公开(公告)号：US5635306A

公开(公告)日：1997-06-03

申请号：US485884

申请日：1995-06-07

申请人： Katsuhiro Minamida ,  Masashi Oikawa ,  Atsushi Sugihashi ,  Akira Ishibashi ,  Mamoru Takeda

发明人： Katsuhiro Minamida ,  Masashi Oikawa ,  Atsushi Sugihashi ,  Akira Ishibashi ,  Mamoru Takeda

IPC分类号： B21D47/00 ,  B23K26/20 ,  B32B3/12 ,  E04C2/34 ,  B32B3/02 ,  B32B3/28 ,  B23K26/00

CPC分类号： E04C2/3405 ,  B21D47/00 ,  B23K26/22 ,  B23K26/242 ,  B23K26/244 ,  B23K26/26 ,  B32B3/12 ,  B23K2201/02 ,  E04C2002/3455 ,  E04C2002/3494 ,  Y10T29/49629 ,  Y10T428/1234

摘要： The present invention is a honeycomb panel comprising metal face sheets respectively disposed on upper and lower faces of said honeycomb core characterized in that said honeycomb panel has a metal side plate disposed on at least one side face thereof, for mutually connecting honeycomb panels to each other, and a process for producing a honeycomb panel, said process characterized by comprising the steps of: welding a corrugated honeycomb core at an end face of its corrugation to a side plate along the end face of said corrugation; welding the honeycomb core at top portions of its corrugation to an upper face sheet from the side of the honeycomb core by means of an energy beam; welding bottom portions of the corrugation of the honeycomb core to a lower face sheet from the side of the face sheet by means of an energy beam; and welding the face sheets to the side plate before or after welding the honeycomb core to the face sheets.

摘要翻译： 本发明是一种蜂窝板，其包括分别设置在所述蜂窝芯的上表面和下表面上的金属面板，其特征在于，所述蜂窝板具有设置在其至少一个侧面上的金属侧板，用于将蜂窝板彼此相互连接 以及蜂窝板的制造方法，其特征在于，包括以下步骤：沿着所述波纹的端面将波纹状蜂窝芯在其波纹端面焊接到侧板上; 通过能量束从蜂窝芯的侧面将蜂窝状芯在其波纹的顶部处焊接到上表面片; 通过能量束将蜂窝芯的波纹的底部部分从面板的侧面焊接到下表面片; 并且在将蜂窝芯焊接到面板之前或之后将面板焊接到侧板。

公开(公告)号：US5633514A

公开(公告)日：1997-05-27

申请号：US570376

申请日：1995-12-11

申请人： Masashi Shiraishi ,  Satoshi Ito ,  Kazushi Nakano ,  Akira Ishibashi ,  Masao Ikeda ,  Hiroyuki Okuyama ,  Katsuhiro Akimoto ,  Tomonori Hino ,  Masakazu Ukita

发明人： Masashi Shiraishi ,  Satoshi Ito ,  Kazushi Nakano ,  Akira Ishibashi ,  Masao Ikeda ,  Hiroyuki Okuyama ,  Katsuhiro Akimoto ,  Tomonori Hino ,  Masakazu Ukita

IPC分类号： H01L33/00 ,  H01L33/28 ,  H01S5/32 ,  H01S5/327

CPC分类号： H01L33/28 ,  H01L33/0087 ,  H01S5/327 ,  H01S5/3201

摘要： The semiconductor light emitting device includes a semiconductor substrate (1), a first conductivity type first cladding layer (2) deposited on the semiconductor substrate (1), an active layer (4) deposited on the first cladding layer (2), and the second conductivity type second cladding layer (6) deposited on the active layer (4). The first and the second cladding layers (2, 6) are made of the II/VI-compound semiconductors including at least one kind of group II elements such as Zn, Hg, Cd, Mg and at least one kind of group VI elements such as S, Se, Te. The lattice mismatching .DELTA.a/a (%) between at least one of the first cladding layer (2) and the second cladding layer (6) and the substrate is set within the range of -0.9%.ltoreq..DELTA.Aa/a.ltoreq.0.5% (reference symbols a and a.sub.c represent the lattice constant of the semiconductor substrate and the lattice constant of at least either of the first and second cladding layers, and .DELTA.a is obtained from .DELTA.a=a.sub.c -a).

