摘要:
Where a thin film formed on a glass substrate is etched with a solution containing a fluoride, insoluble residues formed by the reaction of the solution with glass substrate components adhere to the back of the substrate to cause etching non-uniformity called roller marks. So, a solution is supplied directly to supporting member for supporting the glass substrate, or concentratedly to region where the substrate and the supporting member come into contact and from a position opposite to the transporting direction of the substrate, or to both the supporting members and regions where the substrate and the supporting members come into contact. This enables the roller marks to be kept from forming, consequently making it possible to improve display quality of display devices.
摘要:
The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device.
摘要:
A liquid crystal display device has image signal lines of a bottom gate type TFT, in which the image signal lines comprise a laminated film formed of a first conductive film disposed as a lower layer and a second conductive film disposed as an upper layer. The first conductive film is made of an alloy comprising Mo as a main ingredient and W, and the second conductive film is made of an alloy comprising Mo as a main ingredient and Zr. The device is capable of satisfying requirements of reduced resistance, improved dry etching resistance, selective wet etching with respect to the gate insulative film, the number of laminated layer of two or less, and tapered fabrication for the cross section.
摘要:
The present invention provides a liquid crystal display device which can simplify patterning steps of signal wirings and electrodes during manufacture and can enhance the reliability by preventing the electrolytic corrosion of terminal portions or the like. At the time of forming electrodes and/or signal wirings on a substrate 1, an amorphous oxide conductive film 3 having a large etching rate is laminated onto a metal film 2 which is made of chromium or the like and is formed on the substrate 1, and these films arc etched simultaneously in only one photolithography treatment.
摘要:
A thin film transistor of high reliability mounted on an insulator substrate, the transistor having a semiconductor thin film, a gate insulation film and a gate electrode in which the concentration profile of impurities in the semiconductor thin film is controlled so as to have a peak in a region other than the center of the depth for the semiconductor thin film to attain a long life for LCD.
摘要:
In an active matrix type liquid crystal display device, at least material of one element, forming the connecting portion between signal transfer lines related to the scan lines and the data signal lines of the device, is an alloy of at least a chemical element selected from the group consisting of Nb, Mo, Ta, and W, with Cr, the scan lines and means for generating scan pulses are connected to each other via a first opening formed in an insulating film, the data signal lines and the means for generating image data are connected to each other via a second opening formed in an insulating film, a polycrystalline thin film, which is connected to the means for generating scan pulses, is inserted into the first opening, and a polycrystalline thin film, which is connected to the means for generating image data, is inserted into the second opening, and the polycrystalline thin film is composed of indium tin oxide, which is made of mainly indium oxide and added tin oxide, having a specific resistance of, at the utmost, 6×10−4 &OHgr;cm.
摘要:
A liquid crystal display unit in which at least one of a gate electrode line, a drain electrode line, and a gate electrode and a source/drain electrode of a TFT formed on a substrate is composed of a metal Nb or an alloy material of Nb. Glass is used as the substrate, and the size thereof is preferably 300 mm or longer on one side and 1 mm or less in thickness. In order to provide a low wiring resistance to produce a high resolution and large size TFT panel, the resistivity of the metal Nb or the alloy material thereof is preferably 25 .mu..OMEGA.cm or less, and the film stress of Nb or the alloy material thereof on the glass substrate is 400 MPa or less.
摘要:
Disclosed is a manufacturing method of a liquid crystal display device which is a manufacturing method of a liquid crystal display device including a liquid crystal alignment film to which an alignment regulating force is imparted by a photo-alignment treatment, including: a film forming step of forming a film containing a polymer whose main chain is cleaved by irradiation with light; a photo-alignment step of imparting an alignment regulating force to the film formed in the film forming step by irradiation of the film with light in an atmosphere of a temperature lower than 100° C.; and a removing step of removing a low-molecular weight component generated by cleaving the main chain of the polymer through the light irradiation after the light irradiation. Also disclosed is a liquid crystal display device manufactured by the manufacturing method.
摘要:
In a liquid crystal display device using a cylindrical spacer to define the gap between a TFT substrate and a counter substrate, the TFT substrate does not include an organic passivation film, in which the cylindrical spacer is formed on an inorganic passivation film. An overcoat film is formed to cover a black matrix and color filters in the counter substrate. A concavo-convex mount is formed in the overcoat film. The top of the cylindrical spacer is brought into contact with the concavo-convex mount. The oriented film is not attached to the top of the cylindrical spacer and the convex portion of the concavo-convex mount. Thus, even if horizontal displacement occurs in the TFT substrate or the counter substrate, it is possible to prevent the occurrence of bright spots due to the scraping of the oriented film caused by the friction between the TFT substrate and the counter substrate.
摘要:
The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.