector extending from a second end of the elongated hollow body. Each of the elongated hollow body, the first solid connector and the second solid connector is formed from an electrically conductive material.

    摘要翻译： 本发明的实施例提供一种包括中空部分的RF导电棒。 特别地，RF导杆包括细长的中空本体，其具有封闭内部容积的侧壁，从细长中空体的第一端延伸的第一固体连接器和从细长中空体的第二端延伸的第二固体连接器。 每个细长的中空体，第一固体连接器和第二固体连接器由导电材料形成。

    METHODS AND APPARATUS FOR A MULTI-ZONE PEDESTAL HEATER
    66.
    发明申请
    METHODS AND APPARATUS FOR A MULTI-ZONE PEDESTAL HEATER 审中-公开
    多区加热器的方法和装置

    公开(公告)号：US20120211484A1

    公开(公告)日：2012-08-23

    申请号：US13033592

    申请日：2011-02-23

    申请人： Jianhua Zhou ,  Juan Carlos Rocha-Alvarez

    发明人： Jianhua Zhou ,  Juan Carlos Rocha-Alvarez

    IPC分类号： H05B3/68 ,  H01C17/02

    CPC分类号： H01L21/67248 ,  H01L21/67103 ,  Y10T29/49083

    摘要： The present invention provides systems, methods and apparatus for manufacturing a multi-zone pedestal heater. A multi-zone pedestal heater includes a heater plate which includes a first zone including a first heating element and a first thermocouple for sensing the temperature of the first zone wherein the first zone is disposed in the center of the heater plate; and a second zone including a second heating element and a first embedded thermocouple for sensing the temperature of the second zone wherein the first embedded thermocouple includes a first longitudinal piece that extends from a center of the heater plate to the second zone and the first longitudinal piece is entirely encased within the heater plate. Numerous additional aspects are disclosed.

    摘要翻译： 本发明提供用于制造多区基座加热器的系统，方法和装置。 多区基座加热器包括加热板，加热板包括第一区域，第一区域包括第一加热元件和第一热电偶，用于感测第一区域的温度，其中第一区域设置在加热器板的中心; 以及第二区域，包括第二加热元件和用于感测第二区域的温度的第一嵌入式热电偶，其中第一嵌入式热电偶包括从加热器板的中心延伸到第二区域的第一纵向件和第一纵向件 被完全封装在加热器板内。 公开了许多附加方面。

    Methods of uniformity control for low flow process and chamber to chamber matching
    67.
    发明授权
    Methods of uniformity control for low flow process and chamber to chamber matching 有权
    低流程和室到室匹配的均匀性控制方法

    公开(公告)号：US07829145B2

    公开(公告)日：2010-11-09

    申请号：US12256405

    申请日：2008-10-22

    申请人： Ganesh Balasubramanian ,  Juan Carlos Rocha-Alvarez ,  Tom K. Cho ,  Daemian Raj

    发明人： Ganesh Balasubramanian ,  Juan Carlos Rocha-Alvarez ,  Tom K. Cho ,  Daemian Raj

    IPC分类号： C23C16/00

    CPC分类号： C23C16/4405 ,  C23C16/45565 ,  C23C16/45574

    摘要： Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the method for processing a substrate includes delivering a processing gas into a chemical vapor deposition chamber through a first gas pathway that includes flow through a first plurality of apertures in a blocker plate, the blocker plate creating a pressure drop of at least approximately 0.8 torr thereacross, reacting the processing gas to deposit a material on a substrate surface, removing the substrate from the chamber, delivering a cleaning gas into the chamber through a second gas pathway around the blocker plate bypassing the blocker plate and through a second plurality of apertures formed in the blocker plate, and reacting the cleaning gases with deposits within the chamber to etch the deposits from the chamber.

    摘要翻译： 公开了将气体分配到处理室中的装置和方法。 在一个实施例中，用于处理衬底的方法包括通过第一气体通路将处理气体输送到化学气相沉积室，所述第一气体通路包括通过阻挡板中的第一多个孔的流动，所述阻挡板产生至少一个压降 使处理气体反应在衬底表面上沉积材料，从腔室中移除衬底，通过围绕阻挡板的第二气体通道将清洁气体输送到室中，并绕过第二个多个 形成在阻挡板中的孔，并使清洁气体与腔室内的沉积物反应，以蚀刻来自腔室的沉积物。

    BIG FOOT LIFT PIN
    70.
    发明申请
    BIG FOOT LIFT PIN 审中-公开
    大脚提升针

    公开(公告)号：US20090314211A1

    公开(公告)日：2009-12-24

    申请号：US12483845

    申请日：2009-06-12

    申请人： Dale R. Du Bois ,  Mark A. Fodor ,  Karthik Janakiraman ,  Juan Carlos Rocha-Alvarez

    发明人： Dale R. Du Bois ,  Mark A. Fodor ,  Karthik Janakiraman ,  Juan Carlos Rocha-Alvarez

    IPC分类号： C23C16/458 ,  B23Q1/44

    CPC分类号： H01L21/68742

    摘要： Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy, repeatability, reliability, and corrosion resistance. In one embodiment, a lift pin assembly for positioning a substrate relative to a substrate support is provided. The lift pin assembly comprises a lift pin comprising a pin shaft, a pin head coupled with a first end of the pin shaft for supporting the substrate, and a shoulder coupled with a second end of the pin shaft. The lift pin assembly further comprises a cylindrical body slidably coupled with the pin shaft and a locking pin for preventing the cylindrical body from sliding along the shaft, wherein the shoulder has a through-hole dimensioned to accommodate the locking pin.

    摘要翻译： 本文描述的实施例通常提供具有增加的晶片放置精度，重复性，可靠性和耐腐蚀性的提升销组件。 在一个实施例中，提供了一种用于相对于衬底支撑件定位衬底的提升销组件。 提升销组件包括提升销，该提升销包括销轴，与销轴的第一端联接以支撑衬底的销头，以及与销轴的第二端联接的肩部。 提升销组件还包括与销轴可滑动地连接的圆柱形主体和用于防止圆柱形主体沿着轴滑动的锁定销，其中肩部具有尺寸适于容纳锁定销的通孔。