-
61.发明授权Carrier head with flexible membrane to provide controllable pressure and loading area 失效承载头带有柔性膜，提供可控的压力和装载面积公开(公告)号：US06979250B2
公开(公告)日：2005-12-27
申请号：US10806649
申请日：2004-03-22
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
摘要翻译： 用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。
-
公开(公告)号：US06923714B1
公开(公告)日：2005-08-02
申请号：US10943296
申请日：2004-09-17
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base to define a chamber. The flexible membrane has a core of a first material and an outer layer of a second material having a lower adhesion to the substrate than the first material. An exposed surface of the outer layer provides a mounting surface for the substrate.
-
公开(公告)号：US06857945B1
公开(公告)日：2005-02-22
申请号：US09712389
申请日：2000-11-13
申请人： Hung Chih Chen , Steven M. Zuniga
发明人： Hung Chih Chen , Steven M. Zuniga
CPC分类号： B24B37/30 , B24B41/061 , B24B49/16
摘要： A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers.
-
公开(公告)号：US06848980B2
公开(公告)日：2005-02-01
申请号：US10124066
申请日：2002-04-16
IPC分类号： B24B37/04 , H01L21/304 , B24B7/00 , B24B9/00
摘要： A carrier head has a backing assembly with a substrate support surface, a housing connectable to a drive shaft to rotate with the drive shaft about a rotation axis, and a dampening material in a load path between the backing assembly and the housing. The dampening material reduces transmission of vibrations from the backing assembly to the housing.
摘要翻译： 载体头部具有背衬组件，其具有衬底支撑表面，可连接到驱动轴的壳体，其随驱动轴围绕旋转轴线旋转，以及在背衬组件和壳体之间的负载路径中的阻尼材料。 阻尼材料减少了从背衬组件到壳体的振动传播。
-
公开(公告)号：US06210255B1
公开(公告)日：2001-04-03
申请号：US09296935
申请日：1999-04-22
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B100
CPC分类号： B24B37/30
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane with an expandable lip portion to engage a substrate for improved chemical mechanical polishing. The lip portion can form or break a seal with the substrate in response to pressure changes in a chamber in the carrier head.
摘要翻译： 用于化学机械抛光装置的载体头包括具有可膨胀唇部的柔性膜，以与基底接合以改善化学机械抛光。 响应于载体头中的室中的压力变化，唇部可以与基底形成或破裂密封。
-
公开(公告)号：US20160016284A1
公开(公告)日：2016-01-21
申请号：US14800115
申请日：2015-07-15
申请人： Jay Gurusamy , Hung Chih Chen
发明人： Jay Gurusamy , Hung Chih Chen
IPC分类号： B24B53/017 , B24B37/34
CPC分类号： B24B53/017 , B24B27/0023 , B24B27/0076 , B24B37/013 , B24B37/105 , B24B37/16 , B24B37/205 , B24B37/34 , B24B49/12 , B24B53/005
摘要： A polishing system includes a support to hold a substrate having a substrate surface to be polished, a conditioning system for conditioning a polishing pad, the conditioning system comprising one or more conditioning heads, a movable support structure, and a carrier to hold a polishing pad. The carrier is suspended from the movable support structure, and the support structure is configured to move the carrier between the support to hold the substrate and the conditioning system.
摘要翻译： 抛光系统包括：支撑体，用于保持具有待抛光的基底表面的基底，用于调节抛光垫的调节系统，所述调节系统包括一个或多个调节头，可移动支撑结构和载体以保持抛光垫 。 载体从可移动支撑结构悬挂，并且支撑结构构造成使载体在载体之间移动以保持基板和调节系统。
-
公开(公告)号：US20130196577A1
公开(公告)日：2013-08-01
申请号：US13360221
申请日：2012-01-27
IPC分类号： B24B5/00
摘要： Methods, apparatus, and systems are provided for retaining a substrate in a polishing head of a CMP system. The invention includes a flexible inner retaining ring adapted to contour to an edge of a substrate and an inner ring support coupled to the polishing head. The inner support ring is adapted to contact the flexible inner retaining ring in response to a side force load applied to the flexible inner retaining ring by a substrate being polished. Numerous additional aspects are disclosed.
摘要翻译： 提供了用于将基板保持在CMP系统的抛光头中的方法，装置和系统。 本发明包括适于轮廓到基底的边缘的柔性内保持环和联接到抛光头的内环支撑。 内支撑环适于通过被抛光的衬底施加到柔性内保持环的侧向力负载而接触柔性内保持环。 公开了许多附加方面。
-
公开(公告)号：US20120034849A1
公开(公告)日：2012-02-09
申请号：US13204571
申请日：2011-08-05
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
摘要翻译： 用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和环形外环。 内环具有被构造为周向地围绕位于基板安装表面上的基板的边缘的内表面，外表面和与抛光垫接触的下表面。 内环可相对于基板安装表面垂直移动。 外环具有围绕内环的内表面，外表面和与抛光垫接触的下表面。 外环可相对于基板安装表面和内圈而相对并且独立于其上下移动。 内圈的下表面具有第一宽度，并且外环的下表面具有大于第一宽度的第二宽度。
-
公开(公告)号：US20110070810A1
公开(公告)日：2011-03-24
申请号：US12955803
申请日：2010-11-29
IPC分类号： B24B1/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
-
公开(公告)号：US07815787B2
公开(公告)日：2010-10-19
申请号：US12246834
申请日：2008-10-07
申请人： Hung Chih Chen , Rashid A. Mavliev
发明人： Hung Chih Chen , Rashid A. Mavliev
摘要： A method and apparatus for retaining electrolyte on a rotating platen using directional air flow is provided. In one embodiment, an apparatus for processing a substrate is provided. The apparatus includes a platen assembly having a surface for supporting a processing pad and disposed on a stationary base so that the platen assembly may rotate relative to the base; and an air knife coupled to the base and extended over a portion of the surface, the air knife operable to deliver a stream of air toward the pad to divert at least a portion of a fluid disposed on the pad toward a center of the pad.
摘要翻译： 提供了一种使用定向气流将电解质保持在旋转台板上的方法和装置。 在一个实施例中，提供了一种用于处理衬底的设备。 该装置包括压板组件，该压板组件具有用于支撑处理衬垫并设置在固定底座上的表面，使得压板组件可相对于底座旋转; 以及气刀，其联接到所述基座并且延伸到所述表面的一部分上，所述气刀可操作以将空气流输送到所述垫，以将设置在所述垫上的流体的至少一部分转向所述垫的中心。
-
-
-
-
-
-
-
-
-
搜索结果
130 条记录 (耗时 0.043 秒)
