公开(公告)号：US20040069956A1

公开(公告)日：2004-04-15

申请号：US10681116

申请日：2003-10-09

Applicant: HITACHI, LTD.

Inventor： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC: A61N005/00 ,  G21G005/00

CPC classification number: G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles obtained at a portion of said sample irradiated with the charged particle beam, and means for composing a two-dimensional image of the sample as viewed from a direction of said charged particle beam source, based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

Abstract translation: 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的焦点的装置，用于检测在照射了带电粒子束的所述样本的一部分处获得的带电粒子的带电粒子检测器 以及根据所述带电粒子束聚焦的信号，从所述带电粒子束源的方向观察样品的二维图像的装置，所述信号是从带电粒子检测器输出的信号。

公开(公告)号：US06617579B2

公开(公告)日：2003-09-09

申请号：US10021332

申请日：2001-10-29

Applicant: Akira Yonezawa

Inventor： Akira Yonezawa

IPC: H01J37244

CPC classification number: H01J37/145 ,  H01J37/28 ,  H01J2237/244 ,  H01J2237/281

Abstract: Secondary electrons emitted by a sample placed within a lens magnetic field are detected by a plurality of secondary electron detectors to enable observation of a concave/convex sample surface. In a scanning electronic beam apparatus having upper and lower electrodes built in a single-pole magnetic-field type lens to place a sample within a lens magnetic field, a negative voltage is applied to the sample and the lower electrode opposed thereto while a zero or positive voltage is applied to the upper electrode, whereby an electric field for suppressing the helical motion of a secondary electron given off from the sample due to electron-beam irradiation is produced within an objective magnetic field space above the sample. The secondary electrons are detected by a division-type MCP or a plurality of scintillator-type secondary electron detectors sandwiching the optical axis.

Abstract translation: 通过多个二次电子检测器检测由放置在透镜磁场内的样品发射的二次电子，以能够观察凹/凸样品表面。 在具有内置在单极磁场型透镜中的上电极和下电极以将样品置于透镜磁场内的扫描电子束装置中，对与其相对的样品和下电极施加负电压，同时将零或 向上部电极施加正电压，由此在样品上方的目标磁场空间内产生用于抑制由于电子束照射而从样品发出的二次电子的螺旋运动的电场。 二次电子由分割型MCP或夹着光轴的多个闪烁体型二次电子检测器检测。

公开(公告)号：US20020088941A1

公开(公告)日：2002-07-11

申请号：US10021332

申请日：2001-10-29

Inventor： Akira Yonezawa

IPC: H01J037/28

CPC classification number: H01J37/145 ,  H01J37/28 ,  H01J2237/244 ,  H01J2237/281

Abstract: The secondary electrons, from a sample placed within a lens magnetic field, are detected by a plurality of secondary electron detectors, thereby effectively observing a concave/convex in a sample surface. In a scanning electronic beam apparatus having upper and lower electrodes built in a single-pole magnetic-field type lens to place a sample within a lens magnetic field, a negative voltage is applied to the sample and the lower electrode opposed thereto while a zero or positive voltage is applied to the upper electrode, whereby an electric field for suppressing the helical motion of a secondary electron given off from the sample due to electron-beam irradiation is caused within a region of from the sample to an objective lens magnetic field space closer to an electron source. The secondary electron is detected by a division-type MCP or a plurality of scintillator-type secondary electron detectors arranged sandwiching the optical axis.

Abstract translation: 来自放置在透镜磁场内的样品的二次电子被多个二次电子检测器检测，从而有效地观察样品表面中的凹/凸。 在具有内置在单极磁场型透镜中的上电极和下电极以将样品置于透镜磁场内的扫描电子束装置中，对与其相对的样品和下电极施加负电压，同时将零或 向上部电极施加正电压，从而在从样品到物镜的磁场空间更靠近的区域内产生用于抑制由于电子束照射而从样品发出的二次电子的螺旋运动的电场 到电子源。 二次电子由分割型MCP或多个闪烁体型二次电子检测器检测，其夹持光轴。

公开(公告)号：US5969357A

公开(公告)日：1999-10-19

申请号：US979327

申请日：1997-11-26

Applicant: Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

Inventor： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

IPC: G01Q30/02 ,  G01B15/00 ,  G01B15/04 ,  G01Q30/04 ,  H01J37/26

CPC classification number: G01B15/00 ,  G01B15/04 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

