Vertical cavity surface emitting laser including indium and antimony in the active region
    61.
    发明授权
    Vertical cavity surface emitting laser including indium and antimony in the active region 失效
    活性区域中包括铟和锑的垂直腔表面发射激光

    公开(公告)号:US06975660B2

    公开(公告)日:2005-12-13

    申请号:US10026020

    申请日:2001-12-27

    申请人: Ralph H. Johnson

    发明人: Ralph H. Johnson

    摘要: Quantum wells and associated barriers layers can be grown to include nitrogen (N), aluminum (Al), antimony (Sb), phosphorous (P) and/or indium (In) placed within or about a typical GaAs substrate to achieve long wavelength VCSEL performance, e.g., within the 1260 to 1650 nm range. In accordance with features of the present invention, a vertical cavity surface emitting laser (VCSEL), can include at least one quantum well comprised of InGaAsSb; barrier layers sandwiching said at least one quantum well; and confinement layers sandwiching said barrier layers. A vertical cavity surface emitting laser (VCSEL), can also include at least one quantum well comprised of InGaAsSbN. Barrier layers can be comprised of GaAsN, GaAsP, or AlGaAs. Confinement layers can be comprised of AlGaAs. Quantum wells can include N. Quantum wells can be developed up to and including 50 Å in thickness. Quantum wells can also be developed with a depth of at least 40 meV.

    摘要翻译: 可以生长量子阱和相关屏障层,以包括放置在典型GaAs衬底内或周围的氮(N),铝(Al),锑(Sb),磷(P)和/或铟(In),以实现长波长VCSEL 性能,例如在1260至1650 nm范围内。 根据本发明的特征,垂直腔表面发射激光器(VCSEL)可以包括由InGaAsSb组成的至少一个量子阱; 夹持所述至少一个量子阱的阻挡层; 以及夹持所述阻挡层的限制层。 垂直腔表面发射激光器(VCSEL)也可以包括由InGaAsSbN组成的至少一个量子阱。 阻挡层可以由GaAsN,GaAsP或AlGaAs组成。 限制层可以由AlGaAs组成。 量子阱可以包括N.量子阱可以发展到并且包括厚度为50埃。 量子阱也可以开发深度至少40 meV。

    Hybrid mirror VCSELs
    62.
    发明授权
    Hybrid mirror VCSELs 有权
    混合镜VCSEL

    公开(公告)号:US06798806B1

    公开(公告)日:2004-09-28

    申请号:US10233112

    申请日:2002-09-03

    IPC分类号: H01S500

    摘要: VCSELs having upper mirror structures comprised of a semiconductive top DBR, metal contacts, and a top mirror. The top DBR is thick enough for adequate current spreading, but thin enough, being no more than 3.5 microns, to enable easy fabrication of an isolation region. The top mirror, which is over the top DBR, enhances reflectivity. That top mirror is beneficially comprised of a dielectric material, such as TiO2; TiO2+SiO2 (robust and reliable); TiO2+Al2O3 (good thermal conductivity); or Si+MgO, or of a metal. The top mirror is beneficially formed using a vacuum deposition method, such as e-beam or sputtering. The metal contacts are formed on the top DBR. The VCSELs further include a substrate with an electrical contact, a bottom DBR, a bottom spacer, an active region, and a top spacer. Such VCSELs are particularly beneficial at long wavelengths.

    摘要翻译: 具有由半导体顶部DBR,金属触点和顶部反射镜组成的上部反射镜结构的VCSEL。 顶部DBR足够厚以便充分的电流扩展,但足够薄,不超过3.5微米,以便容易地制造隔离区域。 顶部镜像,超过顶部的DBR,增强了反射率。 该顶镜有利地由诸如TiO 2的电介质材料组成; TiO2 + SiO2(坚固可靠); TiO2 + Al2O3(导热性好); 或Si + MgO,或金属。 使用诸如电子束或溅射的真空沉积方法有利地形成顶部反射镜。 金属触点形成在顶部DBR上。 VCSEL还包括具有电接触的基底,底部DBR,底部间隔物,有源区和顶部间隔物。 这样的VCSEL在长波长下是特别有益的。