摘要翻译： 半导体发光器件包括半导体衬底（1），沉积在半导体衬底（1）上的第一导电型第一包覆层（2），沉积在第一覆层（2）上的有源层（4） 沉积在有源层（4）上的第二导电类型的第二包覆层（6）。 第一和第二覆层（2,6）由包括Zn，Hg，Cd，Mg中的至少一种II族元素和至少一种VI族元素的II / VI族化合物半导体制成， 作为S，Se，Te。 在第一包层（2）和第二包覆层（6）中的至少一个与基板之间的晶格失配DELTA a / a（％）设定在-0.9％的范围内ΔTAAa/ /=0.5%（参考符号a和ac表示半导体衬底的晶格常数和第一和第二包层中的至少任一个的晶格常数，并且DELTA a从DELTA a = ac-a获得）。

公开(公告)号：US5567960A

公开(公告)日：1996-10-22

申请号：US429850

申请日：1995-04-27

申请人： Akira Ishibashi ,  Satoshi Ito ,  Hiroyuki Okuyama ,  Kazushi Nakano ,  Kenji Kondo ,  Reiko Takeishi

发明人： Akira Ishibashi ,  Satoshi Ito ,  Hiroyuki Okuyama ,  Kazushi Nakano ,  Kenji Kondo ,  Reiko Takeishi

IPC分类号： H01L33/14 ,  H01L33/20 ,  H01L33/28 ,  H01S5/00 ,  H01S5/327 ,  H01L33/00 ,  H01S3/19

CPC分类号： H01L33/28 ,  H01S5/327

摘要： A lifetime of a II/VI-compound semiconductor light emitting device can be extended. The II/VI-compound semiconductor light emitting device includes an active layer (4) and a p-side cladding layer (6). An active-layer side portion (26) of the p-side cladding layer (6) is formed as a lightly impurity-doped region or a non-doped region.

摘要翻译： II / VI化合物半导体发光器件的寿命可以延长。 II / VI化合物半导体发光器件包括有源层（4）和p侧覆层（6）。 p侧覆层（6）的有源层侧部（26）形成为轻掺杂区域或非掺杂区域。

公开(公告)号：US5147823A

公开(公告)日：1992-09-15

申请号：US707236

申请日：1991-05-22

申请人： Akira Ishibashi ,  Yoshifumi Mori ,  Kenji Funato

发明人： Akira Ishibashi ,  Yoshifumi Mori ,  Kenji Funato

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/004 ,  Y10S148/046 ,  Y10S438/949

摘要： In a method for forming a pattern, by selectively irradiating a charged particle beam onto a substrate in an atmosphere containing a raw material gas, a resist pattern comprising a material which is produced on the substrate from the raw material gas is formed, wherein a pressure of the raw material gas is set to 10.sup.-7 to 10.sup.-5 Torr, an accelerating voltage of the charged particle beam is set to 0.5 to 6 kV, and a beam current of the charged particle beam is set to 10.sup.-13 to 10.sup.-7 A. Thus, a resist pattern of an ultrafine width can be stably formed in a relatively short time.Further, in a method for forming a pattern, by irradiating a charged particle beam onto a substrate in an atmosphere containing a gaseous negative type resist, a cross-linking reaction of the negative type resist molecules adsorbed on the surface of the substrate is caused, and a pattern comprising the negative type resist molecules which caused the cross-linking reaction is formed, so that a pattern which has an ultrafine width and can be easily removed by the wet process can be formed.

公开(公告)号：US5093384A

公开(公告)日：1992-03-03

申请号：US423190

申请日：1989-10-18

申请人： Shunichi Hayashi ,  Akira Ishibashi ,  Tetsuyoshi Ikenoue

发明人： Shunichi Hayashi ,  Akira Ishibashi ,  Tetsuyoshi Ikenoue

IPC分类号： B29C61/06 ,  C08G18/10 ,  C08G18/65 ,  C08J9/04

CPC分类号： C08G18/10 ,  C08G2101/00 ,  C08G2250/00 ,  C08G2280/00

摘要： A heat insulator made of shape memory polymer foam which has good moldability and changes greatly in elastic modulus above and below its glass transition point, and a heat insulator as mentioned above in which the polymer foam is polyurethane produced by prepolymer process from a composition containing a blowing agent, said composition being composed of a difunctional diisocyanate, a difunctional polyol, and a difunctional chain extender containing active hydrogen in a molar ratio of 2.00-1.10:1.00:1.00-0.10, said polyurethane containing approximately equal amounts of NCO groups and OH groups at the terminals of the molecular chains and having a glass transition point of -50.degree. to 60.degree. C. and crystallinity of 3 to 50 wt %.