Abstract: An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

公开(公告)号：US5608218A

公开(公告)日：1997-03-04

申请号：US359761

申请日：1994-12-20

Applicant: Mitsugu Sato ,  Yoichi Ose ,  Satoru Fukuhara ,  Hideo Todokoro ,  Makoto Ezumi

Inventor： Mitsugu Sato ,  Yoichi Ose ,  Satoru Fukuhara ,  Hideo Todokoro ,  Makoto Ezumi

IPC: H01J37/22 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/225 ,  H01J2237/24495 ,  H01J2237/281

Abstract: A scanning electron microscope suitable for producing an image of high resolution by detecting secondary electrons and backscattered electrons generated from a specimen at a low accelerating voltage in a separate or synthesis fashion. In the scanning electron microscope electric and magnetic fields for separating trajectories of backscattered electrons and secondary electrons generated from a specimen are established, and a backscattered electron detector for detecting generated backscattered electrons is disposed on the trajectory of the backscattered electrons. According to the microscope, since secondary electrons and backscattered electrons can be detected efficiently in a separate fashion even at a low accelerating voltage of several kilovolts or less and besides the detector does not exert the deflection action on a primary electron beam, backscattered and secondary electron images of high resolution can be obtained.

Abstract translation: 一种扫描电子显微镜，其适用于通过以单独或合成的方式检测由低速加速电压下的样品产生的二次电子和反向散射电子来产生高分辨率的图像。 在扫描电子显微镜中，建立用于分离由样品产生的背散射电子和二次电子的轨迹的电场和磁场，并且用于检测产生的反向散射电子的反向散射电子检测器设置在背散射电子的轨迹上。 根据显微镜，由于二次电子和后向散射电子可以以几千伏或更小的低加速电压以单独的方式被有效地检测，此外，检测器不会对一次电子束，后向散射和二次电子施加偏转作用 可以获得高分辨率的图像。

公开(公告)号：US4928010A

公开(公告)日：1990-05-22

申请号：US233612

申请日：1988-07-25

Applicant: Kenichi Saito ,  Kou Wada ,  Masahiro Yoshizawa

Inventor： Kenichi Saito ,  Kou Wada ,  Masahiro Yoshizawa

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/281

Abstract: An arrangement for observing a surface using a charged particle beam irradiated on the surface of a specimen and detecting secondary electrons emitted. An exciting device produces a strong magnetic field substantially perpendicular to the surface of the specimen. Secondary electrons are extracted from a bottom or side surface of a recess, such as a through hole formed in the surface of the specimen, by an interaction between the emitted secondary electrons and the strong magnetic field. A focusing lens is arranged so as to focus the charged particles at a point on the specimen, even in the presence of a strong field. Thus, a secondary electron image on the surface of the specimen can be sharply obtained to thereby observe a secondary electron image at the bottom surface or side surface of the through hole.

Abstract translation: PCT No.PCT / JP87 / 00880 Sec。 371日期：1988年7月25日 102（e）日期1988年7月25日PCT提交1987年11月13日PCT公布。 出版物WO88 / 04104 日期：1988年6月2日。使用照射在试样表面上的带电粒子束观察表面的布置，检测发射的二次电子。 激励装置产生大致垂直于样品表面的强磁场。 二次电子通过发射的二次电子和强磁场之间的相互作用从凹陷的底部或侧表面提取，例如形成于样品表面的通孔。 聚焦透镜被布置成即使在存在强场的情况下也可将带电粒子聚焦在样品上的某一点。 因此，可以清楚地获得样品表面上的二次电子图像，从而在通孔的底表面或侧表面观察二次电子图像。

公开(公告)号：US09941095B2

公开(公告)日：2018-04-10

申请号：US15183952

申请日：2016-06-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryota Watanabe ,  Yuko Sasaki ,  Akira Ikegami

IPC: H01J37/21 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24578 ,  H01J2237/281

Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

公开(公告)号：US20170011881A1

公开(公告)日：2017-01-12

申请号：US14795877

申请日：2015-07-09

Applicant: Applied Materials Israel Ltd.

