公开(公告)号：US07453645B2

公开(公告)日：2008-11-18

申请号：US11025601

申请日：2004-12-30

申请人： Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G02B27/14 ,  G02B3/00 ,  G02B27/10

CPC分类号： G21K1/06 ,  G03F7/70575 ,  G21K2201/067

摘要： A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

摘要翻译： 光谱纯度滤光器包括孔，孔具有直径，其中光谱纯度滤光器被配置为通过反射第一波长的辐射并允许第二波长的至少一部分辐射来增强辐射束的光谱纯度 通过孔径传播，第一波长大于第二波长。 光谱纯度滤光片可用于提高极紫外（EUV）辐射束的光谱纯度。

公开(公告)号：US20080275319A1

公开(公告)日：2008-11-06

申请号：US12158714

申请日：2006-12-26

申请人： Antonius Theodorus Martinus Van Gogh ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Antonius Theodorus Martinus Van Gogh ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： A61B5/01 ,  A61B5/1491 ,  A61B5/1477

CPC分类号： A61B5/0095 ,  A61B5/01 ,  A61B5/14532 ,  A61B5/14546 ,  A61B5/441 ,  A61B5/4869

摘要： A non-invasive system and method for measuring skin hydration of a subject comprising a thermistor (7) used in transient mode to obtain a measurement of the thermal conductivity of the skin of the subject and a processor (8) for determining a skin hydration value from the thermal conductivity measurement. The system for measuring skin hydration may be comprised in a non-invasive system for detecting blood analyte concentration, preferably glucose, including a spectroscopic device having e.g. an infrared source (2) which generates infrared beam (3) and detector (6) for detecting transmitted radiation through portion 1 (e.g. finger) of a subject. The system may also include skin hydrator (9) which moisturises the skin connected in a control loop to the system for measuring skin hydration. The system for detecting blood analyte concentration may include a photoacoustic device or a metabolic heat conformation device.

摘要翻译： 一种用于测量受试者的皮肤水合的非侵入性系统和方法，包括在瞬态模式中使用的热敏电阻（7）以获得对象皮肤的热导率的测量值和用于确定皮肤水合值的处理器（8） 从热导率测量。 用于测量皮肤水合的系统可以包含在用于检测血液分析物浓度的非侵入性系统中，优选葡萄糖，包括具有例如血液的分光装置。 产生用于检测通过被摄体的部分1（例如手指）的透射辐射的红外光束（3）和检测器（6）的红外源（2）。 该系统还可以包括皮肤水分器（9），其将在控制回路中连接的皮肤保湿到用于测量皮肤水合的系统。 用于检测血液分析物浓度的系统可以包括光声装置或代谢热构造装置。

公开(公告)号：US20080269580A1

公开(公告)日：2008-10-30

申请号：US12158469

申请日：2006-12-12

申请人： Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Antonius Theodorus Martinus Van Gogh

发明人： Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Antonius Theodorus Martinus Van Gogh

IPC分类号： A61B5/01 ,  A61B5/1468 ,  A61B8/06

CPC分类号： A61B5/0066 ,  A61B5/015 ,  A61B5/14532 ,  A61B5/1455

摘要： A system and method for non-invasive measurement of glucose concentration in a live subject including a thermal emission spectroscopy (TES) device 10, an optical coherence tomography (OCT) device 20 or near infrared diffuse reflectance (NIDR) device. The TES 10 generates a signal indicative of the absorbtion of glucose, from which the blood glucose concentration is determined and the OCT device 20 generates a signal indicative of the scattering coefficient of a portion of the live subject, from which the blood glucose concentration is determined. The signals generated by the TES and OCT devices along with signals generated by sensors for measuring the body heat and surface temperature of the subject are used in the metabolic heat conformation (MHC) method of determining blood glucose concentration. The system may include a photoacoustic sensor for generating a signal indicative of thermo-elastic skin properties from which the blood glucose concentration is also determined.

