公开(公告)号：US20070052341A1

公开(公告)日：2007-03-08

申请号：US11452373

申请日：2006-06-14

申请人： Daisuke Imafuku ,  Hiroki Yoshikawa ,  Tetsu Ohishi

发明人： Daisuke Imafuku ,  Hiroki Yoshikawa ,  Tetsu Ohishi

IPC分类号： H01J1/62

CPC分类号： H05B33/22 ,  G09G3/3413 ,  G09G2310/024 ,  G09G2320/0626 ,  G09G2360/145 ,  H04N9/3155 ,  H04N9/3182 ,  H04N9/3194

摘要： The invention provides a technology suited to suppress decrease in the brightness of an image while preventing reduction in the contrast of the image caused by external light coming from the outside (from the viewer side of the image) of a screen. An image display surface (screen) of a projection type display device is provided with a front protective sheet including an optical filter member for absorbing specific wavelengths in the external light, especially among peak wavelengths of a three-wavelength fluorescent lamp. Moreover, LED's of three colors are used as a light source for forming an image. At least one of these LED's emits a light of a different wavelength from a peak wavelength that the front protective sheet absorbs. By this configuration, it is possible to prevent reduction in the contrast of an image caused by external light without decreasing the brightness of the image display device.

摘要翻译： 本发明提供了一种适合于抑制图像的亮度降低的技术，同时防止从外部（来自图像的观看者侧）的外部光引起的图像的对比度降低。 投影型显示装置的图像显示面（屏幕）设置有前保护片，其包括用于吸收外部光中的特定波长的滤光器构件，特别是在三波长荧光灯的峰值波长中。 此外，三种颜色的LED用作形成图像的光源。 这些LED中的至少一个发射与前保护片吸收的峰值波长不同波长的光。 通过这种配置，可以防止由外部光引起的图像的对比度降低，而不会降低图像显示装置的亮度。

公开(公告)号：US06806990B2

公开(公告)日：2004-10-19

申请号：US10302160

申请日：2002-11-21

申请人： Hiroki Yoshikawa ,  Masatoshi Ishii ,  Shigeru Konishi ,  Toru Shirasaki

发明人： Hiroki Yoshikawa ,  Masatoshi Ishii ,  Shigeru Konishi ,  Toru Shirasaki

IPC分类号： G20B613

CPC分类号： B32B17/06 ,  C03C27/06 ,  G02B7/008 ,  G02B7/025 ,  G02B7/028 ,  Y10T428/24942

摘要： There is provided A method for producing an optical device by bonding optical elements each other without using adhesive wherein the optical elements are bonded each other by using optical elements in which the relation between linear expansion coefficients &agr;1 and &agr;2 (/° C.) of each of the optical elements to be bonded and thickness t2 (m) of one of the optical elements satisfies the following formula: |(&agr;1−&agr;2)×t2|≦10−9 and t2≧2×10−5; and/or, by sticking the optical elements each other in the state of being heated, and then subjecting them to a heat treatment. There can be provided a small size and highly reliable optical devise by bonding optical elements each other without using an adhesive at a low cost.

摘要翻译： 提供了一种用于通过将光学元件彼此粘合而不使用粘合剂来制造光学器件的方法，其中光学元件通过使用其中每个的线膨胀系数α1和α2（℃）之间的关系的光学元件彼此接合 的光学元件的厚度t2（μm）满足下列公式：|（α1-α2）xt2 | <= 10-9和t2> = 2x10-5。 和/或通过在加热状态下将光学元件彼此粘合，然后对其进行热处理。 可以通过以低成本使用粘合剂将光学元件彼此粘合而提供小尺寸和高可靠性的光学设备。

公开(公告)号：US06462794B1

公开(公告)日：2002-10-08

申请号：US09414481

申请日：1999-10-08

申请人： Hiroki Yoshikawa ,  Tetsu Ohishi ,  Hideo Tanide ,  Takesuke Maruyama ,  Goro Ohnishi ,  Takashi Iwata ,  Takeshi Igarashi

发明人： Hiroki Yoshikawa ,  Tetsu Ohishi ,  Hideo Tanide ,  Takesuke Maruyama ,  Goro Ohnishi ,  Takashi Iwata ,  Takeshi Igarashi

IPC分类号： G02F11335

CPC分类号： G02B3/0062 ,  G02B3/0031 ,  G02B3/0068 ,  G02B3/0075 ,  G02F1/133526 ,  H04N5/7441 ,  H04N9/3141 ,  H04N9/3147

摘要： An enlarging unit comprises a concave Fresnel lens warped convexly toward an image forming unit side, the image forming unit is held between a light transmissible support plate warped convexly toward the image forming unit side and the enlarging unit warped convexly toward the image forming unit side, and peripheries of the support plate and the enlarging unit are fixed or semi-fixed. Thereby, deformation caused when the incident side and emission side micro-lens arrays are molded and deformation due to environmental temperature and humidity change are corrected, and both components are always maintained in close contact.