    VCSEL structure insensitive to mobile hydrogen
    63.
    发明授权
    VCSEL structure insensitive to mobile hydrogen 有权
    VCSEL结构对流动氢不敏感

    公开(公告)号:US06459719B1

    公开(公告)日:2002-10-01

    申请号:US09819029

    申请日:2000-11-03

    申请人: Ralph H. Johnson

    发明人: Ralph H. Johnson

    IPC分类号: H01S5183

    摘要: An active region of a VCSEL at one (i.e., n doped) end having an expanded effectively undoped region, and another (i.e., p doped) end having a significantly doped region up to or even including a portion of the active region. A previous way had heavy doping of the n and p doped regions up to the active region, at least close to it or even partially into it.

    摘要翻译: 在一个(即,n掺杂)端具有扩展的有效未掺杂区域的VCSEL的有源区和另一个(即,p掺杂)端,其具有直到甚至包括有源区的一部分的显着掺杂区。 之前的方式是将n和p掺杂区域重掺杂到活性区域,至少接近或甚至部分地掺入其中。

    Laser with a selectively changed current confining layer
    64.
    发明授权
    Laser with a selectively changed current confining layer 失效
    具有选择性改变的电流限制层的激光器

    公开(公告)号:US5903588A

    公开(公告)日:1999-05-11

    申请号:US812620

    申请日:1997-03-06

    摘要: A laser structure is provided with two current confining layers of a material that is subject to oxidation in the presence of an oxidizing agent. The laser structure is shaped to expose edges of the current confining layers to permit the edges to be exposed to the oxidizing agent. The current confining layers are oxidized selectively to create electrically resistive material at the oxidized portions and electrically conductive material at the unoxidized portions. The unoxidized portions of the layers are surrounded by the oxidized and electrically resistive portions in order to direct current from one electrical contact pad by passing through a preselected portion of an active region of the laser. The laser structure can be a vertical cavity surface emitting laser. The device achieves the current confining and directing function without the need to use ion bombardment or implantation to provide the current confining structure within the body of the laser.

    摘要翻译: 激光结构设置有在氧化剂存在下经历氧化的材料的两个电流限制层。 激光结构被成形为暴露电流限制层的边缘以允许边缘暴露于氧化剂。 电流限制层被选择性氧化以在氧化部分处形成电阻材料,并在未氧化部分处形成导电材料。 层的未氧化部分被氧化和电阻部分包围,以便通过穿过激光器的有源区域的预选部分来引导来自一个电接触焊盘的电流。 激光器结构可以是垂直腔表面发射激光器。 该装置实现了当前的限制和引导功能,而不需要使用离子轰击或植入来在激光器的主体内提供电流限制结构。

    Lasers with InGaAs quantum wells with InGaP barrier layers with reduced decomposition
    65.
    发明授权
    Lasers with InGaAs quantum wells with InGaP barrier layers with reduced decomposition 有权
    具有InGaAs势垒层的InGaAs量子阱的激光器具有降低的分解

    公开(公告)号:US08837547B2

    公开(公告)日:2014-09-16

    申请号:US13423826

    申请日:2012-03-19

    摘要: A method for preparing a VCSEL can use MBE for: growing a first conduction region over a first mirror region; growing an active region over the first conduction region opposite of the first mirror region, including: (a) growing a quantum well barrier having In1-xGaxP(As); (b) growing an transitional layer having one or more of GaP, GaAsP, or GaAs; (c) growing a quantum well layer having In1-zGazAsyP1-y; (d) growing another transitional layer have one or more of GaP, GaAsP, or GaAs; (e) repeating processes (a) through (d) over a plurality of cycles; and (f) growing a quantum well barrier having In1-xGaxP(As); growing a second conduction region over the active region opposite of the first conduction region, wherein: x ranges from 0.77 to 0.50; y ranges from 0.7 to 1; and z ranges from 0.7 to 0.99.

