公开(公告)号：US09231154B2

公开(公告)日：2016-01-05

申请号：US14169920

申请日：2014-01-31

申请人： Hisao Ikeda ,  Takuya Kawata ,  Manabu Niboshi ,  Katsuhiro Kikuchi ,  Shinichi Kawato ,  Takashi Ochi ,  Yuto Tsukamoto ,  Tomohiro Kosaka ,  Tomofumi Osaki

发明人： Hisao Ikeda ,  Takuya Kawata ,  Manabu Niboshi ,  Katsuhiro Kikuchi ,  Shinichi Kawato ,  Takashi Ochi ,  Yuto Tsukamoto ,  Tomohiro Kosaka ,  Tomofumi Osaki

IPC分类号： H01L33/00 ,  H01L33/26 ,  H01L51/50 ,  H01L51/52 ,  H01L27/32

CPC分类号： H01L33/26 ,  H01L27/322 ,  H01L51/504 ,  H01L51/5225 ,  H01L51/5265 ,  H01L51/5268

摘要： The emission efficiency of a light-emitting device including a microcavity structure is improved. The light-emitting device includes a plurality of light-emitting elements. The plurality of light-emitting elements each include a reflective electrode, a transparent electrode, a plurality of light-emitting layers, and a semi-transmissive and semi-reflective electrode stacked in that order. The plurality of light-emitting layers emit light of different colors. A surface roughness of the transparent electrode in the light-emitting element which is among the plurality of light-emitting elements and in which light emitted from the light-emitting layer closest to the reflective electrode is amplified and emitted outside is greater than surface roughnesses of the transparent electrodes in the other light-emitting elements.

摘要翻译： 提高了包括微腔结构的发光装置的发射效率。 发光装置包括多个发光元件。 多个发光元件各自包括反射电极，透明电极，多个发光层以及按顺序堆叠的半透射和半反射电极。 多个发光层发射不同颜色的光。 作为多个发光元件之中的发光元件中的透明电极的表面粗糙度，其中从最靠近反射电极的发光层发出的光被放大和发射到外部，其表面粗糙度大于 其他发光元件中的透明电极。

公开(公告)号：US09087964B2

公开(公告)日：2015-07-21

申请号：US14054051

申请日：2013-10-15

申请人： Kaoru Hatano ,  Naoyuki Senda ,  Manabu Niboshi ,  Katsuhiro Kikuchi ,  Shinichi Kawato ,  Takashi Ochi ,  Yuto Tsukamoto ,  Tomohiro Kosaka ,  Tomofumi Osaki

发明人： Kaoru Hatano ,  Naoyuki Senda ,  Manabu Niboshi ,  Katsuhiro Kikuchi ,  Shinichi Kawato ,  Takashi Ochi ,  Yuto Tsukamoto ,  Tomohiro Kosaka ,  Tomofumi Osaki

IPC分类号： H01L33/00 ,  H01L29/18 ,  H01L33/36 ,  H01L27/32 ,  H01L51/50 ,  H01L51/52

CPC分类号： H01L33/36 ,  H01L27/3209 ,  H01L27/3246 ,  H01L51/5044 ,  H01L51/525

摘要： Occurrence of a crosstalk phenomenon is suppressed in a light-emitting device including a tandem element. A light-emitting device includes a first lower electrode and a second lower electrode over an insulating layer; a partition which is formed over the insulating layer and positioned between the first lower electrode and the second lower electrode; a projecting object formed over the partition; a first light-emitting unit over each of the first lower electrode, the partition, the projecting object, and the second lower electrode; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit. A recess is formed by a side surface of the projecting object and a side surface of the partition.