摘要翻译： 放大单元包括朝向图像形成单元侧凸出翘曲的凹形菲涅尔透镜，图像形成单元保持在朝向图像形成单元侧凸形弯曲的透光性支撑板和朝向图像形成单元侧凸起的扩大单元之间， 并且支撑板和放大单元的周边是固定的或半固定的。 由此，修正了入射侧和发射侧微透镜阵列成型引起的变形，并且由于环境温度和湿度变化引起的变形，并且两者都始终保持紧密接触。

公开(公告)号：US06201516B1

公开(公告)日：2001-03-13

申请号：US08951293

申请日：1997-10-16

申请人： Hideo Tanide ,  Tetsu Ohishi ,  Hiroki Yoshikawa

发明人： Hideo Tanide ,  Tetsu Ohishi ,  Hiroki Yoshikawa

IPC分类号： G09G500

CPC分类号： G09F19/18 ,  A63J25/00 ,  A63J2005/002 ,  H04N9/3147

摘要： In a description and drawings of the present application disclosed are, as the invention, (1) a projector for projecting an optimum image face having a convex configuration at a side of the projector, (2) a projecting system provided with the projector and a translucent screen with a substantially spherical configuration on which an image from the projector is formed, (3) a system for sensation provided with the projecting system, a seat at which a viewer is seated, a motion drive device for displacing the seat, a motion control device for controlling operation of the motion drive device, and an image control device for controlling an image projected by the projector while instructing the motion drive device to displace the seat in accordance with a change in the image, and (4) a method of manufacturing a screen provided with a light diffusing layer forming step of warming and softening a transparent thermoplastic resin sheet including a particle of a light diffusion material and pressing a light transmitting layer with a convex configuration against the thermoplastic resin sheet to closely fix thereto.

摘要翻译： 在所公开的本申请的描述和附图中，作为本发明，（1）一种投影仪，用于在投影仪的一侧投影具有凸形结构的最佳图像面，（2）设置有投影仪的投影系统和 具有基本上球形的半透明屏幕，其上形成有来自投影仪的图像，（3）设置有投影系统的感觉系统，观察者坐下的座椅，用于移动座椅的运动驱动装置，运动 用于控制运动驱动装置的操作的控制装置，以及图像控制装置，用于在指示运动驱动装置根据图像的变化来移动座椅时控制由投影仪投影的图像，以及（4） 制造具有光漫射层形成步骤的屏幕，所述光扩散层形成步骤使包含光漫射材料的颗粒的透明热塑性树脂片材变暖并软化并压制 将具有凸形结构的透光层抵靠热塑性树脂片紧密固定。

公开(公告)号：US08920666B2

公开(公告)日：2014-12-30

申请号：US12779998

申请日：2010-05-14

申请人： Shinichi Igarashi ,  Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa ,  Yoshinori Kinase

发明人： Shinichi Igarashi ,  Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa ,  Yoshinori Kinase

IPC分类号： C23F3/00 ,  G03F1/26 ,  H01L21/311 ,  G03F1/00 ,  G03F1/80 ,  G03F1/30 ,  G03F1/32

CPC分类号： G03F1/26 ,  G03F1/14 ,  G03F1/30 ,  G03F1/32 ,  G03F1/80 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/31138

摘要： Disclosed herein is a dry etching method for a work layer formed over a substrate, including the steps of forming a hard mask layer over the work layer formed over the substrate, forming a resist pattern over the hard mask layer, transferring the resist pattern to the hard mask layer by first dry etching conducted using the resist pattern, and patterning the work layer by second dry etching conducted using a hard mask pattern obtained upon the transfer to the hard mask layer, wherein after the hard mask layer is patterned by the first dry etching, the patterning of the work layer by the second dry etching is conducted through changing the concentration of an auxiliary ingredient of a dry etching gas, without changing a main ingredient of the dry etching gas, in an etching apparatus in which the first dry etching has been conducted.

摘要翻译： 本文公开了一种用于在衬底上形成的工作层的干式蚀刻方法，包括以下步骤：在形成在衬底上的工作层上形成硬掩模层，在硬掩模层上形成抗蚀剂图案，将抗蚀剂图案转移到 硬掩模层，通过使用抗蚀剂图案进行的第一干蚀刻，以及通过使用在转印到硬掩模层上获得的硬掩模图案进行的第二干蚀刻来对工作层进行图案化，其中在硬掩模层通过第一干法 蚀刻时，通过在蚀刻装置中改变干蚀刻气体的辅助成分的浓度而不改变干蚀刻气体的主要成分，通过第二干蚀刻进行工作层的图案化，其中第一干蚀刻 已经进行。

