公开(公告)号：US07630060B2

公开(公告)日：2009-12-08

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/32

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种器件制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投影到所述衬底的内部目标部分上。

公开(公告)号：US20080218712A1

公开(公告)日：2008-09-11

申请号：US12153245

申请日：2008-05-15

申请人： Rene Theodorus Petrus Compen ,  Joost Jeroen Ottens

发明人： Rene Theodorus Petrus Compen ,  Joost Jeroen Ottens

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/707

摘要： An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.

摘要翻译： 浸没式光刻设备包括用于原位清洗浸没式光刻设备中的部件的清洁系统。 清洁系统被布置成在要清洁的部件上的预定位置附近提供清洁环境。 该系统还布置成提供基本上与在预定位置处存在的污染物类型无关的清洁环境。

公开(公告)号：US20080137055A1

公开(公告)日：2008-06-12

申请号：US11635789

申请日：2006-12-08

申请人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

发明人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal stabilizer, arranged in the peripheral part, configured to thermally stabilize a central part of the substrate support relative to the peripheral part.

摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 衬底支撑件具有中心部分和周边部分，周边部分包括提取管道，其被配置为从衬底支撑件的顶表面提取液体，所述抽出管道连接到出口管道，该出口管道构造成将液体导管远离衬底 支持。 衬底支撑件还包括设置在周边部分中的热稳定器，其被配置为相对于周边部分热稳定衬底支撑件的中心部分。

公开(公告)号：US07327439B2

公开(公告)日：2008-02-05

申请号：US10988832

申请日：2004-11-16

申请人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Jan Hopman

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Jan Hopman

IPC分类号： G03B27/62

CPC分类号： G03F7/70716 ,  B32B38/0012 ,  B32B38/06 ,  B32B2315/02 ,  G03F7/70708 ,  Y10T428/24479

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least one of the bonded layers includes a plurality of recesses facing another of the bonded layers, so as to reduce a bonding surface between the bonded layers.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成调节辐射束的照明系统和被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件。 物品支撑件包括多个粘合层。 至少一个接合层包括面对另一个接合层的多个凹槽，以便减少接合层之间的接合表面。

公开(公告)号：US20080024748A1

公开(公告)日：2008-01-31

申请号：US11494794

申请日：2006-07-28

申请人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

IPC分类号： G03B27/58

CPC分类号： G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

摘要： A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

摘要翻译： 光刻设备包括一个系统，用于补偿衬底台的热变形对衬底台的位置测量的影响，使用衬底台中的侧视镜。 提出了使用各种衬底台扫描轨迹校准光刻设备的方法以及衬底台中横向镜的局部位置和旋转的测量。 具有对准标记的双级光刻设备，其限定仅在曝光站处使用的侧视镜的几何形状，以便当衬底台位于测量站时测量侧视镜的几何形状。

公开(公告)号：US07105836B2

公开(公告)日：2006-09-12

申请号：US10273405

申请日：2002-10-18

申请人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

发明人： Santiago del Puerto ,  Daniel N. Galburt ,  Andrew W. McCullough ,  Stephen Roux ,  Joost Jeroen Ottens

IPC分类号： G03F7/20 ,  F25B29/00 ,  H01J37/20

CPC分类号： G03F7/70716 ,  F28F3/048 ,  G03F7/70875

摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.

摘要翻译： 系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。 。 这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量 长时间的阶段。 短行程阶段可以从长行程阶段磁悬浮。 这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。 通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。

公开(公告)号：US07088431B2

公开(公告)日：2006-08-08

申请号：US10736778

申请日：2003-12-17

申请人： Joost Jeroen Ottens ,  Johannes Hubertus Josephina Moors ,  Peter Theodorus Maria Giesen

发明人： Joost Jeroen Ottens ,  Johannes Hubertus Josephina Moors ,  Peter Theodorus Maria Giesen

IPC分类号： G03B27/62 ,  G03B27/58 ,  H02N13/00

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70875

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，用于将物品夹紧在物品支撑件上的静电夹具 通过在投影期间的静电场，以及设置在物品支撑件中的凹进的回填气体进料，用于当由物品支撑件支撑时将回填气体供给到物品的背面。 根据本发明的一个方面，凹入的回填气体进料包括用于屏蔽来自静电场的凹进的回填气体进料中的回填气体的屏蔽层。

公开(公告)号：US20060097201A1

公开(公告)日：2006-05-11

申请号：US10970733

申请日：2004-10-22

申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

IPC分类号： G01J3/10

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

公开(公告)号：US07019816B2

公开(公告)日：2006-03-28

申请号：US10736988

申请日：2003-12-17

申请人： Joost Jeroen Ottens ,  Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

发明人： Joost Jeroen Ottens ,  Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, an article support to support an article to be placed in a beam path of the beam of radiation, and a clamp to clamp the article to the article support. The clamp is provided with a plurality of zones located around a circumference of the article support to create a locally adjusted pressure so as to provide a local bending moment to locally bend the article.

摘要翻译： 公开了一种光刻设备。 该装置包括：照明系统，用于提供辐射束;物品支撑件，用于支撑放置在辐射束的光束路径中的物品;以及夹具，用于将物品夹持到物品支撑件上。 夹具设置有围绕物品支撑件的圆周设置的多个区域，以产生局部调节的压力，以便提供局部弯曲力矩以局部弯曲物品。

公开(公告)号：US08786823B2

公开(公告)日：2014-07-22

申请号：US12960947

申请日：2010-12-06

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。