公开(公告)号：US20190072860A1

公开(公告)日：2019-03-07

申请号：US16115047

申请日：2018-08-28

Applicant: ASML NETHERLANDS B. V.

Inventor： Bastiaan Onne FAGGINGER AUER ,  Paul Christiaan HINNEN ,  Hugo Augustinus Joseph CRAMER ,  Anagnostis TSIATMAS ,  Mariya Vyacheslavivna MEDVEDYEVA

IPC: G03F7/20 ,  G03F9/00

Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.

公开(公告)号：US20180341053A1

公开(公告)日：2018-11-29

申请号：US16037751

申请日：2018-07-17

Applicant: ASML Netherlands B. V.

Inventor： Ekkehard BRUNE ,  Dieter Frerking ,  Thomas Thönlß ,  Claus Spruch

IPC: F21V8/00 ,  G02B6/14 ,  H01S3/00 ,  H01J65/04 ,  G02B27/09

Abstract: A laser-operated light source encompasses a chamber for accommodating an ionizable gas and an ignition source for ionizing the gas in the chamber for generating a plasma. The light source furthermore encompasses a laser for inputting laser energy into the plasma such that, under the impact of the laser radiation, the plasma emits useful light, which forms the output signal of the light source, wherein provision is made for means for coupling the useful light into a transferring optical fiber. In the case of the light source according to the invention, at least one mode scrambler is assigned to the optical fiber or the optical fibers.

公开(公告)号：US20160273906A1

公开(公告)日：2016-09-22

申请号：US15036471

申请日：2014-11-04

Applicant: ASML NETHERLANDS B .V.

Inventor： Maxim PISARENCO ,  Irwan Dani SETIJA

IPC: G01B11/02

CPC classification number: G01B11/02 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633

Abstract: In scatterometry, a merit function including a regularization parameter is used in an iterative process to find values for the scattering properties of the measured target. An optimal value for the regularization parameter is obtained for each measurement target and in each iteration of the iterative process. Various methods can be used to find the value for the regularization parameter, including the Discrepancy Principle, the chi-squared method and novel modifications of the Discrepancy Principle and the chi-squared method including a merit function.

Abstract translation: 在散射法中，在迭代过程中使用包括正则化参数的优值函数来查找测量目标的散射特性的值。 为每个测量目标和迭代过程的每次迭代获得正则化参数的最优值。 可以使用各种方法来找出正则化参数的值，包括差异原理，卡方法和差异原理的新颖修改以及包括优值函数的卡方法。

公开(公告)号：US08847183B2

公开(公告)日：2014-09-30

申请号：US14061087

申请日：2013-10-23

Applicant: Cymer, LLC

Inventor： William N. Partlo ,  Igor V. Fomenkov

IPC: H05G2/00 ,  G21K5/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

Abstract: A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

Abstract translation: 一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

公开(公告)号：US20130077073A1

公开(公告)日：2013-03-28

申请号：US13625477

申请日：2012-09-24

Applicant: Jan Bernard Plechelmus VAN SCHOOT ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Vladimir Vitalevich IVANOV ,  Andrei Mikhailovich YAKUNIN ,  Hermanus Johannes Maria KREUWEL

Inventor： Jan Bernard Plechelmus VAN SCHOOT ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Vladimir Vitalevich IVANOV ,  Andrei Mikhailovich YAKUNIN ,  Hermanus Johannes Maria KREUWEL

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70033 ,  G03F7/70041

Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.

Abstract translation: 光刻设备中的EUV曝光剂量通过改变通过相应的激发激光辐射脉冲从燃料材料的激发产生EUV辐射的脉冲的转换效率来控制脉冲到脉冲。 可以通过改变与激光束相交的燃料材料的比例和/或通过改变相互作用的质量，以几种不同的方式改变转换效率。 改变转换效率的机制可以基于激光脉冲定时的变化，预脉冲能量的变化和/或主激光束在一个或多个方向上的可变位移。 可以包括维持所产生的EUV辐射的对称性的步骤。

公开(公告)号：US20100309447A1

公开(公告)日：2010-12-09

申请号：US12745344

申请日：2008-11-18

Applicant: Yuri Johannes Gabriel Van de Vijver ,  Johannes Hubertus Josephina Moors ,  Wendelin Johanna Maria Versteeg ,  Peter Geradus Jonkers

