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公开(公告)号：US09994685B2
公开(公告)日：2018-06-12
申请号：US14129426
申请日：2012-06-27
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： C08J5/18 , C08F212/08 , C08F212/02 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G02B1/04 , G02B3/00 , C08G59/02 , C08L25/04 , C08L25/14 , C08L63/00
CPC分类号： C08J5/18 , C08F212/08 , G02B1/041 , C08F220/34 , C08F2220/282 , C08F2220/281 , C08F2220/325 , C08F220/32 , C08F2220/343 , C08F220/20 , C08F220/58 , C08L25/14
摘要： There is provided a resin composition including a copolymer having structural units of Formula (1), Formula (2), and Formula (3), and a solvent; or a resin composition including a copolymer having structural units of Formula (1), Formula (4), and Formula (5), and a solvent.
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公开(公告)号：US08940470B2
公开(公告)日：2015-01-27
申请号：US12451474
申请日：2008-05-14
CPC分类号： G03F7/0233 , G02B3/00 , G03F7/0005 , G03F7/38
摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
摘要翻译： 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物和具有经历光分解以产生碱溶性基团的有机基团的化合物。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。
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公开(公告)号：US08867824B2
公开(公告)日：2014-10-21
申请号：US13408024
申请日：2012-02-29
CPC分类号： G06T7/90 , G06T5/003 , G06T5/008 , G06T7/593 , G06T2207/10021 , G06T2207/10024 , G06T2207/10028 , G06T2207/20076 , G06T2207/20172 , G06T2207/30201 , H04N13/128 , H04N13/271
摘要： An image processing apparatus includes a depth control signal generation unit generating a depth control signal controlling emphasis of the feel of each region of an input image based on the depth position of a subject in each region of the input image; a face skin region control signal generation unit generating a face skin region control signal controlling emphasis of the feel of each region in the input image based on the human face skin region in the input image; a person region control signal generation unit generating a person region control signal controlling emphasis of the feel of each region in the input image based on the region of the person in the input image; and a control signal synthesis unit synthesizing the depth control signal, the face skin region control signal, and the person region control signal to generate a control signal.
摘要翻译： 图像处理装置包括：深度控制信号生成单元，根据输入图像的各区域中的被摄体的深度位置，生成控制输入图像的各区域的感觉强度的深度控制信号; 面部皮肤区域控制信号生成单元，基于输入图像中的人脸皮肤区域生成控制输入图像中的各区域的感觉的强调的面部皮肤区域控制信号; 人物区域控制信号生成单元，基于输入图像中的人的区域，生成控制输入图像中的各区域的感觉的强调的人物区域控制信号; 以及合成深度控制信号，面部皮肤区域控制信号和人物区域控制信号的控制信号合成单元，以产生控制信号。
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公开(公告)号：US08766158B2
公开(公告)日：2014-07-01
申请号：US13574897
申请日：2011-01-20
申请人： Shinya Arase , Takahiro Sakaguchi
发明人： Shinya Arase , Takahiro Sakaguchi
CPC分类号： G02B3/0012 , G02B3/0056 , H01L27/14627 , H01L27/14685
摘要： A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.
摘要翻译： 其中微透镜在衬底上彼此相邻布置的固态成像器件的制造方法包括：在衬底的表面上形成第一微透镜并在其间留出空间以提供第二微透镜的第一工艺; 以及将外涂层材料施加到其上形成有第一微透镜的基板的表面上的第二过程，干燥外涂层材料，使用灰度掩模将外涂层材料暴露于光，并显影曝光的外涂层材料，以便 在彼此相邻的第一微透镜之间的空间中形成第二微透镜。
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公开(公告)号：US20130310480A1
公开(公告)日：2013-11-21
申请号：US13982316
申请日：2012-01-12
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： G02B1/04
CPC分类号： G02B1/041 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32 , C08F216/1416 , C08F222/40 , G03F7/0382 , C08F2222/402 , C08F2216/1433
摘要： There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent (where X is a C1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; Y is an organic group that optionally has a substituent; and Z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).