    摘要翻译: 准备VCSEL的方法可以使用MBE来:在第一镜像区域上生长第一导电区域; 在与第一反射镜区域相反的第一导电区域上生长有源区,包括:(a)生长具有In1-xGaxP(As)的量子阱势垒; (b)生长具有GaP,GaAsP或GaAs中的一种或多种的过渡层; (c)生长具有In1-zGazAsyP1-y的量子阱层; (d)生长另一个过渡层具有GaP,GaAsP或GaAs中的一种或多种; (e)在多个循环中重复过程(a)至(d); 和(f)生长具有In1-xGaxP(As)的量子阱屏障; 在与第一导电区域相反的有源区上生长第二导电区域,其中:x为0.77至0.50; y范围从0.7到1; z范围为0.7〜0.99。

    Passivation of VCSEL sidewalls
    66.
    发明授权
    Passivation of VCSEL sidewalls 有权
    VCSEL侧壁钝化

    公开(公告)号:US08815617B2

    公开(公告)日:2014-08-26

    申请号:US11767388

    申请日:2007-06-22

    申请人: Ralph H. Johnson

    发明人: Ralph H. Johnson

    IPC分类号: H01L21/00

    摘要: A semiconductor structure configured for use in a VCSEL or RCLED. The semiconductor structure includes an oxidizing layer constructed from materials that can be oxidized during a lithographic process so as to create an oxide aperture. The semiconductor structure further includes a number of layers near the oxidizing layer. A passivation material is disposed on the layers near the oxidizing layer. The passivation material is configured to inhibit oxidation of the layers.

    摘要翻译: 配置用于VCSEL或RCLED的半导体结构。 半导体结构包括由在光刻过程中可被氧化以产生氧化物孔的材料构成的氧化层。 半导体结构还包括靠近氧化层的多个层。 钝化材料设置在氧化层附近的层上。 钝化材料被配置为抑制层的氧化。

    Surface gratings on VCSELS for polarization pinning
    67.
    发明授权
    Surface gratings on VCSELS for polarization pinning 有权
    VCSELS上的表面光栅用于极化锁定

    公开(公告)号:US08455279B2

    公开(公告)日:2013-06-04

    申请号:US13210306

    申请日:2011-08-15

    IPC分类号: H01L21/00

    摘要: Methods for manufacturing a polarization pinned vertical cavity surface emitting laser (VCSEL). Steps include growing a lower mirror on a substrate; growing an active region on the lower mirror; growing an upper mirror on the active region; depositing a grating layer on the upper mirror; and etching a grating into the grating layer.

    摘要翻译: 用于制造偏振锁定垂直腔表面发射激光器(VCSEL)的方法。 步骤包括在基材上生长下反射镜; 在下镜上生长活跃区域; 在活跃地区生长上镜; 在上镜上沉积光栅层; 并将光栅蚀刻到光栅层中。

    Vertical cavity surface emitting laser having strain reduced quantum wells
    68.
    发明授权
    Vertical cavity surface emitting laser having strain reduced quantum wells 有权
    具有应变量子阱的垂直空腔表面发射激光器

    公开(公告)号:US08451875B2

    公开(公告)日:2013-05-28

    申请号:US11554754

    申请日:2006-10-31

    申请人: Ralph H. Johnson

    发明人: Ralph H. Johnson

    IPC分类号: H01S5/343

    摘要: A VCSEL with nearly planar intracavity contact. A bottom DBR mirror is formed on a substrate. A first conduction layer region is formed on the bottom DBR mirror. An active layer, including quantum wells, is on the first conduction layer region. A trench is formed into the active layer region. The trench is formed in a wagon wheel configuration with spokes providing mechanical support for the active layer region. The trench is etched approximately to the first conduction layer region. Proton implants are provided in the wagon wheel and configured to render the spokes of the wagon wheel insulating. A nearly planar electrical contact is formed as an intracavity contact for connecting the bottom of the active region to a power supply. The nearly planar electrical contact is formed in and about the trench.

