公开(公告)号：US20190305224A1

公开(公告)日：2019-10-03

申请号：US16292422

申请日：2019-03-05

Applicant: Universal Display Corporation

Inventor： Michael HACK ,  William E. QUINN ,  Gregory MCGRAW ,  William T. MAYWEATHER, III ,  Julia J. BROWN

IPC: H01L51/00 ,  C23C16/30 ,  H01L51/50 ,  H01L51/52

Abstract: Embodiments of the disclosed subject matter provide systems and methods of depositing a film on a selective area of a substrate. A first jet of a first material may be ejected from a first nozzle assembly of a jet head having a plurality of nozzle assemblies to form a first portion of a film deposition on the substrate. A second jet of a second material may be ejected from a second nozzle assembly of the plurality of nozzle assemblies, the second nozzle assembly being aligned with the first nozzle assembly parallel to a direction of motion between the plurality of nozzle assemblies and the substrate, and the second material being different than the first material. The second material may react with the first portion of the film deposition to form a composite film deposition on the substrate when using reactive gas precursors.

公开(公告)号：US20190221740A1

公开(公告)日：2019-07-18

申请号：US16240814

申请日：2019-01-07

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory MCGRAW

IPC: H01L51/00 ,  H01L51/56 ,  H01L51/52 ,  B41J2/135

CPC classification number: H01L51/0005 ,  B41J2/135 ,  H01L51/0094 ,  H01L51/5253 ,  H01L51/56

Abstract: Embodiments of the disclosed subject matter provide a method of modifying the surface energy of a substrate is provided. A first hydrophobic material may be directly printed, using a vapor ejected from a first nozzle, onto a hydrophilic substrate to surround at least a first area of the substrate, where the first material has a vapor pressure of at least 1 Pa at 300° C. A second material may be deposited, from a second nozzle, onto the first area of the substrate.

公开(公告)号：US20190181390A1

公开(公告)日：2019-06-13

申请号：US16184105

申请日：2018-11-08

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory MCGRAW

IPC: H01L51/56 ,  H01L51/00 ,  H01L51/50

Abstract: Implementations of the disclosed subject matter provide a print bar for organic vapor jet (OVJP) deposition is provided that includes a plurality of n print head segments, where each of the plurality of print head segments may have an OVJP print head. The print bar may include a plurality of distance sensors, where each of the plurality of distance sensors may be configured to measure a distance between a substrate disposed below the print bar and a portion of at least one of the print head segments. The print bar may include a plurality of not more than n+1 actuators configured to adjust at least one of a position and an orientation of one or more of the plurality of print head segments based upon one or more distances between the substrate and the print bar measured by one or more of the plurality of distance sensors.

公开(公告)号：US20180342675A1

公开(公告)日：2018-11-29

申请号：US15981482

申请日：2018-05-16

Applicant: Universal Display Corporation

Inventor： Xin XU ,  Gregory MCGRAW ,  William E. QUINN

IPC: H01L51/00 ,  H01L51/50 ,  H01L51/52 ,  H05B33/10 ,  H05B33/12 ,  H01L27/32 ,  B05B12/18 ,  C23C16/455 ,  B41J2/045

Abstract: OVJP depositors and techniques for using the same are provided, in which the in-substrate plane velocity of the delivery and confinement flows are both nonzero and parallel to each other across the boundary between the two. These configurations provide improved material utilization efficiency and relaxed fly height tolerances, while achieving acceptable printing resolution and feature uniformity.

公开(公告)号：US20180323373A1

公开(公告)日：2018-11-08

申请号：US15968166

申请日：2018-05-01

Applicant: Universal Display Corporation

Inventor： Bruno KERSSCHOT ,  Ronald STEVENS ,  Eric KOSTERS ,  Ron ASJES ,  William E. QUINN ,  Gregory MCGRAW

IPC: H01L51/00 ,  H01L51/56 ,  H01L21/66 ,  H01L27/32 ,  B41M3/00 ,  B05B1/00

CPC classification number: H01L51/0005 ,  B05B1/00 ,  B41J2/01 ,  B41M3/006 ,  C23C14/04 ,  C23C14/12 ,  C23C14/24 ,  H01L22/20 ,  H01L27/3211 ,  H01L51/001 ,  H01L51/0012 ,  H01L51/56 ,  H01L2251/5353

Abstract: Devices and techniques that include use of a capacitive sensor to permit an OVJP print head to orient itself relative to conductive or dielectric traces on a printing substrate are disclosed. Such a sensor enables real-time measurement and closed-loop control of print head position with respect to substrate traces. This enables, for example, micron scale resolution in a dimension transverse to printing while permitting both the substrate and movement of the OVJP tool to scale to larger sizes than are achievable using conventional techniques and systems.