公开(公告)号：US4488100A

公开(公告)日：1984-12-11

申请号：US457511

申请日：1983-01-12

申请人： Hiroshi Fujii ,  Akira Ishibashi ,  Kenji Nando

发明人： Hiroshi Fujii ,  Akira Ishibashi ,  Kenji Nando

IPC分类号： H02P27/06 ,  H02M7/48 ,  H02P4/00 ,  H02P5/40

CPC分类号： H02M7/53873 ,  H02P4/00

摘要： In recent years the induction motor speed has come to be controlled by changing the frequency and voltage of the commercial power supply by means of an invertor. The frequency of the commercial power supply, however, differs from country to country and even in the same country differs from region to region. If the motor controller designed for a supply frequency of f.sub.L is operated connected to the supply having a frequency f.sub.H higher than f.sub.L, an overvoltage will result. Conversely, if the motor controller designed for a supply frequency of f.sub.H is connected to the supply with a frequency f.sub.L lower than f.sub.H, then a sufficient torque cannot be obtained. To eliminate the above drawback, the present invention detects the input frequency of the motor controller and selects or calculates control constants in accordance with the detected value so as to enable stable operation even when the input frequency changes.

摘要翻译： 近年来，通过用逆变器改变商用电源的频率和电压，可以控制感应电动机速度。 然而，商业电力供应的频率因国家而异，即使在同一个国家，区域也不尽相同。 如果将供电频率fL设计的电动机控制器连接到频率fH高于fL的电源，则会产生过电压。 相反，如果将供电频率为fH的电机控制器连接到频率fL低于fH的电源，则不能获得足够的转矩。 为了消除上述缺陷，本发明检测电动机控制器的输入频率，并根据检测值选择或计算控制常数，以便即使输入频率改变也能够稳定运行。

公开(公告)号：US10172547B2

公开(公告)日：2019-01-08

申请号：US15032749

申请日：2014-10-28

申请人： C'STEC CORPORATION ,  Akira Ishibashi ,  Masahiro Yasutake

发明人： Akira Ishibashi ,  Masahiro Yasutake ,  Fusao Ishibashi

IPC分类号： A61B5/00 ,  A61B5/11 ,  F24F3/16 ,  F24F7/08 ,  F24F120/14

摘要： Provided are a sleeping state detection system and method that can detect the sleeping state of a subject such as an inpatient or a tenant without causing the subject stress, and that can ascertain the health state of the subject from the detection results. The sleeping state detection system includes a room or closed space (201) in which the subject sleeps, and a dust counter (206) that measures the dust particles inside the room or closed space (201). In a state where the inside of the room or closed space (201) is kept cleaner than the outside of the room or closed space (201) by using a fan filter unit (208) disposed in the room or closed space (201), while the subject sleeps, the change over time in the number of dust particles inside the room or closed space (201) is measured using the dust counter (206), and thereby the sleeping state of the subject is detected. The inside of the room or closed space (201) is preferably kept at a cleanliness of US 209D Class100 or better.

公开(公告)号：US09459053B2

公开(公告)日：2016-10-04

申请号：US14391185

申请日：2013-04-23

申请人： Sangmu Lee ,  Takuya Matsuda ,  Akira Ishibashi ,  Takashi Okazaki

发明人： Sangmu Lee ,  Takuya Matsuda ,  Akira Ishibashi ,  Takashi Okazaki

IPC分类号： F25B39/02 ,  F28D9/00 ,  F28F17/00 ,  F28F1/32 ,  F25B1/00 ,  F28D1/053 ,  F28F1/12 ,  F28F1/40 ,  F28F1/02

CPC分类号： F28D9/0062 ,  F25B1/005 ,  F28D1/0535 ,  F28F1/022 ,  F28F1/128 ,  F28F1/325 ,  F28F1/40 ,  F28F17/005 ,  F28F2215/10 ,  F28F2215/12

摘要： A plate fin includes a slit structure formed by cutting and raising a portion of the plate fin to form an opening facing a flow direction of a fluid and a waffle structure formed by bending a portion of the plate fin to form a protrusion having an angle-shaped cross section which protrudes in a stack direction and having a ridge substantially perpendicular to the air flow direction, and the waffle structure is disposed on the upstream side on the plate fins with respect to the slit structure and a slant length L1 on the upstream side of the waffle structure is smaller than a slant length L2 on the downstream side of the waffle structure.

