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公开(公告)号：US5550878A
公开(公告)日：1996-08-27
申请号：US336846
申请日：1994-11-09
CPC分类号： H04L25/4912 , H03D3/001 , H04L7/033 , H04L7/0066 , H04L7/0083
摘要： A phase comparator, a loop filter and a VCO compose a PLL. In the phase comparator, a CMI code defined by a CMI data is synchronized with a VCO clock generated in the VCO and an inverted clock of the VCO clock, respectively, to provide first and second synchronized CMI codes. The first synchronized CMI code is delayed to provide a delayed CMI code by a predetermined time dependent on a period of the VCO clock. The first and second synchronized CMI codes are subject to an exclusive OR logic calculation, thereby generating a phase difference signal. The delayed CMI code and the first synchronized CMI code are subject to an exclusive OR logic calculation, and a result of this exclusive OR logic calculation and the VCO clock are subject to an AND logic calculation to provide an enable signal. Only when the enable signal is high, the phase difference signal is sampled to be used as a phase difference signal in the PLL.
摘要翻译： 相位比较器，环路滤波器和VCO组成PLL。 在相位比较器中，由CMI数据定义的CMI代码分别与VCO中产生的VCO时钟和VCO时钟的反相时钟同步，以提供第一和第二同步的CMI代码。 第一同步CMI代码被延迟以根据VCO时钟的周期提供延迟的CMI代码预定时间。 第一和第二同步CMI代码进行异或逻辑运算，从而产生相位差信号。 延迟CMI代码和第一同步CMI代码进行异或逻辑计算，并且该异或逻辑运算和VCO时钟的结果经过与逻辑运算以提供使能信号。 仅当使能信号为高电平时，相位差信号被采样以用作PLL中的相位差信号。
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公开(公告)号：US5179367A
公开(公告)日：1993-01-12
申请号：US557780
申请日：1990-07-26
申请人： Hiroaki Shimizu
发明人： Hiroaki Shimizu
CPC分类号： G09F7/18 , G09F2007/186 , Y10S248/919 , Y10S248/922 , Y10S345/905
摘要： In a suspended display apparatus suspended from a predetermined position, a display panel is supported substantially vertically by a front face of a case. A hook arrangement is mounted to an upper face of the case such that the hook arrangement is movable toward and away from the front face of the case. An elongated suspending arrangement has one end thereof fixedly mounted to the predetermined position. The other end of the elongated suspending arrangement is engaged with the hook arrangement.
摘要翻译： 在从预定位置悬挂的悬浮显示装置中，显示面板由壳体的正面基本垂直地支撑。 钩装置安装在壳体的上表面上，使得钩装置能够朝向和远离壳体的前表面移动。 细长悬挂装置的一端固定安装在预定位置上。 细长悬挂装置的另一端与钩装置接合。
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公开(公告)号：US08968990B2
公开(公告)日：2015-03-03
申请号：US13614017
申请日：2012-09-13
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
CPC分类号： G03F7/20 , G03F7/004 , G03F7/0045 , G03F7/0397 , G03F7/38
摘要： A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern.
摘要翻译： 一种形成抗蚀剂图案的方法，包括：步骤（1），其中将包含基底组分，光碱产生剂组分和酸供应组分的抗蚀剂组合物施加到基底上以形成抗蚀剂膜; 步骤（2），其中抗蚀剂膜经受曝光而不经受预烘烤; 步骤（3），其中在步骤（2）之后进行烘烤，使得在抗蚀剂膜的暴露部分，曝光时由光产生剂组分产生的碱和源自酸供应组分的酸被中和， 并且在抗蚀剂膜的未曝光部分，通过来自酸供应成分的酸的作用，碱成分在碱性显影液中的溶解度增加; 和步骤（4），其中抗蚀剂膜经受碱显影，从而形成负色调抗蚀剂图案。
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64.发明授权Resist composition for negative development and method of forming resist pattern 有权抗蚀剂组成为负面发展和形成抗蚀剂图案的方法公开(公告)号：US08765354B2
公开(公告)日：2014-07-01
申请号：US13440090
申请日：2012-04-05
申请人： Yoshiyuki Utsumi , Hiroaki Shimizu
发明人： Yoshiyuki Utsumi , Hiroaki Shimizu
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes: forming a resist film on a substrate using the resist composition; conducting exposure of the resist film; and patterning the resist film by negative development using a developing solution containing the organic solvent to form a resist pattern, wherein the acid generator component (B) contains an acid generator (B1) that generates an acid having a log P value of 2.7 or less and also a pKa value of at least −3.5.
摘要翻译： 用于阴性显影的抗蚀剂组合物，包括在酸的作用下在有机溶剂中显示降低的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B）; 以及在形成抗蚀剂图案的方法中使用的抗蚀剂组合物，其包括：使用抗蚀剂组合物在基板上形成抗蚀剂膜; 进行抗蚀剂膜的曝光; 并使用含有有机溶剂的显影溶液通过负显影对抗蚀剂膜进行图案化以形成抗蚀剂图案，其中酸产生剂组分（B）含有产生logP值为2.7以下的酸的酸产生剂（B1） 并且pKa值至少为-3.5。
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公开(公告)号：US20140109771A1
公开(公告)日：2014-04-24
申请号：US13979885
申请日：2011-08-24
申请人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
发明人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
IPC分类号： A47J31/44
CPC分类号： A47J31/44 , A23F5/262 , A47J31/407 , B65D85/8043
摘要： A roasted plant extraction apparatus is provided which is capable of selectively reducing excessive bitterness in an extract liquid obtained by water extraction from a roasted plant raw material while preserving desirable flavor ingredients and body. A beverage extraction apparatus includes a granule containing part containing granules for extraction of a beverage, first pouring device for pouring an extraction solvent into the granule containing part from a first direction, and collecting device for collecting a coffee extract liquid extracted by device of the extraction solvent at the side of layers of the coffee granules corresponding to the first direction. The granule containing part is provided with a detachable restraining member for placing the granules for extraction of a beverage in a substantially sealed state.