公开(公告)号：US20180323372A1

公开(公告)日：2018-11-08

申请号：US15968009

申请日：2018-05-01

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory MCGRAW ,  Gregg KOTTAS

IPC: H01L51/00 ,  H01L51/56 ,  B05B1/00

Abstract: OVJP print bars are provided that include multiple print head segments, each of which includes a print head and which can be positioned relative to the substrate independently of each other print head segment. Accordingly, a more consistent head-to-substrate distance can be maintained even for substrates that are not uniformly planar.

公开(公告)号：US20170101711A1

公开(公告)日：2017-04-13

申请号：US15290101

申请日：2016-10-11

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  William E. QUINN ,  Gregg KOTTAS ,  Siddharth HARIKRISHNA MOHAN ,  Matthew KING

IPC: C23C16/455 ,  C23C16/44

Abstract: Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.

公开(公告)号：US20170016117A1

公开(公告)日：2017-01-19

申请号：US14900502

申请日：2014-06-21

Applicant: UNIVERSAL DISPLAY CORPORATION

Inventor： William E. QUINN ,  Ruiqing MA ,  Siddharth HARIKRISHNA MOHAN

IPC: C23C16/50 ,  C23C16/455

CPC classification number: C23C16/50 ,  C23C16/455 ,  H01G2/08 ,  H01G11/10 ,  H01G11/18 ,  H01M2/105 ,  H01M2/20 ,  H01M2/202 ,  H01M10/425 ,  H01M10/6554 ,  Y02E60/13

Abstract: Plasma deposition systems and techniques are provided that use plasma generating units having one horizontal dimension at least three times as long as the other horizontal dimension. Plasma sources as disclosed herein thus have non-uniformly scaled dimensions in the x and y directions, to facilitate uniform deposition. Sources as disclosed herein may reduce heating of the substrate due to substrate cooling between plasma sources. They also may provide improved particle coverage when the film deposited is a barrier film due to plasma and gas flow divergence at the edges of the plasma source.

Abstract translation: 提供了等离子体沉积系统和技术，其使用等离子体产生单元，其具有一个水平尺寸至少三倍于另一个水平尺寸的长度。 因此，如本文所公开的等离子体源在x和y方向上具有非均匀缩放的尺寸，以促进均匀沉积。 如本文所公开的源可能由于等离子体源之间的衬底冷却而减少衬底的加热。 当由于等离子体源的边缘处的等离子体和气体流量发散而沉积的膜是阻挡膜时，它们也可以提供改进的颗粒覆盖。

公开(公告)号：US20160083845A1

公开(公告)日：2016-03-24

申请号：US14858840

申请日：2015-09-18

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory McGRAW ,  Siddharth HARIKRISHNA MOHAN ,  Matthew KING ,  Elliot H. HARTFORD, JR.

IPC: C23C16/455 ,  H01L51/50 ,  B05B15/04 ,  B05B1/00 ,  B05B1/28 ,  B05B1/14 ,  C23C14/22 ,  H01L51/56

CPC classification number: H01L51/56 ,  B05B15/555 ,  B41J2/1433 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2002/14475 ,  C23C14/12 ,  C23C14/22 ,  C23C14/228 ,  C23C14/24 ,  H01L51/0004 ,  H01L51/0005 ,  H01L51/50

Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.

Abstract translation: 所公开的主题的实施例提供了一种喷嘴组件及其制造方法，喷嘴组件包括形成在第一孔板上的第一孔，以将具有有机蒸汽的载气流喷射到沉积室中的基底上，形成第二孔 在与所述第一孔相邻设置的第二孔板上形成真空孔，其中所述第一孔板和所述第二孔板由第一隔板隔开，所述第三孔形成在第三孔板上以排出所设置的吹扫气体 邻近所述第二孔板，其中所述第二孔板和所述第三孔板由第二隔板隔开，并且第三隔离板邻近所述一个或多个第三孔板设置，以在所述一个或多个孔板中形成气体通道 第三孔板。

公开(公告)号：US20150376787A1

公开(公告)日：2015-12-31

申请号：US14643887

申请日：2015-03-10

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  William E. QUINN ,  Matthew KING ,  Elliot H. HARTFORD, JR. ,  Siddharth HARIKRISHNA MOHAN

IPC: C23C16/455 ,  B05B15/04 ,  B05B1/14 ,  B05B1/00 ,  B05B1/28

Abstract: Embodiments of the disclosed subject matter provide a device including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, and a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel.

Abstract translation: 所公开的主题的实施例提供了一种装置，其包括喷嘴，待沉积在与喷嘴流体连通的基板上的材料源，与要与喷嘴沉积的材料源流体连通的输送气体源， 与喷嘴相邻设置的排气通道和与喷嘴和排气通道流体连通并且邻近排气通道设置的限制气体源。