摘要:
A storage device enabling realization of a new storage configuration enabling apparent elimination of the overhead and enabling high speed access all the time particularly when constructing a high parallel configured high speed flash memory system, that is, a storage device having a flash memory as a main storage and having the function of rewriting at least a partial region of the flash memory by additional writing update data in an empty region and invalidating original data and, at the time of standby of the device where there is no access from the outside, performing processing for automatically restoring the invalidated region to an empty region, and a computer system and a storage system using the same.
摘要:
A semiconductor memory device able to read out data at a high speed continuously, provided with, corresponding to a plurality of banks, current address registers for holding addresses for reading data of cell arrays, reserved address registers able to receive in advance and hold reserved addresses for next read operations from the outside, and bank control circuits for making the current address registers hold reserved addresses held in the reserved address registers, making the data be read out, and making the data latch circuits hold the data when the data read out from the cell arrays of the banks by addresses held in the current address registers and held in the data latch circuits become able to be transferred to the outside, and a signal processing system relating to the same.
摘要:
A ferroelectric-type nonvolatile semiconductor memory comprising a bit line BL, a transistor for selection TR, a memory unit MU composed of memory cells MCM that are M in number (M≧2), and plate lines PLM that are M in number, in which each memory cell comprises a first electrode 21, a ferroelectric layer 22 and a second electrode 23; in the memory unit MU, the first electrodes 21 of the memory cells MCM are in common, and said common first electrode 21 is connected to the bit line BL through the transistor for selection TR; in the memory unit MU, the second electrode 23 of the m-th-place memory cell is connected to the m-th-place plate line PLm; and said ferroelectric-type nonvolatile semiconductor memory further comprises a circuit TRS for short-circuiting the plate lines PLM that are M in number and the common first electrode 21.
摘要翻译:一种铁电型非易失性半导体存储器,包括位线BL,用于选择TR的晶体管,由M(= M)= M的存储单元MC M组成的存储器单元MU,以及板 其中每个存储单元包括第一电极21,铁电层22和第二电极23,其中M是数字M, 在存储单元MU中,存储单元MC M M的第一电极21是共同的,并且所述公共第一电极21通过用于选择TR的晶体管连接到位线BL; 在存储单元MU中,第m位存储单元的第二电极23连接到第m位置板线PL< m>; 并且所述铁电型非易失性半导体存储器还包括用于短路数量为M的平板线PL M M和用于公共第一电极21的电路TR SUB S< S> S。
摘要:
A method of operating a ferroelectric-type nonvolatile semiconductor memory comprising a memory unit having a bit line, a transistor for selection, a sub-memory unit composed of memory cells that are M in number, plate lines that are M in number, and a sense amplifier connected to the bit line; wherein each memory cell comprises a first electrode, a ferroelectric layer and a second electrode; the first electrodes of the memory cells constituting the sub-memory unit are in common with the sub-memory unit; said common first electrode is connected to the bit line through the transistor for selection; and each second electrode is connected to each plate line; said method comprising reading out data stored in the memory cell at a designated address externally designated, latching said data in the sense amplifier, and then outputting said data latched in the sense amplifier.
摘要:
A wafer bonding method for forming a SOI structure comprising the steps of bringing wafers into proximity in a state with one wafer a slight, substantially uniform clearance away from the other wafer and pressing one point of at least one wafer of the two wafers against the other wafer. In another aspect of the invention, there is provided a method of positioning for photolithography using an alignment mark portions and/or a vernier portions formed on a SOI substrate, which comprises the step of removing semiconductor layer portions corresponding to the alignment mark portions and/or the vernier portions. In further another aspect of the invention, there is provided a new DRAM semiconductor device formed by using SOI structure, which comprises a new pattern of a strage node formed longitudinally along a word line. Further, there is provided a new DRAM semiconductor device formed by using SOI structure, which comprises a unique strage node having a conductive side wall.
摘要:
A semiconductor DRAM cell capacitor comprises an accumulation electrode (3) formed of a p-type semiconductor, and a capacitor insulating film (5) formed between the accumulation electrode (3) and the counter electrode (4). The potential of the counter electrode (4) is fixed at a ground potential. The semiconductor DRAM cell capacitor reduces the size of an associated chip and reduces the power consumption of the associated DRAM.
摘要:
A position alignment mark is formed by simultaneously forming on a silicon substrate an alignment marking contact hole and a back surface electrode contact hole, respectively, in a field zone and an element zone. A wiring pattern layer and a back surface electrode are formed on the field zone and element zone, respectively. A silicon layer is cut from the back surface of the silicon substrate to expose the wiring pattern layer and an alignment marking contact hole pattern. The contact hole pattern is then used as an alignment mark for forming a surface electrode.
摘要:
A pixel circuit includes: a photoelectric conversion device; a source-follower circuit; a transfer transistor that transfers charge generated in the photoelectric conversion device to an input node of the source-follower circuit; and a readout system that reads out a signal in response to the generated charge through the source-follower circuit, wherein the readout system floats the input node of the source-follower circuit and turns on the transfer transistor to transfer the signal charge to the input node, includes a function of turning off the transfer transistor, sensing an output node potential of the source-follower circuit, and reading out an output signal, and further includes an output modulation degree control function unit that temporarily reduces an output modulation degree of the source-follower circuit when the transfer transistor is turned on.
摘要:
An imaging element includes: a pixel section in which a plurality of pixels each having a photoelectric conversion element are arranged in a matrix; a signal line to which a signal read from the pixels is transmitted; a holding section for holding the read signal during a holding period; a processing section for performing signal processing on the read signal after being held by the holding section; and a control section for controlling supply of the read signal to the holding section. The control section supplies the read signal to the holding section to cause it to hold the read signal during the holding period, and stops supplying the read signal to the holding section to cause the processing section to perform the signal processing on the read signal and to cause a signal to be read from the pixels and output to the signal line after the holding.