摘要翻译： 提供了一种用于形成微透镜的感光性树脂组合物。 用于形成微透镜的感光性树脂组合物，所述感光性树脂组合物包含：成分（A），成分（B），成分（C）和溶剂。 组分（A）是具有下式（1）的马来酰亚胺结构单元，下式（2）的乙烯基醚结构单元和式（3），式（4）的三个结构单元中的至少一个的共聚物 ）和下式（5）中，成分（B）为光敏剂，成分（C）为交联剂（其中X为任选具有醚键或环状结构的C 1-20烃基 Y是任选具有取代基的有机基团; Z是任选具有取代基的芳族烃基或烷氧基）。
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公开(公告)号：US20120156598A1
公开(公告)日：2012-06-21
申请号：US13391761
申请日：2010-06-21
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24
摘要： There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
摘要翻译： 提供了用于微透镜的感光性树脂组合物。 包含组分（A），组分（B）和组分（C）的微透镜感光树脂组合物，其中组分（A）是具有式（1）的马来酰亚胺结构单元，组分（ B）是交联剂，组分（C）是光敏剂。
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公开(公告)号：US20110096986A1
公开(公告)日：2011-04-28
申请号：US12869115
申请日：2010-08-26
申请人： Kazuki YOKOYAMA , Takahiro Sakaguchi , Tomoichi Fujisawa , Masayuki Tsumura , Mitsuharu Hoshino
发明人： Kazuki YOKOYAMA , Takahiro Sakaguchi , Tomoichi Fujisawa , Masayuki Tsumura , Mitsuharu Hoshino
IPC分类号： G06K9/46
CPC分类号： G06K9/00228 , G06K9/00221 , G06K9/00261 , H04N5/142 , H04N5/23219 , H04N5/2351 , H04N5/243
摘要： An image processing apparatus includes: a data processing section which processes input image data and obtains output image data; a face detecting section which detects a face image on the basis of the input image data and obtains information about a face image region in which the face image exists; and a processing controller which controls the process of the data processing section on the basis of the information about the face image region obtained in the face detecting section.
摘要翻译： 一种图像处理装置，包括：处理输入图像数据并获得输出图像数据的数据处理部; 面部检测部，其基于输入图像数据检测面部图像，并获取关于面部图像存在的面部图像区域的信息; 以及处理控制器，其基于在面部检测部中获得的关于面部图像区域的信息来控制数据处理部分的处理。
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公开(公告)号：US20110086310A1
公开(公告)日：2011-04-14
申请号：US12996684
申请日：2009-07-07
CPC分类号： G03F7/0233 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/0012 , G03F7/094 , G03F7/40 , C08F220/06 , C08F212/08 , C08F212/14
摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3≦n1≦1.0.
摘要翻译： 提供了特别用于形成微透镜和形成平坦化膜的透明性，耐热性和折射率优异的正性抗蚀剂组合物; 以及由正性抗蚀剂组合物形成的微透镜和平坦化膜。 一种正性抗蚀剂组合物，其包含组分（A）：包含具有联苯结构的单元结构的碱溶性聚合物; 成分（B）：具有被光解以产生碱溶性基团的有机基团的化合物; 和组分（C）：溶剂。 作为组分（A）的碱溶性聚合物是包含式（1）的单元结构的聚合物的正性抗蚀剂组合物：其中假设构成聚合物（A）的单元结构的总数为1.0时， 构成聚合物（A）的式（1）的单元结构的比n1满足0.3＆lt; nlE; n1＆nlE; 1.0。
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公开(公告)号：US20100096663A1
公开(公告)日：2010-04-22
申请号：US12451474
申请日：2008-05-14
IPC分类号： H01L33/00 , G03F7/004 , G03F7/20 , H01L31/0232
CPC分类号： G03F7/0233 , G02B3/00 , G03F7/0005 , G03F7/38
摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
摘要翻译： 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物（A）和具有经历光分解以产生碱溶性基团的有机基团的化合物（B）。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。
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公开(公告)号：US20050032975A1
公开(公告)日：2005-02-10
申请号：US10886608
申请日：2004-07-09
CPC分类号： B32B5/022 , B32B3/30 , B32B7/02 , B32B7/12 , B32B27/12 , B32B27/18 , B32B27/32 , B32B27/34 , B32B27/40 , B32B2262/0261 , B32B2270/00 , B32B2307/3065 , B32B2307/554 , B32B2307/718 , B32B2571/00 , Y10T428/31551
摘要： A protective member for protecting electric wires includes: a non-woven cloth layer having flexibility and made of a chlorine-free resin; and an outer resin layer laminated monolithically on outer surface of the non-woven cloth layer, and made of a chlorine-free and fire-retardant resin, wherein a thickness of the outer resin layer is configured to be not more than a thickness of the non-woven cloth layer, and wherein a total thickness of the non-woven cloth layer and the outer resin layer is configured to have a predetermined wear resistance.
摘要翻译： 用于保护电线的保护构件包括：具有柔软性并由无氯树脂制成的无纺布层; 以及在无纺布层的外表面上层叠的外部树脂层，由无氯阻燃树脂制成，其中，外部树脂层的厚度被设定为不大于 无纺布层，其中无纺布层和外部树脂层的总厚度被构造成具有预定的耐磨性。
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