Inventor： Yuri Johannes Gabriel Van de Vijver ,  Johannes Hubertus Josephina Moors ,  Wendelin Johanna Maria Versteeg ,  Peter Geradus Jonkers

IPC: G03B27/42

CPC classification number: G03F7/70933 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

Abstract translation: 公开了一种光刻设备，其包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，在使用期间投影图案化的辐射束的真空室，以及构造成提供吹扫气体 在室内流动。

公开(公告)号：US20090159819A1

公开(公告)日：2009-06-25

申请号：US12324218

申请日：2008-11-26

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G01R23/02

CPC classification number: G03F7/70983 ,  G03F7/7055 ,  Y10S372/70

Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.

Abstract translation: 公开了一种脉冲修正器及相关的光刻设备及其制造方法。 脉冲修改器被配置为接收辐射的输入脉冲，并进一步被配置为发射多个对应的辐射输出脉冲部分，其中相应的脉冲部分分别围绕横向于光轴的轴线镜像并绕着 脉冲部分的光轴。

公开(公告)号：US20050270515A1

公开(公告)日：2005-12-08

申请号：US10862876

申请日：2004-06-08

Applicant: Kars Troost ,  Arno Bleeker

Inventor： Kars Troost ,  Arno Bleeker

IPC: G02B26/08 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

Abstract: A system and method to manufacturing a device provide a substrate and perform at least one exposure step. Each exposure step projects a patterned beam of radiation, which was patterned using an individually controllable elements, onto a target portion of the substrate. The projected patterned beam includes a plurality of pixels. Each exposure step also: (a) ordinarily controls the elements, such that each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step; and (b) exceptionally controls the elements, such that at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel. Alternatively, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step. The invention uses doses up to the predetermined normal maximum for normal printing, but reserves at least one increased dose for compensation purposes. Accordingly, even when a dead black pixel falls in the middle of a group of surrounding white pixels it can be compensated for by increasing the radiation dose delivered by one or more of those neighboring white pixels, above the normal fully white value.

Abstract translation: 制造器件的系统和方法提供衬底并执行至少一个曝光步骤。 每个曝光步骤将图案化的辐射束投射到基板的目标部分上，该辐射束使用独立可控元件进行图案化。 投影图案化的波束包括多个像素。 每个曝光步骤还：（a）通常控制元件，使得每个像素在曝光步骤中向目标部分传递不大于预定正常最大剂量的辐射剂量; 和（b）异常地控制元件，使得至少一个选择的像素传递增加的辐射剂量，大于正常最大剂量。 可以递送增加的剂量以补偿阵列中与所选像素相邻的像素上的已知位置处的有缺陷元件的影响。 或者，其可以补偿在另一个曝光步骤中由该位置暴露于受已知缺陷元件影响的像素所导致的所选像素的位置处的目标部分的曝光不足。 本发明使用达到正常印刷的预定正常最大值的剂量，但是为了补偿目的而保留至少一个增加的剂量。 因此，即使当死黑色像素落在一组周围的白色像素的中间时，也可以通过增加一个或多个这些相邻的白色像素所传送的辐射剂量来补偿高于正常的全白色值。

公开(公告)号：US20050105069A1

公开(公告)日：2005-05-19

申请号：US10715828

申请日：2003-11-19

Applicant: Erik Loopstra ,  Dominicus Adrianus Franken

Inventor： Erik Loopstra ,  Dominicus Adrianus Franken

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/709 ,  G03F7/70258 ,  G03F7/70833

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation used to irradiate a patterning device, and a first support that supports the patterning device. The patterning device capable of patterning the beam of radiation. The apparatus also includes a second support that supports a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a projection system positioning module that controls at least one of a position and an orientation of the projection system based on at least one of a velocity and an acceleration of the projection system.

Abstract translation: 公开了一种光刻投影装置。 该装置包括用于提供用于照射图案形成装置的辐射束的照明系统和支撑图案形成装置的第一支撑件。 能够图案化辐射束的图案形成装置。 该装置还包括支撑基板的第二支撑件，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及投影系统定位模块，其控制投影的位置和取向中的至少一个 基于投影系统的速度和加速度中的至少一个的系统。