摘要翻译： 板状散热片包括狭缝结构，该狭缝结构通过切割并升高板翅片的一部分而形成面向流体的流动方向的开口，以及通过弯曲板状翅片的一部分而形成的瓦饼结构而形成的切口结构， 形状的横截面，其在堆叠方向上突出并且具有大致垂直于空气流动方向的脊，并且所述华夫饼结构相对于所述狭缝结构设置在所述板状翅片的上游侧，并且所述上游侧的倾斜长度L1 的楔形结构的宽度小于在华夫饼结构的下游侧的倾斜长度L2。

公开(公告)号：US09209054B2

公开(公告)日：2015-12-08

申请号：US13820381

申请日：2011-08-30

申请人： Shiro Hara ,  Satoshi Haraichi ,  Akira Ishibashi

发明人： Shiro Hara ,  Satoshi Haraichi ,  Akira Ishibashi

IPC分类号： H01L25/00 ,  H01L21/677 ,  H01L21/02 ,  G05B19/418

CPC分类号： H01L21/67703 ,  G05B19/4188 ,  G05B2219/32395 ,  G05B2219/32396 ,  H01L21/02 ,  H01L21/67727 ,  Y02P90/04 ,  Y02P90/24 ,  Y02P90/28 ,  Y02P90/86 ,  Y10T29/41

摘要： A device manufacturing method and a device manufacturing apparatus in a single wafer processing system with wafers in 0.5 inch size. A large number of sealed-type unit process apparatuses are arranged to form a manufacturing line. The unit process apparatus is portable and processes a single process in the manufacturing process. When the number of a unit of manufacturing is more than the number of the unit process apparatuses, the unit process apparatuses are arranged as a flow shop system, corresponding to the order of processes for the device. When the number of the units is nearly equal to the number of processes, the apparatuses are arranged as a class shop system for classified arrangement at every major division of orders of processes. When the number of the units is far less than the number of processes, the apparatuses are arranged as a multicell shop system.

摘要翻译： 在具有0.5英寸尺寸的晶片的单晶片处理系统中的器件制造方法和器件制造装置。 多个密封型单元处理装置被布置成形成生产线。 单元处理装置是便携式的，并且在制造过程中处理单个处理。 当制造单位的数量大于单位处理装置的数量时，单位处理装置被配置为流程车间系统，对应于装置的处理顺序。 当单元的数量几乎等于处理次数时，设备按每个主要处理顺序排列为分类安排的类商店系统。 当单元的数量远远小于处理次数时，设备被布置为多单元商店系统。

公开(公告)号：US20150176852A1

公开(公告)日：2015-06-25

申请号：US14416300

申请日：2013-11-19

申请人： Akira ISHIBASHI ,  C'STEC CORPORATION ,  HIEI KENSETSU CORPORATION ,  ISHIBASHI KENCHIKU JIMUSHO CORPORATION

发明人： Akira Ishibashi ,  Fusao Ishibashi

IPC分类号： F24F7/04 ,  F24F3/16

摘要： Provided are a system of highly clean rooms capable of continuously maintaining high cleanliness of air of class 1 or above and supplying enough oxygen inside the room for several persons to live in and a wall adapted to the structure of such a system.The system of highly clean rooms 10 is provided with a living space 6 and a space 5 between the roof and the ceiling as subspaces of an enclosed space formed by a room 1a. One of the lateral walls of the room 1a is constituted of a wall 9 with an internal space 7, which is a hollow wall. The internal space 7 and the living space 6 are in contact via an inner wall 9a of the wall 9, and a gas exchange membrane 26 is stretched in the inner wall 9a. Furthermore, a gas flow path 24 is provided inside the inner space 7 and the gas flow path 24 allows airtight communication between an opening 23 provided on the lowest part of the internal wall 9a and a gas entry opening of a fan filter unit 21 provided on a ceiling wall 2a inside the space 5 between the roof and the ceiling.

摘要翻译： 提供了一个高度洁净的房间系统，能够持续保持1级或以上空气的高清洁度，并在房间内提供足够的氧气供多人居住，并适应这种系统的结构。 高洁净室10的系统设有起居室6和屋顶和天花板之间的空间5，作为由房间1a形成的封闭空间的子空间。 房间1a的一个侧壁由具有作为中空壁的内部空间7的壁9构成。 内部空间7和生活空间6经由壁9的内壁9a接触，气体交换膜26在内壁9a中被拉伸。 此外，在内部空间7内部设置有气体流路24，气体流路24允许设置在内壁9a的最​​下部的开口23与设置在内壁9a的下部的风扇过滤器单元21的气体入口 在屋顶和天花板之间的空间5内的天花板壁2a。