公开(公告)号：US07863580B2

公开(公告)日：2011-01-04

申请号：US11760235

申请日：2007-06-08

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

摘要： An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

摘要翻译： 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和牵伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由与阴极的电子发射表面1a相对的第二球体的局部外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同尺寸的多极维纳滤光器，其布置成使得它们的中心分别沿着像差校正光学装置中的物平面图像平面段与¼平面位置和¾平面位置对准， 以及分别设置在像差校正光学装置中的物平面位置，中间图像形成面位置和像面位置的具有双向焦点的光学元件。

公开(公告)号：US07241993B2

公开(公告)日：2007-07-10

申请号：US09891511

申请日：2001-06-27

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： H01J37/28

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20060118719A1

公开(公告)日：2006-06-08

申请号：US11290688

申请日：2005-12-01

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US07569838B2

公开(公告)日：2009-08-04

申请号：US12068484

申请日：2008-02-07

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： H01J37/00 ,  H01J37/30

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US07351969B2

公开(公告)日：2008-04-01

申请号：US11290688

申请日：2005-12-01

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

摘要翻译： 图像投影型的电子束检查系统包括用于将从电子枪发射的电子束成形为矩形构造的一次电子光学系统，并将成形的电子束施加到要检查的样品表面。 二次电子光学系统收敛从样品发射的二次电子。 检测器通过荧光屏将会聚的二次电子转换成光学图像，并将图像聚焦到线传感器。 一个控制器控制线传感器的电荷转移时间，该线传感器在行传感器中设置的每对相邻像素行之间与用于移动样本的平台的移动速度相关联地传送拾取线图像。

公开(公告)号：US06992290B2

公开(公告)日：2006-01-31

申请号：US09985317

申请日：2001-11-02

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US08053726B2

公开(公告)日：2011-11-08

申请号：US12216233

申请日：2008-07-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： H01J37/28

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20090032708A1

公开(公告)日：2009-02-05

申请号：US12216233

申请日：2008-07-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/00 ,  H01J3/14

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

公开(公告)号：US08368031B2

公开(公告)日：2013-02-05

申请号：US13243429

申请日：2011-09-23

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： H01J37/147 ,  H01J37/28

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

公开(公告)号：US20120032079A1

公开(公告)日：2012-02-09

申请号：US13243429

申请日：2011-09-23

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： H01J37/26 ,  H01J3/26

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。