公开(公告)号：US08709686B2

公开(公告)日：2014-04-29

申请号：US13883850

申请日：2011-11-18

申请人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

发明人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

IPC分类号： G03F1/50

摘要： In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

公开(公告)号：US20130230796A1

公开(公告)日：2013-09-05

申请号：US13883850

申请日：2011-11-18

申请人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

发明人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

IPC分类号： G03F1/50

CPC分类号： G03F1/80 ,  B32B15/01 ,  C22C27/06 ,  C23C14/0641 ,  C23C14/0676 ,  G03F1/00 ,  G03F1/30 ,  G03F1/50 ,  G03F1/54

摘要： In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

公开(公告)号：US08148036B2

公开(公告)日：2012-04-03

申请号：US12750044

申请日：2010-03-30

申请人： Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa

发明人： Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： G03F1/32 ,  G03F1/58 ,  G03F1/80

摘要： A photomask blank comprises a transparent substrate, a light-shielding film of an optionally transition metal-containing silicon material, and an etching mask film of a chromium compound base material. The etching mask film consists of multiple layers of different composition which are deposited by reactive sputtering, the multiple layers including, in combination, a first layer of a material which imparts a compression stress when deposited on the substrate as a single composition layer and a second layer of a material which imparts a tensile stress when deposited on the substrate as a single composition layer.

摘要翻译： 光掩模坯料包括透明基板，任选含过渡金属的硅材料的遮光膜和铬化合物基材的蚀刻掩模膜。 蚀刻掩模膜由通过反应溅射沉积的不同组成的多层组成，多层组合包括当作为单一组合物层沉积在基板上时施加压缩应力的材料的第一层，第二层 当作为单一组合物层沉积在基材上时施加拉伸应力的材料层。

公开(公告)号：US07989124B2

公开(公告)日：2011-08-02

申请号：US12820908

申请日：2010-06-22

申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Tadashi Saga ,  Yosuke Kojima ,  Kazuaki Chiba ,  Yuichi Fukushima

发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Tadashi Saga ,  Yosuke Kojima ,  Kazuaki Chiba ,  Yuichi Fukushima

IPC分类号： G03F1/00

CPC分类号： G03F1/32 ,  C23F4/00 ,  G03F1/30 ,  G03F1/46 ,  G03F1/54 ,  G03F1/80 ,  Y10T428/31616

摘要： A photomask blank comprises a transparent substrate, a light-shielding film deposited on the substrate and comprising a metal or metal compound susceptible to fluorine dry etching, and an etching mask film deposited on the light-shielding film and comprising another metal or metal compound resistant to fluorine dry etching. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.

摘要翻译： 光掩模坯料包括透明基板，沉积在基板上并包含易受氟干蚀刻影响的金属或金属化合物的遮光膜，以及沉积在遮光膜上并包含另一金属或金属化合物的蚀刻掩模膜 到氟干蚀刻。 当光屏蔽膜被干蚀刻以形成图案时，由图案密度依赖性引起的图案尺寸变化减小，使得以高精度产生光掩模。

公开(公告)号：US20100291478A1

公开(公告)日：2010-11-18

申请号：US12779998

申请日：2010-05-14

申请人： Shinichi IGARASHI ,  Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa ,  Yoshinori Kinase

发明人： Shinichi IGARASHI ,  Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa ,  Yoshinori Kinase

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： G03F1/26 ,  G03F1/14 ,  G03F1/30 ,  G03F1/32 ,  G03F1/80 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/31138

摘要： Disclosed herein is a dry etching method for a work layer formed over a substrate, including the steps of forming a hard mask layer over the work layer formed over the substrate, forming a resist pattern over the hard mask layer, transferring the resist pattern to the hard mask layer by first dry etching conducted using the resist pattern, and patterning the work layer by second dry etching conducted using a hard mask pattern obtained upon the transfer to the hard mask layer, wherein after the hard mask layer is patterned by the first dry etching, the patterning of the work layer by the second dry etching is conducted through changing the concentration of an auxiliary ingredient of a dry etching gas, without changing a main ingredient of the dry etching gas, in an etching apparatus in which the first dry etching has been conducted.

摘要翻译： 本文公开了一种用于在衬底上形成的工作层的干式蚀刻方法，包括以下步骤：在形成在衬底上的工作层上形成硬掩模层，在硬掩模层上形成抗蚀剂图案，将抗蚀剂图案转移到 硬掩模层，通过使用抗蚀剂图案进行的第一干蚀刻，以及通过使用在转印到硬掩模层上获得的硬掩模图案进行的第二干蚀刻来对工作层进行图案化，其中在硬掩模层通过第一干法 蚀刻时，通过在蚀刻装置中改变干蚀刻气体的辅助成分的浓度而不改变干蚀刻气体的主要成分，通过第二干蚀刻进行工作层的图案化，其中第一干蚀刻 已经进行。