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    Illumination System for a Microlithographic Projection Exposure Apparatus
    61.
    发明申请
    Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US20070216887A1

    公开(公告)日：2007-09-20

    申请号：US11568204

    申请日：2004-04-23

    申请人： Wolfgang Singer ,  Johannes Wangler

    发明人： Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70075

    摘要： An illumination system for a microlithographic projection exposure apparatus comprises a light source, a first optical unit having an exit pupil, an optical raster element positioned in or in close proximity to the exit pupil of the first optical unit and a field plane that is conjugated to the exit pupil of the first optical unit by Fourier transformation. The illumination system further comprises a second optical unit imaging the field plane into an image plane and having at its object side a homocentric entrance pupil that at least substantially coincides with the exit pupil of the first optical unit. This allows to dispense with a condenser lens that is usually required for conjugating the exit pupil to the field plane.

    摘要翻译： 用于微光刻投影曝光装置的照明系统包括光源，具有出射光瞳的第一光学单元，位于第一光学单元的出射光瞳处或紧邻第一光学单元的出射光瞳的光栅元件和与 通过傅里叶变换使第一光学单元的出射光瞳。 照明系统还包括第二光学单元，其将场平面成像为图像平面，并且在其物体侧具有至少基本上与第一光学单元的出射光瞳重合的同心入射光瞳。 这允许省略通常用于将出射光瞳共轭到场平面所需的聚光透镜。

    Illumination system having a light mixer for the homogenization of radiation distributions
    63.
    发明申请
    Illumination system having a light mixer for the homogenization of radiation distributions 审中-公开
    具有用于辐射分布均匀化的光混合器的照明系统

    公开(公告)号：US20050280821A1

    公开(公告)日：2005-12-22

    申请号：US11147931

    申请日：2005-06-08

    申请人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G01B11/00 ,  G02B27/28 ,  G03F7/20

    CPC分类号： G03F7/70583 ,  G02B27/283 ,  G03F7/70075

    摘要： An illumination system of a microlithographic projection exposure apparatus contains a light mixer for the homogenization of radiation distributions. The latter may, in one embodiment, comprise at least one plane beam-splitter layer which is arranged between two transparent sub-elements, parallel to an optical axis of the illumination system. An alternative embodiment of a light mixer contains at least one row of beam splitters, wherein the beam splitters in at least one row are arranged mutually parallel, at an inclination angle with respect to an entry-side optical axis of the illumination system, and offset behind one another in a direction perpendicular to the entry-side optical axis.

    摘要翻译： 微光刻投影曝光装置的照明系统包含用于辐射分布均匀化的光混合器。 在一个实施例中，后者可以包括布置在平行于照明系统的光轴的两个透明子元件之间的至少一个平面分束器层。 光混合器的替代实施例包含至少一排分束器，其中至少一排中的分束器相对于照明系统的入射侧光轴以倾斜角相互平行地布置，并且偏移 在与入射侧光轴垂直的方向上彼此相邻。

    EUV illumination system having a folding geometry
    66.
    发明申请
    EUV illumination system having a folding geometry 审中-公开
    EUV照明系统具有折叠几何形状

    公开(公告)号：US20050002090A1

    公开(公告)日：2005-01-06

    申请号：US10876898

    申请日：2004-06-25

    申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

    发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

    IPC分类号： G03F7/20 ,  G02B17/00

    CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

    摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

    摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

    Microlithographic projection exposure apparatus
    67.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08891057B2

    公开(公告)日：2014-11-18

    申请号：US12818501

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    Illumination optical unit for projection lithography
    69.
    发明授权
    Illumination optical unit for projection lithography 有权
    用于投影光刻的照明光学单元

    公开(公告)号：US08294877B2

    公开(公告)日：2012-10-23

    申请号：US13368430

    申请日：2012-02-08

    申请人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

    发明人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70058

    摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.

    摘要翻译： 用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。 照明光学单元的瞳孔面镜具有多个光瞳面。 瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。 照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。 单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。 这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

    Illumination system for a microlithographic projection exposure apparatus
    70.
    发明授权
    Illumination system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US08004656B2

    公开(公告)日：2011-08-23

    申请号：US11505408

    申请日：2006-08-17

    申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/52 ,  G03B27/72

    CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

    摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

    摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。