公开(公告)号：US20220359377A1

公开(公告)日：2022-11-10

申请号：US17814152

申请日：2022-07-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  An-Jhih Su ,  Chi-Hsi Wu ,  Wen-Chih Chiou ,  Tsang-Jiuh Wu ,  Der-Chyang Yeh ,  Ming Shih Yeh

IPC: H01L23/522 ,  H01L21/768 ,  H01L21/033 ,  H01L21/311 ,  H01L21/3105 ,  H01L21/683 ,  H01L21/02 ,  H01L23/00 ,  H01L23/528 ,  H01L33/62 ,  H01L21/56 ,  H01L25/075 ,  H01L33/38 ,  H01L25/07 ,  H01L23/538 ,  H01L33/00

Abstract: A method for forming a via in a semiconductor device and a semiconductor device including the via are disclosed. In an embodiment, the method may include bonding a first terminal and a second terminal of a first substrate to a third terminal and a fourth terminal of a second substrate; separating the first substrate to form a first component device and a second component device; forming a gap fill material over the first component device, the second component device, and the second substrate; forming a conductive via extending from a top surface of the gap fill material to a fifth terminal of the second substrate; and forming a top terminal over a top surface of the first component device, the top terminal connecting the first component device to the fifth terminal of the second substrate through the conductive via.

公开(公告)号：US20220359284A1

公开(公告)日：2022-11-10

申请号：US17870467

申请日：2022-07-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  Chi-Hsi Wu ,  Wen-Chih Chiou ,  Tsang-Jiuh Wu ,  Der-Chyang Yeh ,  Ming Shih Yeh ,  An-Jhih Su

IPC: H01L21/768 ,  H01L29/40 ,  H01L23/522 ,  H01L23/00

Abstract: Embodiments provide a high aspect ratio via for coupling a top electrode of a vertically oriented component to the substrate, where the top electrode of the component is coupled to the via by a conductive bridge, and where the bottom electrode of the component is coupled to substrate. Some embodiments provide for mounting the component by a component wafer and separating the components while mounted to the substrate. Some embodiments provide for mounting individual components to the substrate.

公开(公告)号：US11470720B2

公开(公告)日：2022-10-11

申请号：US17188534

申请日：2021-03-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Cheng-Hsien Hsieh ,  Chi-Hsi Wu ,  Chen-Hua Yu ,  Der-Chyang Yeh ,  Hsien-Wei Chen ,  Li-Han Hsu ,  Wei-Cheng Wu

IPC: H05K1/11 ,  H01L23/00 ,  H05K1/18 ,  H05K1/02

Abstract: A package includes a conductive pad, with a plurality of openings penetrating through the conductive pad. A dielectric layer encircles the conductive pad. The dielectric layer has portions filling the plurality of openings. An Under-Bump Metallurgy (UBM) includes a via portion extending into the dielectric layer to contact the conductive pad. A solder region is overlying and contacting the UBM. An integrated passive device is bonded to the UBM through the solder region.

公开(公告)号：US11469218B2

公开(公告)日：2022-10-11

申请号：US17073888

申请日：2020-10-19

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  An-Jhih Su ,  Wei-Yu Chen ,  Ying-Ju Chen ,  Tsung-Shu Lin ,  Chin-Chuan Chang ,  Hsien-Wei Chen ,  Wei-Cheng Wu ,  Li-Hsien Huang ,  Chi-Hsi Wu ,  Der-Chyang Yeh

IPC: H01L25/065 ,  H01L21/48 ,  H01L21/56 ,  H01L21/78 ,  H01L23/31 ,  H01L23/498 ,  H01L25/00

Abstract: A method includes attaching a first-level device die to a dummy die, encapsulating the first-level device die in a first encapsulating material, forming through-vias over and electrically coupled to the first-level device die, attaching a second-level device die over the first-level device die, and encapsulating the through-vias and the second-level device die in a second encapsulating material. Redistribution lines are formed over and electrically coupled to the through-vias and the second-level device die. The dummy die, the first-level device die, the first encapsulating material, the second-level device die, and the second encapsulating material form parts of a composite wafer.

公开(公告)号：US11450612B2

公开(公告)日：2022-09-20

申请号：US16924201

申请日：2020-07-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Hung Lin ,  An-Jhih Su ,  Der-Chyang Yeh ,  Shih-Guo Shen ,  Chia-Nan Yuan ,  Ming-Shih Yeh

IPC: H01L23/538 ,  H01L23/31 ,  H01L21/48 ,  H01L25/00 ,  H01L25/065

Abstract: A semiconductor device includes a bridge and a plurality of dies. The bridge is free of active devices and includes a substrate, an interconnect structure, a redistribution layer structure and a plurality of conductive connectors. The interconnect structure includes at least one dielectric layer and a plurality of first conductive features in the at least one dielectric layer. The redistribution layer structure includes at least one polymer layer and a plurality of second conductive features in the at least one polymer layer, wherein a sidewall of the interconnect structure is substantially flush with a sidewall of the redistribution layer structure. The conductive connectors are electrically connected to one another by the redistribution layer structure and the interconnect structure. The bridge electrically connects the plurality of dies.