摘要翻译： 在包括串联元件的发光装置中，抑制了串扰现象的发生。 发光器件包括绝缘层上的第一下电极和第二下电极; 形成在所述绝缘层上并且位于所述第一下电极和所述第二下电极之间的分隔件; 形成在隔板上的突出物体; 在所述第一下部电极，所述隔板，所述突出物体和所述第二下部电极的每一侧上方的第一发光单元; 在所述第一发光单元上方的中间层; 在所述中间层上方的第二发光单元; 以及位于第二发光单元上的上电极。 凹部由突出物的侧面和隔壁的侧面形成。

公开(公告)号：US08906718B2

公开(公告)日：2014-12-09

申请号：US13976437

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L21/00 ,  H01L21/02 ,  H01L27/32 ,  H01L51/52 ,  H01L51/56 ,  H05B33/04 ,  H05B33/10 ,  H01L33/00 ,  H01L51/00 ,  C23C14/04 ,  C23C16/04

CPC分类号： H01L21/02104 ,  C23C14/042 ,  C23C16/042 ,  H01L27/3211 ,  H01L33/005 ,  H01L51/0011 ,  H01L51/524 ,  H01L51/56 ,  H01L2251/566 ,  H05B33/04 ,  H05B33/10

摘要： On a surface of a substrate (3) on which surface a vapor-deposited film is to be formed, a photoresist (13) is formed so as to have an opening in a sealing region including a display region (R1) which sealing region is formed by a sealing resin (11) of a frame shape. Then, luminescent layers (8R, 8G, and 8B) having a striped pattern are formed. Subsequently, the photoresist (13) is removed with the use of an exfoliative solution so as to form the luminescent layers (8R, 8G, and 8B) patterned with high definition.

摘要翻译： 在其上形成有蒸镀膜的基板（3）的表面上形成光致抗蚀剂（13），以在包括显示区域（R1）的密封区域内具有开口，所述显示区域（R1）的密封区域 由框状的密封树脂（11）形成。 然后，形成具有条纹图案的发光层（8R，8G，8B）。 随后，用去角质溶液去除光致抗蚀剂（13），以形成以高清晰度图案化的发光层（8R，8G和8B）。

公开(公告)号：US20140284575A1

公开(公告)日：2014-09-25

申请号：US14215684

申请日：2014-03-17

申请人： Nozomu SUGISAWA ,  Hisao IKEDA ,  Katsuhiro KIKUCHI ,  Manabu NIBOSHI ,  Satoshi INOUE ,  Yuto TSUKAMOTO ,  Shinichi KAWATO

发明人： Nozomu SUGISAWA ,  Hisao IKEDA ,  Katsuhiro KIKUCHI ,  Manabu NIBOSHI ,  Satoshi INOUE ,  Yuto TSUKAMOTO ,  Shinichi KAWATO

IPC分类号： H01L51/52 ,  H01L27/32

CPC分类号： H01L51/5218 ,  H01L27/3246 ,  H01L51/5209 ,  H01L51/5215 ,  H01L51/5265

摘要： To inhibit surface reflection of a display device. A display device which includes a reflective electrode layer 110; a partition 118 formed to surround the reflective electrode layer; a layer 120 containing a light-emitting organic compound and formed over the partition and the reflective electrode layer; a semi-transmissive electrode layer 122 formed over the layer containing the light-emitting organic compound; and a coloring layer 162 formed over the semi-transmissive electrode layer. The coloring layer overlaps with the reflective electrode layer and the partition. The partition does not overlap with the reflective electrode layer.

摘要翻译： 抑制显示装置的表面反射。 一种显示装置，包括反射电极层110; 形成为围绕反射电极层的隔壁118; 包含发光有机化合物并形成在隔板和反射电极层上的层120; 在包含发光有机化合物的层上形成的半透射电极层122; 以及形成在半透射电极层上的着色层162。 着色层与反射电极层和隔板重叠。 隔板与反射电极层不重叠。

公开(公告)号：US08828856B2

公开(公告)日：2014-09-09

申请号：US13980873

申请日：2012-01-13

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L21/22 ,  C23C16/00 ,  H01L27/32 ,  C23C14/04 ,  C23C14/56 ,  H01L51/56

CPC分类号： H01L27/3295 ,  C23C14/042 ,  C23C14/56 ,  H01L27/3211 ,  H01L27/3276 ,  H01L27/3283 ,  H01L51/56 ,  H01L2227/323

摘要： Provided is a TFT substrate (10) on which vapor-deposited sections are to be formed by use of a vapor deposition device (50) which includes a vapor deposition source (85) having injection holes (86); and a vapor deposition mask (81) having opening (82) through which vapor deposition particles are deposited to form the vapor-deposited sections. The TFT substrate (10) includes pixels two-dimensionally arranged in a pixel region (AG); and wires (14) electrically connected to the respective pixels. The vapor-deposited sections (Q) are formed with gaps (X) therebetween, and the wires (14) having respective terminals that are disposed in the gaps (X).

