Mask defect inspection apparatus
    66.
    发明申请
    Mask defect inspection apparatus 有权
    掩模缺陷检测仪器

    公开(公告)号:US20080204723A1

    公开(公告)日:2008-08-28

    申请号:US12081852

    申请日:2008-04-22

    IPC分类号: G01N21/00

    摘要: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

    摘要翻译: 掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统,具有分别用于获得图案的图像的检测传感器,并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置,用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像,使得由检测传感器获得的图案图像相应地变化 面膜方向。

    Pattern inspection apparatus
    68.
    发明授权
    Pattern inspection apparatus 有权
    图案检验仪

    公开(公告)号:US07372560B2

    公开(公告)日:2008-05-13

    申请号:US10809409

    申请日:2004-03-26

    IPC分类号: G01N21/00

    CPC分类号: G01N21/956

    摘要: A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

    摘要翻译: 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面,检测器,通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构,设置在光学焦平面附近,朝向 图案形成表面,并且在空间上分离第一和第二检查光的照射区域,使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

    Temperature control device and arrayed waveguide grating optical wavelength multiplexer/demultiplexer
    69.
    发明授权
    Temperature control device and arrayed waveguide grating optical wavelength multiplexer/demultiplexer 失效
    温度控制装置和阵列波导光栅光波长多路复用器/解复用器

    公开(公告)号:US07050673B2

    公开(公告)日:2006-05-23

    申请号:US10485627

    申请日:2003-04-01

    IPC分类号: G02B6/34

    摘要: In a temperature control device which maintains an object to be controlled at a preset constant temperature and an arrayed waveguide grating optical wavelength multiplexer/demultiplexer, the adverse effect of the junction temperature of the semiconductor control element is eliminated for the purpose of simplifying the overall structure and improving operation efficiency. The object to be controlled and semiconductor control element are fixed on the soaking plate. A negative feedback control is applied to the conduction condition of the semiconductor control element. Consequently, the junction temperature of the semiconductor control element is effectively used as a heating source not as a loss, thereby reducing the power consumption and stabilizing the performance.

    摘要翻译: 在将待控制的物体保持在预定的恒定温度的温度控制装置和阵列波导光栅光学波长多路复用器/解复用器中,为了简化整体结构,省略了半导体控制元件的结温的不利影响 提高运行效率。 要控制的对象和半导体控制元件固定在均热板上。 对半导体控制元件的导通条件施加负反馈控制。 因此,半导体控制元件的结温被有效地用作不是损耗的加热源,从而降低功耗并稳定性能。