公开(公告)号：US10747127B2

公开(公告)日：2020-08-18

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Erik Johan Arlemark ,  Hendrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Joost De Hoogh ,  Gosse Charles De Vries ,  Paul Comé Henri De Wit ,  Sander Catharina Reinier Derks ,  Ronald Cornelis Gerardus Gijzen ,  Dries Vaast Paul Hemschoote ,  Christiaan Alexander Hoogendam ,  Adrianus Hendrik Koevoets ,  Raymond Wilhelmus Louis Lafarre ,  Alain Louis Claude Leroux ,  Patrick Willem Paul Limpens ,  Jim Vincent Overkamp ,  Christiaan Louis Valentin ,  Koos Van Berkel ,  Stan Henricus Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Harmen Klaas Van Der Schoot ,  David Ferdinand Vles ,  Evert Auke Rinze Westerhuis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10739684B2

公开(公告)日：2020-08-11

申请号：US16454126

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens

IPC: G03F7/20 ,  G03F9/00

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US10466595B2

公开(公告)日：2019-11-05

申请号：US15790287

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US10353296B2

公开(公告)日：2019-07-16

申请号：US16034859

申请日：2018-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US10345711B2

公开(公告)日：2019-07-09

申请号：US15682135

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander Hoogendam ,  Gerrit Johannes Nijmeijer ,  Minne Cuperus ,  Petrus Anton Willem Cornelia Maria Van Eijck

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/26 ,  G01B11/14 ,  G01B11/27

Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

公开(公告)号：US10248034B2

公开(公告)日：2019-04-02

申请号：US15338116

申请日：2016-10-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC: G03F7/20

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

公开(公告)号：US10234768B2

公开(公告)日：2019-03-19

申请号：US15969847

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC: G03F7/20

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

公开(公告)号：US10209634B2

公开(公告)日：2019-02-19

申请号：US15547713

申请日：2016-01-26

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Maurice Willem Jozef Etiënne Wijckmans ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Christiaan Alexander Hoogendam ,  Bernardus Antonius Johannes Luttikhuis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

公开(公告)号：US20190036405A1

公开(公告)日：2019-01-31

申请号：US16073258

申请日：2017-01-05

Applicant: ASML Netherlands B.V.

Inventor： Maarten Hartger Kimman ,  Dave Braaksma ,  Peter Michel Silvester Maria Heijmans ,  Christiaan Alexander Hoogendam

IPC: H02K3/28 ,  H02K41/03

Abstract: An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pm1 in a first direction and a pitch Pm2 in a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pc1 in the first coil set in the first direction over Pm1 is different from a ratio R2 of a coil pitch Pc2 in the second coil set in the second direction over Pm2.

公开(公告)号：US10139735B2

公开(公告)日：2018-11-27

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Hans Butler ,  Christiaan Alexander Hoogendam ,  Sander Kerssemakers ,  Bart Smeets ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Hubertus Petrus Leonardus Henrica Van Bussel

IPC: G02B27/52 ,  G03F7/20

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.