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公开(公告)号：US20110183521A1
公开(公告)日：2011-07-28
申请号：US13014508
申请日：2011-01-26
申请人： Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人： Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
IPC分类号： H01L21/311 , H01J37/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要： Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译： 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外（VUV）辐射来去除衬底上的聚合材料。 在这种去除之后，还描述了用于纳米压印的另外的蚀刻技术。
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公开(公告)号：US07943081B2
公开(公告)日：2011-05-17
申请号：US12762658
申请日：2010-04-19
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
摘要翻译： 描述了在衬底区域上形成连续层的方法。 通常，压印光刻模板可接触位于基底上的液体。 液体可以固化形成掩模层，并且压印光刻模板与掩模层分离。 在分离之前，加压气体和/或真空可以施加在模板和基底之间。 此外，在分离期间，加压气体和/或真空可以施加在模板和基底之间。
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公开(公告)号：US07910042B2
公开(公告)日：2011-03-22
申请号：US12707365
申请日：2010-02-17
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译： 本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积， 模具和基材之一。 此后，使适形材料固化。 具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。 结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。
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公开(公告)号：US20100173034A1
公开(公告)日：2010-07-08
申请号：US12717664
申请日：2010-03-04
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.
摘要翻译： 本发明包括用于图案化液体的模板，该模板设置在基板上。 模板包括具有相对的第一和第二表面的主体，一个表面具有至少一个凹部，另一个表面具有图案化区域。 在一个实施例中，模板可以安装到具有入口和通道的流体室。 模板可以连接到通道，并且入口连接到流体源。
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公开(公告)号：US20100140841A1
公开(公告)日：2010-06-10
申请号：US12707365
申请日：2010-02-17
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译： 本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积， 模具和基材之一。 此后，使适形材料固化。 具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。 结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。
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公开(公告)号：US20100112310A1
公开(公告)日：2010-05-06
申请号：US12607547
申请日：2009-10-28
申请人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
发明人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/708 , G03F9/7084 , Y10T428/24802
摘要： Systems and methods for providing identification patterns on substrates are described.
摘要翻译： 描述了在基板上提供识别图案的系统和方法。
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67.发明授权公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译： 本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。
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公开(公告)号：US20090214761A1
公开(公告)日：2009-08-27
申请号：US12392663
申请日：2009-02-25
IPC分类号： C23C16/52
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
摘要翻译： 在压印光刻过程中的缺陷和/或颗粒可以在图案化层中提供排除区和/或过渡区。 可以识别图案化层中的排除区和/或过渡区以在模板上提供感兴趣的区域。
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69.发明申请公开(公告)号：US20070228610A1
公开(公告)日：2007-10-04
申请号：US11695850
申请日：2007-04-03
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7042 , G03F9/7076 , G03F9/708 , G03F9/7084 , Y10S977/887
摘要： A method of patterning a substrate comprising first and second fields with a template, the template having a mold and a plurality of alignment forming areas and a plurality of template alignment marks, the method comprising: positioning a material on the first field of the substrate and a plurality of regions of the substrate, the plurality of regions laying outside of the first and second fields; positioning the mold and the substrate such that a desired spatial relationship between the mold and the first field of the substrate is obtained to define a pattern in the material on the first field of the substrate while concurrently defining a plurality of substrate alignment marks with the material in the plurality of regions of the substrate in superimposition with the plurality of alignment forming areas of the template; positioning a material on the second field of the substrate; and positioning the mold and the substrate to obtain a desired spatial relationship between the plurality of template alignment marks and the plurality of substrate alignment marks such that a desired spatial relationship between the mold and the second field of the substrate is obtained to define a pattern in the material on the second field of the substrate.
摘要翻译： 一种使用模板构图包括第一场和第二场的衬底的方法，所述模板具有模具和多个对准形成区域和多个模板对准标记，所述方法包括：将材料定位在所述衬底的第一场上，以及 所述基板的多个区域，所述多个区域布置在所述第一和第二场外; 定位模具和基板，使得获得模具和基板的第一场之间的期望的空间关系，以在基板的第一场上的材料中限定图案，同时用材料限定多个基板对准标记 在与所述模板的所述多个对准形成区域重叠的所述基板的所述多个区域中; 将材料定位在基板的第二场上; 并且定位所述模具和所述基板以获得所述多个模板对准标记与所述多个基板对准标记之间的期望的空间关系，使得获得所述模具和所述基板的所述第二场之间的期望的空间关系，以限定所述模板 衬底的第二场上的材料。
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70.发明授权Imprint lithography substrate processing tool for modulating shapes of substrates 有权用于调制基板形状的压印光刻基板处理工具公开(公告)号：US07224443B2
公开(公告)日：2007-05-29
申请号：US11389731
申请日：2006-03-27
申请人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
发明人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译： 本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。 夹持系统包括具有第一和第二相对侧的卡盘体。 侧面在其间延伸。 第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。 第一支撑区域使第二支撑区域和第一和第二凹槽成像。 第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。 第二面和侧面限定外表面。 主体包括使第一和第二凹槽与外表面之一流体连通的通道。
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