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    Electron beam apparatus and an aberration correction optical apparatus
    61.
    发明授权
    Electron beam apparatus and an aberration correction optical apparatus 有权
    电子束装置和像差校正光学装置

    公开(公告)号：US07863580B2

    公开(公告)日：2011-01-04

    申请号：US11760235

    申请日：2007-06-08

    申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

    发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

    IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26

    CPC分类号： H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

    摘要： An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

    摘要翻译： 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和牵伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由与阴极的电子发射表面1a相对的第二球体的局部外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同尺寸的多极维纳滤光器，其布置成使得它们的中心分别沿着像差校正光学装置中的物平面图像平面段与¼平面位置和¾平面位置对准， 以及分别设置在像差校正光学装置中的物平面位置，中间图像形成面位置和像面位置的具有双向焦点的光学元件。

    Organic electroluminescent element
    63.
    发明授权
    Organic electroluminescent element 有权
    有机电致发光元件

    公开(公告)号：US07648778B2

    公开(公告)日：2010-01-19

    申请号：US11503999

    申请日：2006-08-15

    申请人： Tatsuya Igarashi ,  Takeshi Murakami

    发明人： Tatsuya Igarashi ,  Takeshi Murakami

    IPC分类号： H01L51/54

    CPC分类号： H01L51/0085 ,  C09K11/06 ,  C09K2211/1029 ,  C09K2211/1044 ,  C09K2211/185 ,  H01L21/26513 ,  H01L21/2658 ,  H01L29/78 ,  H01L51/0081 ,  H01L51/5012 ,  Y10S428/917

    摘要： An organic electroluminescent element comprises: a pair of electrodes; and at least one organic compound layer between the pair of electrodes, said at least one organic compound layer comprising a light-emitting layer, wherein the organic luminescent element comprises at least one complex represented by formula (1): wherein M11 represents a hexacoordinate transition metal ion, Y11 represents a nitrogen atom or a substituted or unsubstituted carbon atom, L11 represents a ligand, Q11 and Q12 each represents an atomic group for forming a nitrogen-containing heterocyclic ring, n11 represents an integer of 1 to 3, n12 represents an integer of 0 to 4, X11 represents a counter ion, and n13 represents an integer of 0 to 3.

    摘要翻译： 有机电致发光元件包括：一对电极; 和所述一对电极之间的至少一个有机化合物层，所述至少一个有机化合物层包含发光层，其中所述有机发光元件包含至少一个由式（1）表示的络合物：其中M11表示六配位转变 金属离子，Y11表示氮原子或取代或未取代的碳原子，L11表示配体，Q11和Q12各自表示形成含氮杂环的原子团，n11表示1〜3的整数，n12表示 0〜4的整数，X 11表示抗衡离子，n13表示0〜3的整数。

    Operation training system and operation training method
    70.
    发明申请
    Operation training system and operation training method 审中-公开
    操作培训体系和操作培训方法

    公开(公告)号：US20080299525A1

    公开(公告)日：2008-12-04

    申请号：US12156406

    申请日：2008-05-29

    申请人： Takeshi Murakami

    发明人： Takeshi Murakami

    IPC分类号： G09B19/00

    CPC分类号： G05B17/02 ,  G09B19/00

    摘要： A safety station simulator is implemented using an application program and a communication program installed in a personal computer. The application program is a program actually used with a safety station of a real machine. Since the program used with the real machine can be used intact, it is not necessary to again describe the application for an operation training system.

    摘要翻译： 使用安装在个人计算机中的应用程序和通信程序来实现安全站模拟器。 应用程序是与实际机器的安全站实际使用的程序。 由于与真实机器一起使用的程序可以完整使用，因此无需再次描述操作培训系统的应用。