摘要翻译： 包括热发射光谱（TES）装置10，光学相干断层摄影（OCT）装置20或近红外漫反射（NIDR）装置的活体内的葡萄糖浓度无创测量的系统和方法。 TES10产生指示葡萄糖吸收的信号，从该葡萄糖中测定血糖浓度，并且OCT装置20产生指示活体受试者的一部分的散射系数的信号，从该血糖浓度确定血葡萄糖浓度 。 在测定血糖浓度的代谢热构象（MHC）方法中使用由TES和OCT装置产生的信号以及由传感器产生的用于测量受试者体温和表面温度的信号。 该系统可以包括光声传感器，用于产生指示也确定血糖浓度的热弹性皮肤特性的信号。

公开(公告)号：US20080217558A1

公开(公告)日：2008-09-11

申请号：US12067309

申请日：2006-09-18

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Henk Van Houten ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Henk Van Houten ,  Derk Jan Wilfred Klunder

IPC分类号： G21H3/02

CPC分类号： G02B5/3058 ,  G01N21/6445 ,  G01N21/648 ,  G01N2021/036 ,  G01N2021/6482

摘要： The present invention proposes a sub-wavelength luminescence sensor, such as e.g. a luminescence biosensor or a luminescence chemical sensor, comprising at least two wire grids (1, 2) positioned perpendicular with respect to each other. The luminescence sensor, in which the excitation radiation is efficiently used and the luminescence radiation is efficiently detected, has an improved signal-to-noise ratio and a separated excitation and luminescence radiation.

摘要翻译： 本发明提出了一种亚波长发光传感器，例如， 发光生物传感器或发光化学传感器，其包括相对于彼此垂直定位的至少两个线栅（1,2）。 其中有效地利用激发辐射和有效地检测发光辐射的发光传感器具有改善的信噪比和分离的激发和发光辐射。

公开(公告)号：US07414700B2

公开(公告)日：2008-08-19

申请号：US11239479

申请日：2005-09-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

公开(公告)号：US20080142736A1

公开(公告)日：2008-06-19

申请号：US11637936

申请日：2006-12-13

申请人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

发明人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

公开(公告)号：US07355672B2

公开(公告)日：2008-04-08

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  C23G1/00 ,  G03C5/00

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US20080074655A1

公开(公告)日：2008-03-27

申请号：US11527731

申请日：2006-09-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G01N21/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US20080001101A1

公开(公告)日：2008-01-03

申请号：US11478303

申请日：2006-06-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  B08B7/00

摘要： A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

摘要翻译： 提供了用于EUV光刻设备（例如具有Sn源的EUV光刻设备）的清洁装置。 清洁装置包括用于含氢气体和氢根源的气体源。 氢自由基源是（UV）辐射源，其诱导氢的光解离。 自由基可以减少Sn氧化物（如果存在）和形成Sn沉积和/或碳沉积的挥发性氢化物。 以这种方式，清洁装置可用于从Sn和/或C沉积物清洁光学元件。 EUV源可以用作氢源。 使用滤光器去除不期望的EUV辐射并传输所需的UV辐射。

公开(公告)号：US07262423B2

公开(公告)日：2007-08-28

申请号：US11292310

申请日：2005-12-02

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Johannes Hubertus Josephina Moors ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Johannes Hubertus Josephina Moors ,  Derk Jan Wilfred Klunder

IPC分类号： G01B9/02

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70191 ,  G03F7/7055 ,  G03F7/70908 ,  G21K1/043 ,  G21K1/062

摘要： A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.

摘要翻译： 公开了一种用于产生辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的脉冲EUV源和安装在EUV源前面的光谱滤波器，用于选择性地通过来自EUV源的EUV辐射束的光谱范围。 光谱滤光器安装在可移动的安装座上，可移动的安装件被配置为与脉冲EUV源同步地移动，以防止从EUV源传播的碎屑撞击光谱滤波器。 因此，光谱滤波器基本上不受碎屑的污染。