TRANSISTOR AND ELECTRONIC DEVICE
    61.
    发明申请

    公开(公告)号:US20250081539A1

    公开(公告)日:2025-03-06

    申请号:US18956568

    申请日:2024-11-22

    Abstract: A semiconductor device with a small variation in transistor characteristics is provided. An oxide semiconductor film, a source electrode and a drain electrode over the oxide semiconductor film, an interlayer insulating film placed to cover the oxide semiconductor film, the source electrode, and the drain electrode, and a gate electrode over the oxide semiconductor film are included; an opening is formed overlapping with a region between the source electrode and the drain electrode in the interlayer insulating film; the gate electrode is placed in the opening in the interlayer insulating film; and the source electrode and the drain electrode include a conductive film having compressive stress.

    SECONDARY BATTERY AND ELECTRONIC DEVICE

    公开(公告)号:US20250015298A1

    公开(公告)日:2025-01-09

    申请号:US18712312

    申请日:2022-11-17

    Abstract: A secondary battery that can inhibit degradation of an electrode is provided. A flexible secondary battery is provided. A flexible secondary battery includes a positive electrode, a negative electrode, and an exterior body surrounding the positive electrode and the negative electrode. The positive electrode includes a positive electrode current collector and a positive electrode active material layer provided over the positive electrode current collector. The negative electrode includes a negative electrode current collector and a negative electrode active material layer provided over the negative electrode current collector. One or both of the positive electrode current collector and the negative electrode current collector have rubber elasticity.

    SEMICONDUCTOR DEVICE
    63.
    发明申请

    公开(公告)号:US20250008741A1

    公开(公告)日:2025-01-02

    申请号:US18691160

    申请日:2022-09-07

    Abstract: A semiconductor device with a novel structure is provided. The semiconductor device includes a first electrode, a transistor including a back gate, a capacitor including a pair of electrodes, and a first insulator that can have ferroelectricity between the back gate of the transistor and a semiconductor. The first insulator overlaps with the semiconductor with a second insulator therebetween. One of a source electrode and a drain of the transistor is electrically connected to the first electrode. The other of the source and the drain of the transistor is electrically connected to one electrode of the pair of electrodes. The pair of electrodes are each in contact with the first insulator and include a region where the pair of electrodes overlap with each other with the first insulator therebetween. As the first insulator, a ferroelectric is used.

    DISPLAY DEVICE
    66.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240057453A1

    公开(公告)日:2024-02-15

    申请号:US18260818

    申请日:2022-01-05

    CPC classification number: H10K59/874 H10K59/873 H10K59/1201

    Abstract: A highly reliable display device is provided. The display device including a light-emitting element and an insulating layer placed to cover the light-emitting element and the light-emitting element includes a first conductive layer, an EL layer over the first conductive layer, and a second conductive layer over the EL layer and the insulating layer includes a first layer, a second layer over the first layer, and a third layer over the second layer and the first layer has a function of capturing or fixing at least one of water and oxygen, the second layer has a function of inhibiting diffusion of at least one of water and oxygen, and the third layer has a higher concentration of carbon than at least one of the first layer and the second layer.

    TRANSISTOR AND ELECTRONIC DEVICE
    68.
    发明申请

    公开(公告)号:US20220376113A1

    公开(公告)日:2022-11-24

    申请号:US17770588

    申请日:2020-10-26

    Abstract: A semiconductor device with a small variation in transistor characteristics is provided. An oxide semiconductor film, a source electrode and a drain electrode over the oxide semiconductor film, an interlayer insulating film placed to cover the oxide semiconductor film, the source electrode, and the drain electrode, and a gate electrode over the oxide semiconductor film are included; an opening is formed overlapping with a region between the source electrode and the drain electrode in the interlayer insulating film; the gate electrode is placed in the opening in the interlayer insulating film; and the source electrode and the drain electrode include a conductive film having compressive stress.

    SEMICONDUCTOR DEVICE
    69.
    发明申请

    公开(公告)号:US20220344511A1

    公开(公告)日:2022-10-27

    申请号:US17642434

    申请日:2020-09-18

    Abstract: A semiconductor device having favorable electrical characteristics is provided. The semiconductor device includes a first oxide; a first conductor and a second conductor over the first oxide; a first insulator over the first conductor; a second insulator over the second conductor; a second oxide provided over the first oxide and being in contact with the side surface of the first conductor and the side surface of the second conductor; a third oxide provided over the second oxide and including regions in contact with the side surface of the first insulator and the side surface of the second insulator; a third insulator over the third oxide; and a third conductor over the third insulator.

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