摘要翻译： 本发明提供了一种焙烤植物提取装置，其能够选择性地减少通过从焙烤植物原料中提取水而获得的提取液中的过度的苦味，同时保留理想的风味成分和身体。 一种饮料提取装置，包括：含有颗粒的含有颗粒的颗粒，用于提取饮料;第一倾倒装置，用于从第一方向将提取溶剂注入到所述颗粒容纳部分;以及收集装置，用于收集通过提取装置提取的咖啡提取液 咖啡颗粒层对应于第一方向的溶剂。 颗粒容纳部分设置有用于将基本上密封状态的饮料提取的颗粒放置的可拆卸的限制构件。
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公开(公告)号：US08614049B2
公开(公告)日：2013-12-24
申请号：US13313990
申请日：2011-12-07
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).
摘要翻译： 一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸 发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的 或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。
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公开(公告)号：US20130081278A1
公开(公告)日：2013-04-04
申请号：US13600490
申请日：2012-08-31
IPC分类号： B26B19/28
CPC分类号： B26B19/063
摘要： A hair remover comprises a main unit having a gripper, a head unit having a blade for removing hair, and a drive unit for driving said blade. The hair remover further comprises a rotating mechanical section and a rotating mechanical section. Said rotating mechanical section has a turn plate which is configured to rotate with respect to said main unit. Said main unit supports rotatably said head unit through said turn plate. Said swinging mechanical section is configured to swing said head unit with respect to said turn plate.
摘要翻译： 毛发去除器包括具有夹持器的主单元，具有用于去毛发的刀片的头单元和用于驱动所述刀片的驱动单元。 除毛器还包括旋转机械部分和旋转机械部分。 所述旋转机械部分具有相对于所述主单元旋转的转板。 所述主单元通过所述转板支撑所述头单元。 所述摆动机械部分构造成相对于所述转板摆动所述头单元。
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公开(公告)号：US20130017500A1
公开(公告)日：2013-01-17
申请号：US13467549
申请日：2012-05-09
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
IPC分类号： G03F7/20
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/203 , G03F7/2041 , G03F7/26 , G03F7/38
摘要： A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.
摘要翻译： 一种形成抗蚀剂图案的方法，包括使用包含在碱性显影液中显示出增加的溶解度的基础成分的抗蚀剂组合物和光产生剂组分在基材上形成抗蚀剂膜; 曝光抗蚀膜; 烘烤曝光的抗蚀剂膜，使得在曝光部分，曝光时由光产生器部件产生的基底和提供给抗蚀剂膜的酸被中和，并且在抗蚀剂膜的未曝光部分， 碱性成分在碱性显影液中的溶解度通过提供于抗蚀剂膜的酸而增加; 并对抗蚀剂膜进行碱显影，从而形成抗蚀剂膜的未曝光部分已被溶解并除去的负色调抗蚀剂图案。
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69.发明授权Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern 有权化合物及其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US08252505B2
公开(公告)日：2012-08-28
申请号：US12371876
申请日：2009-02-16
IPC分类号： G03F7/004 , C07D493/08 , C07D495/08
CPC分类号： C07D493/08 , C07D493/18 , G03F7/0045 , G03F7/0397
摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z− (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸 [化学式1] A + Z-（b1-2）其中A +表示有机阳离子，由式（b1-2）表示的化合物组成的发生剂（B1） Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成 酯键直接键合到环结构上，另一个基团包括阴离子部分。
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公开(公告)号：US08068957B2
公开(公告)日：2011-11-29
申请号：US12069051
申请日：2008-02-07
申请人： Hiroaki Shimizu
发明人： Hiroaki Shimizu
IPC分类号： B60R22/00
CPC分类号： B60R1/00 , B60R2300/105 , B60R2300/301 , B60R2300/404 , B60R2300/70 , B60R2300/806 , B62D15/027
摘要： A vehicular backing operation assist apparatus is coupled with a movement direction demand unit for demanding a forward or backward movement of the vehicle and a change detection unit for detecting a change of a state of the vehicle taking place in association with a start-up of the vehicle. A reverse departure, which is a backing operation for exiting a parking state, is determined to be performed if a transit period from when the change of the state is detected to when the backward movement is demanded, is within a predetermined period. A reverse parking, which is a backing operation for entering a parking state, is performed, if the transit period is greater than or equal to the predetermined period. An assist control unit then provides an assist item for a backing operation relative to either the reverse departure or the reverse parking, which is determined to be performed.
摘要翻译： 车辆背衬操作辅助装置与用于要求车辆的向前或向后移动的移动方向要求单元联接，以及变化检测单元，用于检测与起动的车辆的状态的变化， 车辆。 如果从检测到状态的改变到需要向后移动的过渡时间在预定时间段内，则确定作为退出停车状态的后退操作的反向离开。 如果过渡期间大于或等于预定周期，则执行作为进入停车状态的后退操作的倒车停车。 然后，辅助控制单元提供相对于被确定要执行的反向离开或倒车停放的后台操作的辅助项目。
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