Photoconductive member having light receiving layer of A-Ge/A-Si and C
    62.
    发明授权
    Photoconductive member having light receiving layer of A-Ge/A-Si and C 失效
    具有A-Ge / A-Si和C的光接收层的感光体

    公开(公告)号:US4642277A

    公开(公告)日:1987-02-10

    申请号:US663965

    申请日:1984-10-23

    IPC分类号: G03G5/082 G03G5/085

    CPC分类号: G03G5/08228

    摘要: A photoconductive member is provided which has substrate for photoconductive member and a light-receiving layer having photoconductivity with a layer constitution in which a first layer region (G) comprising an amorphous material containing germanium atoms and a second layer region (S) exhibiting photoconductivity consisting of an amorphous material containing silicon atoms are successively provided from the aforesaid substrate side, said light-receiving layer containing carbon atoms together with a substance (C) for controlling conductivity in a distribution state such that, in said light-receiving layer, the maximum value C(PN).sub.max of the distribution concentration of said substance (c) in the layer thickness direction exists within said second layer region (S) and, in said second layer region (S), said substance (C) is distributed in greater amount on the side of said substrate.

    摘要翻译: 提供了一种光电导元件,其具有用于光电导元件的基底和具有光导电性的光接收层,该光接收层具有层结构,其中包含含有锗原子的非晶态材料的第一层区域(G)和显示光电导性的第二层区域(S) 含有硅原子的非晶质材料从上述基底侧连续提供,所述光接收层含有碳原子和物质(C),用于在分布状态下控制导电性,使得在所述光接收层中,最大 所述物质(c)在层厚度方向上的分布浓度的值C(PN)max存在于所述第二层区域(S)内,并且在所述第二层区域(S)中,所述物质(C)分布得更大 量在所述衬底的一侧。

    Photoconductive member having light receiving layer of a-(Si-Ge) and C
    63.
    发明授权
    Photoconductive member having light receiving layer of a-(Si-Ge) and C 失效
    具有 - (Si-Ge)和C的光接收层的感光体

    公开(公告)号:US4585720A

    公开(公告)日:1986-04-29

    申请号:US649713

    申请日:1984-09-12

    IPC分类号: G03G5/082 G03G5/085

    CPC分类号: G03G5/08242 G03G5/08228

    摘要: A photoconductive member comprises a substrate, a layer composed of an amorphous material comprising Si and Ge, said layer having a layer region (C) containing carbon atoms. The layer region (C) has a region (X) where the concentration of carbon atoms increases in the direction of layer thickness toward the upper surface of said layer.An amorphous layer of silicon containing at least one of nitrogen and oxygen may overlie said layer.

    摘要翻译: 感光构件包括基底,由包含Si和Ge的无定形材料构成的层,所述层具有含有碳原子的层区域(C)。 层区域(C)具有其中碳原子浓度朝向所述层的上表面的层厚度方向增加的区域(X)。 含有氮和氧中的至少一种的硅的非晶层可以覆盖在所述层上。

    Photoconductive member containing amorphous silicon and germanium
    64.
    发明授权
    Photoconductive member containing amorphous silicon and germanium 失效
    含有非晶硅和锗的光导体

    公开(公告)号:US4572882A

    公开(公告)日:1986-02-25

    申请号:US647693

    申请日:1984-09-06

    摘要: A photoconductive member is provided which comprises a substrate and a photoconductive light receiving layer made up of an amorphous material containing silicon atoms and germanium atoms, the light receiving layer containing nitrogen atoms and having a first layer region (1), a third layer region (3), and a second layer region (2) of nitrogen atom distribution concentrations C(1), C(3), and C(2), respectively, in the thickness direction, in that order from the substrate side to the opposite side, wherein C(3) is higher than any of C(2) and C(1) and one of C(1) and C(2) is not zero.