    摘要翻译: 具有几乎平面的腔内接触的VCSEL。 在基板上形成底部DBR反射镜。 在底部DBR镜上形成第一导电层区域。 包括量子阱的有源层在第一导电层区域上。 沟槽形成有源层区域。 沟槽形成为具有为活动层区域提供机械支撑的轮辐车轮构造。 沟槽被蚀刻到第一导电层区域附近。 质子植入物被提供在货车轮中并且被配置成使得货车车轮的轮辐绝缘。 形成近似平面的电接触件作为用于将有源区域的底部连接到电源的腔内接触。 几乎平面的电接触形成在沟槽中和周围。

    Asymmetric DBR pairs combined with periodic and modulation doping to maximize conduction and reflectivity, and minimize absorption
    69.
    发明授权
    Asymmetric DBR pairs combined with periodic and modulation doping to maximize conduction and reflectivity, and minimize absorption 有权
    非对称DBR对与周期性和调制掺杂结合,以最大限度地提高传导和反射率,并使吸收最小化

    公开(公告)号:US08213474B2

    公开(公告)日:2012-07-03

    申请号:US11963365

    申请日:2007-12-21

    IPC分类号: H01S5/00

    摘要: An optical device for improving conduction and reflectivity and minimizing absorption. The optical device includes a first mirror comprising a first plurality of mirror periods designed to reflect an optical field at a predetermined wavelength, where the optical field has peaks and nulls. Each of the plurality of mirror periods includes a first layer of having a high carrier mobility, a second layer having lower carrier mobility, and a first compositional ramp between the first and second layers. The thicknesses of the first and second layers for at least a portion of the first plurality of mirror periods are established such that the nulls of the optical field occur within the first layer and not within the compositional ramp. At least the portion of the first layers within the first plurality of mirror periods include elevated doping concentrations at locations of the nulls of the optical field.

    摘要翻译: 用于改善传导和反射率并最小化吸收的光学装置。 该光学装置包括第一反射镜,该第一反射镜包括被设计成反射预定波长的光场的第一多个反射镜周期,其中光场具有峰值和零点。 多个反射镜周期中的每一个包括具有高载流子迁移率的第一层,具有较低载流子迁移率的第二层以及第一和第二层之间的第一组成斜面。 第一和第二层的厚度对于第一多个反射镜周期的至少一部分被建立为使得光场的零点发生在第一层内而不在组成斜坡内。 第一多个反射镜周期内的第一层的至少部分包括在光场的零点的位置处的升高的掺杂浓度。

    Surface gratings on VCSELs for polarization pinning
    70.
    发明授权
    Surface gratings on VCSELs for polarization pinning 有权
    VCSEL上的表面光栅用于极化锁定

    公开(公告)号:US08000374B2

    公开(公告)日:2011-08-16

    申请号:US11299638

    申请日:2005-12-12

    IPC分类号: H01S3/08 H01S5/00

    摘要: A polarization pinned vertical cavity surface emitting laser (VCSEL). A VCSEL designed to be polarization pinned includes an upper mirror. An active region is connected on the upper mirror. A lower mirror is connected to the active region. A grating layer is deposited to the upper mirror. The grating layer includes a low index of refraction layer formed by deposition on the upper mirror. The grating layer further includes a high index of refraction layer formed by deposition on the low index of refraction layer. A grating is formed into the grating layer.

    摘要翻译: 偏振锁定垂直腔表面发射激光器(VCSEL)。 被设计为偏振锁定的VCSEL包括上镜。 有源区连接在上镜上。 下反射镜连接到活动区域。 光栅层沉积到上镜。 光栅层包括通过沉积在上反射镜上形成的低折射率折射率层。 光栅层还包括通过沉积在低折射率折射率层上形成的高折射率折射率层。 格栅形成光栅层。