Inventor： Yuval GRONAU ,  Ishai SCHWARZBAND ,  Barak DEE-NOOR

IPC: H01J37/22 ,  H01J37/26 ,  H04N7/18

CPC classification number: H01J37/28 ,  G06T5/002 ,  G06T7/00 ,  G06T2207/10061 ,  H01J2237/221 ,  H01J2237/281

Abstract: A system that may include a processor, wherein the processor comprise an image waveform finder, a synthetic image generator and an output image generator; wherein the processor is configured to (i) receive or generate multiple images of a region of the object; wherein the region has an electron yield that is below an electron yield threshold; wherein each image is generated by scanning the region with an electron beam; (ii) process the multiple images to generate multiple synthetic images, and (iii) generate an output image of the region in response to the multiple synthetic images; wherein the image waveform finder is configured to process each image of the multiple images to find at least one image waveform that has a peak intensity that exceeds an intensity threshold; wherein the synthetic image generator is configured to replace one or more of the at least one image waveforms by one or more corresponding synthetic waveforms to provide a synthetic image; and wherein the output image generator is configured to generate an output image of the region in response to the multiple synthetic images

Abstract translation: 一种可包括处理器的系统，其中所述处理器包括图像波形取景器，合成图像发生器和输出图像发生器; 其中所述处理器被配置为（i）接收或生成所述对象的区域的多个图像; 其中所述区域具有低于电子产生阈值的电子产率; 其中通过用电子束扫描所述区域来产生每个图像; （ii）处理所述多个图像以生成多个合成图像，以及（iii）响应于所述多个合成图像生成所述区域的输出图像; 其中所述图像波形取景器被配置为处理所述多个图像的每个图像以找到具有超过强度阈值的峰值强度的至少一个图像波形; 其中所述合成图像产生器被配置为通过一个或多个相应的合成波形来替换所述至少一个图像波形中的一个或多个以提供合成图像; 并且其中所述输出图像生成器被配置为响应于所述多个合成图像来生成所述区域的输出图像

公开(公告)号：US09448253B2

公开(公告)日：2016-09-20

申请号：US14719193

申请日：2015-05-21

Applicant: Applied Materials Israel, Ltd.

Inventor： Konstantin Chirko ,  Alon Litman

IPC: H01J37/00 ,  G01Q60/30 ,  G01Q30/02 ,  H01J37/28

CPC classification number: G01Q60/30 ,  G01Q30/02 ,  H01J37/28 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.

Abstract translation: 一种用于评估具有纳米尺度宽度并形成在衬底中的高纵横比（HAR）孔的系统，方法和非暂时计算可读介质，包括在照明周期期间通过静电测量装置获得多个测量结果， 包括放置在靠近HAR孔的探针尖端; 其中所述HAR孔内的多个位置在照明周期期间用带电粒子束照射; 并处理多个测量结果以确定HAR孔的状态。

公开(公告)号：US20150371816A1

公开(公告)日：2015-12-24

申请号：US14763363

申请日：2014-01-17

Applicant: Hitachi High- Technologies Corporation

Inventor： Ayumi DOI ,  Tomohiro FUNAKOSHI ,  Takuma YAMAMOTO ,  Tomohiro TAMORI ,  Tsunehiro SAKAI

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/241 ,  H01J37/28 ,  H01J2237/225 ,  H01J2237/281

Abstract: A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image. The operation part judges appropriateness/inappropriateness of the first acceleration voltage with the use of the information indicating the relationship and the brightness ratio in the image.

Abstract translation: 本发明的样品观察装置包括：带电粒子光学柱，用于以第一加速电压照射带有带电粒子束的样品，所述样品具有作为凹部的观察对象部分; 图像获取部分，用于基于通过照射带电粒子束获得的信号来获取包括要观察的目标部分的图像; 存储器部分，用于在多个加速电压中的每一个处预先存储指示在标准样品中凹部与凹部的周边部分的亮度比与凹部的结构的值之间的关系的信息 标准样品的一部分; 以及用于获得图像中的凹部与凹部的周边部的亮度比的操作部。 操作部通过使用表示图像的关系和亮度比的信息来判断第一加速电压的适当性/不适当性。