    摘要翻译: 提供了一种感光构件,其包括由包含硅原子和锗原子的非晶材料构成的基底和光电导光接收层,所述光接收层含有氮原子并具有第一层区域(1),第三层区域 3)以及厚度方向上的氮原子分布浓度C(1),C(3)和C(2)的第二层区域(2),从基板侧到相对侧 其中C(3)高于C(2)和C(1)中的任何一个,C(1)和C(2)中的一个不为零。

    Photoconductive member comprising a hydrogenated or halogenated
amorphous silicon and geranium layer
    65.
    发明授权
    Photoconductive member comprising a hydrogenated or halogenated amorphous silicon and geranium layer 失效
    包含氢化或卤化非晶硅和天竺葵层的感光体

    公开(公告)号:US4567127A

    公开(公告)日:1986-01-28

    申请号:US647539

    申请日:1984-09-05

    IPC分类号: G03G5/082 H01L31/20 G03G5/08

    摘要: A photoconductive member is provided which comprises a substrate and a light receiving layer having photoconductivity which comprises an amorphous material containing silicon atoms and germanium atoms, the distribution of germanium atoms therein being nonuniform in the layer thickness direction, and carbon atoms being contained in the light receiving layer.Said photoconductive member can further comprise thereon another layer which comprises amorphous material containing silicon atoms as a matrix and at least one kind of atoms selected from the group of nitrogen atoms and oxygen atoms.

    摘要翻译: 提供了一种感光构件,其包括基底和具有光电导率的光接收层,其包含含有硅原子和锗原子的非晶态材料,其中锗原子在层厚度方向上的分布不均匀,并且包含在光中的碳原子 接收层。 所述光导体可进一步包括另一层,该层包含含有硅原子作为基体的非晶材料和至少一种选自氮原子和氧原子的原子。

    Method for forming a deposition film
    66.
    发明授权
    Method for forming a deposition film 失效
    沉积膜形成方法

    公开(公告)号:US4546008A

    公开(公告)日:1985-10-08

    申请号:US667816

    申请日:1984-11-02

    摘要: A method for forming a deposition film comprises applying an excitation energy to a silane compound (SiOA) in a gaseous state having at least one substituent (OA) of the formula of --OC.sub.a H.sub.b X.sub.c where b+c=2a+1, a is a positive integer, b and c are zero or a positive integer, provided that b and c are not simultaneously zero and X is halogen atom to form a deposition film containing silicon atom on a substrate.A method for forming a deposition film comprises applying an excitation energy to a silane compound (SiA) in a gaseous state having 2-6 silicon atoms, having at least one substituent (A) of the formula of --C.sub.a H.sub.b X.sub.c where b+c=2a+1, a is a positive integer, b and c are zero or a positive integer, and X is halogen atom, containing at least one species selected from hydrogen atom and halogen atom, and further at least one of the silicon atoms present at the both ends bonding to only one species selected from hydrogen atom and halogen atom except for bonding to another silicon atom, to form a deposition film containing silicon atom on a substrate.

    摘要翻译: 一种用于形成沉积膜的方法包括向具有至少一个下式的-OCaHbXc的取代基(OA)的气态的硅烷化合物(SiOA)施加激发能,其中b + c = 2a + 1,a为正 如果b和c不是同时为零,而X是卤素原子以形成在衬底上含有硅原子的沉积膜,则整数,b和c为零或正整数。 形成沉积膜的方法包括向具有2-6个硅原子的气态的硅烷化合物(SiA)施加激发能,其具有至少一个下式的-CaHbXc的取代基(A),其中b + c = 2a +1,a为正整数,b和c为0或正整数,X为含有至少一个选自氢原子和卤素原子的卤原子,另外至少一个硅原子存在于 两端仅与一个选自氢原子和卤原子的物质结合,除了与另一个硅原子结合,以在基片上形成含有硅原子的沉积膜。

    Method for forming a deposited film containing IN or SN
    70.
    发明授权
    Method for forming a deposited film containing IN or SN 失效
    用于形成含有IN或SN的沉积膜的方法

    公开(公告)号:US4865883A

    公开(公告)日:1989-09-12

    申请号:US298202

    申请日:1989-01-17

    CPC分类号: C23C16/407

    摘要: A method for forming a deposited film comprises introducing a gaseous starting material containing In atoms or Sn atoms for formation of a deposited film, a gaseous halogenic oxidizing agent having the property of oxidation action for said starting material and an oxygen-containing gaseous compound into a reaction space to effect chemical contact therebetween to thereby form a plural number of precursors containing a presursor under excited state, and forming a deposited film on a substrate existing in a film forming space with the use of at least one precursor of these precursors as a feeding source for a constituent element of the deposited film.

    摘要翻译: 形成沉积膜的方法包括引入含有In原子或Sn原子的气态原料以形成沉积膜,将具有所述原料氧化作用的气态卤素氧化剂和含氧气体化合物引入到 反应空间以在其间进行化学接触从而形成多个在激发态下含有前体的前体,并且使用这些前体的至少一种前体作为进料,在存在于成膜空间中的基底上形成沉积膜 源的沉积膜的构成元素。