摘要翻译： 提供了通过使用包括具有喷射孔（86）的气相沉积源（85）的蒸镀装置（50）形成蒸镀部的TFT基板（10）。 和具有开口（82）的气相沉积掩模（81），通过蒸镀掩模沉积气相沉积颗粒以形成气相沉积部分。 TFT基板（10）包括像素区域（AG）二维排列的像素。 以及电连接到各个像素的导线（14）。 气相沉积部分（Q）在它们之间形成有间隙（X），并且具有设置在间隙（X）中的各个端子的导线（14）。

公开(公告)号：US20140010957A1

公开(公告)日：2014-01-09

申请号：US14004894

申请日：2012-03-07

申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

IPC分类号： C23C16/448

CPC分类号： C23C16/448 ,  C23C14/042 ,  C23C14/243 ,  H01L51/0003 ,  H01L51/56

摘要： A vapor deposition particle emitting device (30) includes a hollow rotor (40) provided with a first and a second nozzle sections (50 and 60), a rolling mechanism, and heat exchangers (52 and 62), and when the rolling mechanism causes the rotor (40) to rotate, the heat exchangers (52 and 62) switch between cooling and heating in accordance with placement of the nozzle section so that that one of the nozzle sections which faces outward has a temperature lower than a temperature at which vapor deposition material turns into gas and the other nozzle section has a temperature equal to or higher than the temperature at which the vapor deposition material turns into the gas.

摘要翻译： 气相沉积粒子发射装置（30）包括设置有第一和第二喷嘴部分（50和60），滚动机构和热交换器（52和62）的中空转子（40），并且当滚动机构引起 转子（40）旋转，热交换器（52和62）根据喷嘴部分的放置而在冷却和加热之间切换，使得面向外的喷嘴部分之一的温度低于蒸气 沉积材料变成气体，另一个喷嘴部分的温度等于或高于气相沉积材料变成气体的温度。

公开(公告)号：US20130340680A1

公开(公告)日：2013-12-26

申请号：US14004151

申请日：2012-03-05

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L21/02

CPC分类号： H01L51/0011 ,  C23C14/24 ,  C23C14/243 ,  C23C14/564 ,  H01L21/02104 ,  H01L51/001 ,  H01L51/56

摘要： The vapor deposition particle injecting device (20) includes a crucible (22), a holder (21) having at least one injection hole (21a), and plate members (23 through 25) provided in the holder (21). The plate members (23 through 25) have respective openings (23a through 25a) corresponding to the injection hole (21a), and the plate members (23 through 25) are arranged away from each other in a direction perpendicular to the opening planes of the openings. The injection hole (21a) and the openings (23a through 25a) overlap each other in the plan view.

摘要翻译： 气相沉积粒子注入装置（20）包括坩埚（22），具有至少一个注入孔（21a）的保持器（21）和设置在保持器（21）中的板构件（23至25）。 板构件（23至25）具有与喷射孔（21a）相对应的相应的开口（23a至25a），并且板构件（23至25）在与 开口 注射孔（21a）和开口（23a至25a）在平面图中彼此重叠。

公开(公告)号：US20130323882A1

公开(公告)日：2013-12-05

申请号：US13985281

申请日：2012-03-07

申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda ,  Satoshi Hashimoto

发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H01L51/50

CPC分类号： H01L51/5012 ,  B05D1/60 ,  C23C14/042 ,  C23C14/243 ,  C23C14/542 ,  C23C14/564 ,  H01L51/0003 ,  H01L51/56

摘要： A vapor deposition particle injection device (30) includes a vapor deposition particle generating section (41), at least one nozzle stage made of an intermediate nozzle section (51), a vapor deposition particle emitting nozzle section (61), and heat exchangers (43, 63, 53). The vapor deposition particle emitting nozzle section (61) is controlled so as to be at a temperature lower than a temperature at which a vapor deposition material turns into gas. Meanwhile, the intermediate nozzle section (51) is controlled by the heat exchanger (53) so as to be at a temperature between a temperature of the vapor deposition particle generating section (41) and a temperature of the vapor deposition particle emitting nozzle section (61).