公开(公告)号：US20220285171A1

公开(公告)日：2022-09-08

申请号：US17664458

申请日：2022-05-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  Hsien-Wei Chen ,  Chi-Hsi Wu ,  Der-Chyang Yeh ,  An-Jhih Su ,  Wei-Yu Chen

IPC: H01L21/48 ,  H01L23/31 ,  H01L25/10 ,  H01L23/00 ,  H01L25/00 ,  H01L21/56 ,  H01L23/498

Abstract: A semiconductor device and method for forming the semiconductor device is provided. The semiconductor device includes an integrated circuit having through vias adjacent to the integrated circuit die, wherein a molding compound is interposed between the integrated circuit die and the through vias. The through vias have a projection extending through a patterned layer, and the through vias may be offset from a surface of the patterned layer. The recess may be formed by selectively removing a seed layer used to form the through vias.

公开(公告)号：US11217570B2

公开(公告)日：2022-01-04

申请号：US16857161

申请日：2020-04-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wei-Yu Chen ,  An-Jhih Su ,  Chi-Hsi Wu ,  Der-Chyang Yeh ,  Li-Hsien Huang ,  Po-Hao Tsai ,  Ming-Shih Yeh ,  Ta-Wei Liu

IPC: H01L25/10 ,  H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L25/00 ,  H01L21/56 ,  H01L21/683 ,  H01L23/538 ,  H01L21/768 ,  H01L25/065

Abstract: A package structure and the manufacturing method thereof are provided. The package structure includes a first package including at least one first semiconductor die encapsulated in an insulating encapsulation and through insulator vias electrically connected to the at least one first semiconductor die, a second package including at least one second semiconductor die and conductive pads electrically connected to the at least one second semiconductor die, and solder joints located between the first package and the second package. The through insulator vias are encapsulated in the insulating encapsulation. The first package and the second package are electrically connected through the solder joints. A maximum size of the solder joints is greater than a maximum size of the through insulator vias measuring along a horizontal direction, and is greater than or substantially equal to a maximum size of the conductive pads measuring along the horizontal direction.

公开(公告)号：US11201142B2

公开(公告)日：2021-12-14

申请号：US15660968

申请日：2017-07-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Li-Hsien Huang ,  Chi-Hsi Wu ,  Chen-Hua Yu ,  Der-Chyang Yeh ,  Hua-Wei Tseng ,  Ming-Chih Yew ,  Yi-Jen Lai ,  Ming-Shih Yeh

IPC: H01L25/10 ,  H01L23/00 ,  H01L23/544 ,  H01L25/00 ,  H01L21/56 ,  H01L21/48 ,  H01L25/065 ,  H01L21/683 ,  H01L23/31 ,  H01L23/50 ,  H01L23/538 ,  H01L23/498

Abstract: A semiconductor package includes a die, an insulation layer, a plurality of first electrical conductive vias, a plurality of second electrical conductive vias, a plurality of thermal conductive vias and a connecting pattern. The die includes a plurality of first pads and a plurality of second pads. The insulation layer is disposed on the die and includes a plurality of openings exposing the first pads and the second pads. The first electrical conductive vias and the second electrical conductive vias are disposed in the openings and contact the first pads and the second pads respectively. The thermal conductive vias are disposed on the insulation layer. The connecting pattern is disposed on the insulation layer and connects the first electrical conductive vias and the thermal conductive vias. The thermal conductive vias are connected to the first pads through the connecting pattern and the first electrical conductive vias.

公开(公告)号：US20210185810A1

公开(公告)日：2021-06-17

申请号：US17188534

申请日：2021-03-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Cheng-Hsien Hsieh ,  Chi-Hsi Wu ,  Chen-Hua Yu ,  Der-Chyang Yeh ,  Hsien-Wei Chen ,  Li-Han Hsu ,  Wei-Cheng Wu

IPC: H05K1/11 ,  H01L23/00 ,  H05K1/18

Abstract: A package includes a conductive pad, with a plurality of openings penetrating through the conductive pad. A dielectric layer encircles the conductive pad. The dielectric layer has portions filling the plurality of openings. An Under-Bump Metallurgy (UBM) includes a via portion extending into the dielectric layer to contact the conductive pad. A solder region is overlying and contacting the UBM. An integrated passive device is bonded to the UBM through the solder region.

公开(公告)号：US20200343193A1

公开(公告)日：2020-10-29

申请号：US16927126

申请日：2020-07-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Cheng-Hsien Hsieh ,  Li-Han Hsu ,  Wei-Cheng Wu ,  Hsien-Wei Chen ,  Der-Chyang Yeh ,  Chi-Hsi Wu ,  Chen-Hua Yu ,  Tsung-Shu Lin

IPC: H01L23/538 ,  H01L21/48 ,  H01L25/10 ,  H01L25/00 ,  H01L23/31

Abstract: An embodiment is a structure including a first die having an active surface with a first center point, a molding compound at least laterally encapsulating the first die, and a first redistribution layer (RDL) including metallization patterns extending over the first die and the molding compound. A first portion of the metallization patterns of the first RDL extending over a first portion of a boundary of the first die to the molding compound, the first portion of the metallization patterns not extending parallel to a first line, the first line extending from the first center point of the first die to the first portion of the boundary of the first die.