Abstract:
Disclosed are a polycrystalline silicon and a crystallization method thereof according to an exemplary embodiment of the present invention. The polycrystalline silicon comprises: an insulating substrate; and an optical portion formed on the insulating substrate for receiving a CW laser beam and varying the intensity of the beam in order of strength-weakness, strength-weakness, and strength-weakness on one dimension, so that an amorphous silicon thin film is crystallized. Therefore, the present invention can form a good polycrystalline silicon thin film by growing crystal grains with a constant direction and size, when an amorphous silicon thin film disposed on an insulating film such as a glass substrate is crystallized to a polycrystalline silicon thin film.
Abstract:
A display with a window assembly includes a case unit with an opening and having a stepped part in at least one side of an edge of the opening; a window member having a first surface coupled with the stepped part; a display unit closely adhered on a first side to a second surface of the window member; a backlight unit provided on a second side of the display unit, so as to project light to the display unit, the backlight unit having a housing unit for enclosing the display unit, and closely adhered to at least one portion of the window member that is not closely adhered to the display unit; and an adhesion unit arranged between the backlight unit and the window member to adhere the backlight unit and the window member to each other.
Abstract:
The present invention is related to a polycrystalline silicon film containing Ni which is formed by crystallizing an amorphous silicon layer containing nickel. The present invention includes a polycrystalline silicon film wherein the polycrystalline film contains Ni atoms of which density ranges from 2×1017 to 5×1019 atoms/cm3 on average and comprises a plurality of needle-shaped silicon crystallites. In another aspect, the present invention includes a polycrystalline silicon film wherein the polycrystalline film contains Ni atoms of which density ranges from 2×1017 to 5×1019 atoms/cm3, comprises a plurality of needle-shaped silicon crystallites and is formed on an insulating substrate. Such a polysilicon film according to the present invention avoids metal contamination usually generated in a conventional method of metal induced crystallization.
Abstract translation:本发明涉及通过使包含镍的非晶硅层结晶而形成的含有Ni的多晶硅膜。 本发明包括多晶硅膜,其中多晶膜含有浓度范围为2×10 17至5×10 19原子/ cm 3的Ni原子。 并且包括多个针状硅微晶。 另一方面,本发明包括多晶硅膜,其中多晶膜含有密度为2×10 17至5×10 19原子/ cm 3的Ni原子 包括多个针状硅微晶,并形成在绝缘基板上。 根据本发明的这种多晶硅膜避免了通常以常规的金属诱导结晶方法产生的金属污染。
Abstract:
A method for crystallizing an amorphous film by using an electric field and an ultraviolet (UV) ray, and method for fabricating an LCD by using the same. The method for crystallizing an amorphous film includes forming an amorphous film having a catalytic metal deposited thereon on a substrate, irradiating a UV ray on the amorphous film, and applying an electric field to the amorphous film.
Abstract:
The present invention is related to a method of crystallizing an amorphous silicon layer and a crystallizing apparatus thereof which crystallize an amorphous silicon layer using plasma. The present invention includes the steps of depositing an inducing substance for silicon crystallization on an amorphous silicon layer by plasma exposure, and carrying out annealing on the amorphous silicon layer to the amorphous silicon layer. The present invention includes a chamber having an inner space, a substrate support in the chamber wherein the substrate support supports a substrate, a plasma generating means in the chamber wherein the plasma generating means produces plasma inside the chamber, and a heater at the substrate support wherein the heater supplies the substrate with heat.
Abstract:
Disclosed is a slide-type mobile communication terminal capable of mounting a memory card, wherein the memory card can be easily mounted/detached and a mounted state of the memory card can be stably maintained while minimizing a thickness increase of the terminal due to the mount of the memory card, by forming a receiving recess for mounting the memory card on a rear surface of a slide cover. A slide-type mobile communication terminal according to the invention has advantages such that it is possible to mount/detach a memory card easily and to form a receiving recess that mounts the memory card without increasing the thickness of the sliding cover.
Abstract:
The present invention relates to a method of selectively depositing an organic semiconductor material and a method of manufacturing an organic semiconductor thin film transistor array. Since the thin film transistor array is formed by locally performing a plasma process on a substrate before depositing an organic semiconductor active layer on the substrate, the organic semiconductor material is deposited on only the organic semiconductor active layer having an island shape. Therefore, it is not necessary to use a shadow mask method or a photolithography method to manufacture an active matrix array. Accordingly, the present invention has advantages in that it is possible to obtain a high resolution thin film transistor array and to prevent characteristics of the thin film transistors in the array from being deteriorated.
Abstract:
Provided is a turbine type electric fuel pump for an automobile having a casing in which a pump portion and a motor portion are installed. The pump portion includes a fuel intake case having a fuel intake hole, a fuel discharge case having a fuel discharge hole, and an impeller installed on a pumping chamber. An inlet side ring type duct is connected to the fuel intake hole. An outlet side ring type duct is connected to the fuel discharge hole. The impeller includes a disc portion in which a shaft assembly portion is formed at the center thereof, a plurality of blades extending from an outer circumferential surface of the disc portion outwardly in a radial direction, and a ring portion connecting the blades along the outer circumferential surface of the disc portion. The outer circumferential surface of the disc portion gradually protrudes outwardly in a radial direction of the impeller from both upper and lower sides thereof to a center thereof. The inner circumferential surface of the ring portion gradually protrudes inwardly in a radial direction of the impeller from both upper and lower sides thereof to a center thereof.
Abstract:
A method for crystallizing an amorphous film by doping phosphorus and using FE-MIC, and method for fabrication an LCD by using the same. The method for crystallizing an amorphous film includes forming an amorphous film containing an impurity on a substrate, forming a metal layer on the amorphous film, heat treating the amorphous film, and applying an electric field to the amorphous film.
Abstract:
A method of fabricating a thin film transistor includes the steps of forming an active layer on an insulating substrate; forming an insulating layer and a first metal layer on the active layer; forming a photoresist pattern for forming a gate electrode on the metal layer; etching the metal layer and the insulating layer by using the photoresist pattern as a mask, and respectively forming a gate electrode and a gate insulating layer to expose a part of the active layer; forming an amorphous silicon layer on the resultant whole surface substrate; forming a second metal layer on the amorphous silicon layer; patterning the second metal layer and the amorphous silicon layer by a photolithographic process to form an offset layer and a source/drain electrode; and carrying out a lift-off process to remove the photoresist pattern, and exposing the surface on the gate electrode.