Abstract:
Methods of converting silica to silicon and fabricating silicon photonic crystal fiber (PCF) are disclosed. Silicon photonic crystal fibers made by the fabrication methods are also disclosed. One fabrication method includes: sealing silica PCF and a quantity of magnesium within a container, the quantity of magnesium defined by 2Mg(g)+SiO2(s)→2MgO(s)+Si(s); converting silica PCF to a reacted PCF through magnesiothermic reduction; and converting the reacted PCF to the fabricated silicon PCF by selective dissolution of the reacted PCF in an acid. Another fabrication method includes: adding silica PCF and a quantity of solid magnesium to an unsealed container, the quantity of magnesium substantially in excess of that defined by 2Mg(g)+SiO2(s)→2MgO(s)+Si(s); converting silica PCF to a reacted PCF through magnesiothermic reduction; and converting the reacted PCF to the fabricated silicon PCF by selective dissolution of the reacted PCF in an acid.
Abstract:
An optical waveguide device which includes an optical waveguide part and a photonic device mounting part is provided. A mask is patterned after high-temperature annealing to form a pedestal block on which a light emitting device is mounted. Thus, there is no influence on the mask, even if the device undergoes the heat treatment at a high temperature during the manufacturing process. This enables formation of the pedestal block with high accuracy. Therefore, it is possible to achieve an optical coupling with high accuracy in mounting a light emitting device on the pedestal block.
Abstract:
A method for fabricating ion exchange waveguides, such as lithium niobate or lithium tantalate waveguides in optical modulators and other optical waveguide devices, utilizes pressurized annealing to further diffuse and limit exchange of the ions and includes ion exchanging the crystalline substrate with a source of ions and annealing the substrate by pressurizing a gas atmosphere containing the lithium niobate or lithium tantalate substrate above normal atmospheric pressure, heating the substrate to a temperature ranging from about 150 degrees Celsius to about 1000 degrees Celsius, maintaining pressure and temperature to effect greater ion diffusion and limit exchange, and cooling the structure to an ambient temperature at an appropriate ramp down rate. In another aspect of the invention a powder of the same chemical composition as the crystalline substrate is introduced into the anneal process chamber to limit the crystalline substrate from outgassing alkaline earth metal oxide during the anneal period. In yet another aspect of the invention an anneal container is provided that allows for crystalline substrates to be annealed in the presence of powder without contaminating the substrate with the powder during the anneal process. Waveguides manufactured in accordance with the method exhibit superior drift performance.
Abstract:
Integrated semiconductor waveguide gratings, methods of manufacture thereof and methods of apodizing thereof are described. A semiconductor waveguide grating includes a substrate, a cladding layer disposed on the substrate, a guide structure that includes a plurality of discrete transverse sections implanted with ions disposed between adjacent transverse sections substantially free of implanted ions.
Abstract:
The invention relates to a photostructurable body, in particular glass or glass-ceramic, in which the glass is a multicomponent glass and/or the glass-ceramic is a multicomponent glass-ceramic, in each case having a positive change in refractive index nulln as a result of the action of light.
Abstract:
A method for manufacturing an optical device with a defined total device stress and a therefrom resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. In a preferred embodiment, a lower cladding layer of an amorphous material with a first refractive index is provided and above that an upper cladding layer of an amorphous material with a second refractive index, which latter is manufactured from a material which is tunable in its stress. Between the lower and upper cladding layer an optical waveguide core is manufactured comprising an amorphous material having a third refractive index which is larger than the first and second refractive index. The optical waveguide core is thermally annealed, after which it has a defined waveguide core stress. The upper cladding layer is manufactured to have a cladding layer stress that together with the waveguide core stress results in the total device stress.
Abstract:
An optoelectronic device and a method of making same. The optoelectronic device comprises a substrate, at least one dielectric waveguide in the substrate, and at least one active semiconductor layer physically bonded to the substrate and optically coupled to the at least one dielectric waveguide in the substrate, the at least one active semiconductor layer being able to generate light, detect light, amplify light or otherwise modulate amplitude or phase of light.
Abstract:
A hybrid waveguide structure having a combination of buried waveguide sections and ridge waveguide sections on the same substrate, share a common core layer. The buried waveguide sections provide the low index contrast desirable for couplers and other device components. The ridge waveguide sections provide the high index contrast needed for efficient low-loss tightly curved waveguides. The devices are fabricated starting from a low index contrast buried waveguide. Cladding material is then selectively removed by etching down from an upper surface either side of the waveguide core to a lower surface. This forms an enhanced index contrast ridge section of the waveguide. The other sections of the waveguide core remain buried and thus retain lower index contrast. Using this approach, a variety of optical devices, such as add/drop or add-after-drop multiplexers for WDM applications based on microrings or Mach-Zehnder interferometers, can be made with large feature sizes of several microns using silica-on-glass or silica-on-silicon technology, for example, and without having to use nanofabricated semiconductor structures.
Abstract:
A method for forming plural waveguide structures in an optical substrate, such as lithium niobate, employs multiple stages of annealed proton exchange. In each stage, the substrate is masked to define a region corresponding to at least one waveguide structure. The mask-defined region is exposed to a proton exchange agent for a predetermined time and at a predetermined temperature, and the substrate is then annealed at predetermined time/temperature conditions. By selecting appropriate process parameters for each APE stage, each of the resultant waveguide structures may be optimized for desired physical and optical characteristics. The method may be utilized, for example, to fabricate sub-Rayleigh range couplers having high coupling efficiencies.
Abstract:
A metal/dielectric construction comprises either an optically transmissive substrate adapted for channeling light therethrough, or a dielectric substrate, an optional adhesion-promoting layer comprising an oxide form of at least one metal or metalloid deposited onto the surface of the substrate, a layer composed of a highly reflective and/or electrically conductive/electromagnetic metal overlaying the adhesion-promoting layer, and a protective layer composed of a parylene polymer film formed over the metal layer.