摘要翻译： 气相沉积粒子注入装置（30）包括气相沉积粒子产生部分（41），由中间喷嘴部分（51），气相沉积粒子发射喷嘴部分（61）和热交换器 43，63，53）。 气相沉积粒子发射喷嘴部分（61）被控制在低于气相沉积材料变成气体的温度的温度。 同时，中间喷嘴部（51）由热交换器（53）控制，处于蒸镀微粒生成部（41）的温度与蒸镀微粒发射喷嘴部的温度 61）。

公开(公告)号：US20130295716A1

公开(公告)日：2013-11-07

申请号：US13980037

申请日：2012-01-04

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

IPC分类号： H01L51/00

CPC分类号： H01L51/0008 ,  C23C14/042 ,  C23C14/044 ,  C23C14/12 ,  C23C14/243 ,  H01L51/001 ,  H01L51/56

摘要： First and second vapor deposition particles (91a, 91b) discharged from first and second vapor deposition source openings (61a, 61b) pass through first and second limiting openings (82a, 82b) of a limiting plate unit (80), pass through mask opening (71) of a vapor deposition mask (70) and adhere to a substrate (10) so as to form a coating film. If regions on the substrate to which the first vapor deposition particles and the second vapor deposition particles adhere if the vapor deposition mask is assumed not to exist are respectively denoted by a first region (92a) and a second region (92b), the limiting plate unit limits the directionalities of the first vapor deposition particles and the second vapor deposition particles in a first direction (10a) that travel to the substrate such that the second region is contained within the first region. Accordingly, it is possible to form a light emitting layer with a doping method by using vapor deposition by color.

摘要翻译： 从第一和第二气相沉积源开口（61a，61b）排出的第一和第二蒸镀颗粒（91a，91b）穿过限制板单元（80）的第一和第二限制开口（82a，82b），通过掩模开口 （70）的表面（71）并粘附到基底（10）上以形成涂膜。 如果假设不存在气相沉积掩模，则第一气相沉积颗粒和第二气相沉积颗粒附着的基板上的区域分别由第一区域（92a）和第二区域（92b）表示，限制板 单元限制第一气相沉积颗粒和第二气相沉积颗粒在向基板移动的第一方向（10a）上的方向性，使得第二区域包含在第一区域内。 因此，可以通过使用通过颜色的气相沉积形成具有掺杂方法的发光层。

公开(公告)号：US20130285038A1

公开(公告)日：2013-10-31

申请号：US13979845

申请日：2012-01-12

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/50

CPC分类号： H01L51/5036 ,  C23C14/042 ,  C23C14/24 ,  H01L27/3276 ,  H01L51/001 ,  H01L51/0011 ,  H01L2227/323

摘要： On the TFT substrate (10), a vapor deposition layer is formed by use of a vapor deposition device (50) which includes (i) a vapor deposition source (85) having injection holes (86) and (ii) a vapor deposition mask (81) having openings (82) through which vapor deposition particles injected from the injection holes (86) are deposited so as to form the vapor deposition layer. The TFT substrate (10) has a plurality of pixels two-dimensionally arranged in a pixel region (AG), and terminals of a plurality of wires (14), which are electrically connected with the plurality of pixels, are gathered outside a vapor deposition layer formation region.

摘要翻译： 在TFT基板（10）上，通过使用蒸镀装置（50）形成蒸镀层，该蒸镀装置包括：（i）具有喷射孔（86）的蒸镀源（85）和蒸镀掩模 （81），其具有开口（82），沉积从喷射孔（86）喷射的气相沉积颗粒以形成气相沉积层。 TFT基板（10）具有像素区域（AG）二维排列的多个像素，并且与多个像素电连接的多根电线（14）的端子聚集在气相沉积 层形成区域。