公开(公告)号：US08730455B2

公开(公告)日：2014-05-20

申请号：US13181033

申请日：2011-07-12

申请人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

发明人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US08289623B2

公开(公告)日：2012-10-16

申请号：US12729948

申请日：2010-03-23

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US08270077B2

公开(公告)日：2012-09-18

申请号：US11440479

申请日：2006-05-25

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28

CPC分类号： G02B27/286 ,  G02B7/008

摘要： An optical arrangement includes a polarization-modulating optical element and a compensation plate is disclosed. The polarization-modulating optical element includes a first optically active material having a first specific rotation with a sign, the polarization-modulating optical element having a first optical axis. The polarization-modulating element has a first thickness profile that, as measured in the direction of the first optical axis, that is variable. The compensation plate includes a second optically active material having a second specific rotation with a sign opposite the sign of the first specific rotation. The compensation plate has a second thickness profile configured so that, when radiation passes through the optical arrangement, the compensation plate substantially compensates for angle deviations of the radiation that are caused by the polarization-modulating optical element.

摘要翻译： 光学装置包括偏振调制光学元件和补偿板。 偏振调制光学元件包括具有第一比旋转符号的第一光学活性材料，该偏振调制光学元件具有第一光轴。 偏振调制元件具有第一厚度分布，其在第一光轴的方向上测量为可变的。 补偿板包括具有与第一比旋转的符号相反的符号的第二比旋的第二光学活性材料。 补偿板具有第二厚度轮廓，其被构造成使得当辐射通过光学装置时，补偿板基本上补偿由偏振调制光学元件引起的辐射的角度偏差。

公开(公告)号：US20110228247A1

公开(公告)日：2011-09-22

申请号：US13051384

申请日：2011-03-18

申请人： Heine Melle Mulder ,  Steven George Hansen ,  Johannes Catharinus Hubertus Mulkens ,  Markus Deguenther

发明人： Heine Melle Mulder ,  Steven George Hansen ,  Johannes Catharinus Hubertus Mulkens ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70091 ,  G03F7/70116

摘要： An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.

摘要翻译： 公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动到与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器将修改的偏振应用于至少部分光束。 所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与 辐射束的不同部分。

公开(公告)号：US20110188019A1

公开(公告)日：2011-08-04

申请号：US12814269

申请日：2010-06-11

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/72 ,  F21V7/00 ,  F21V9/14 ,  G03B27/54 ,  G02B5/30

CPC分类号： G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

摘要翻译： 本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中 另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

公开(公告)号：US20110019172A1

公开(公告)日：2011-01-27

申请号：US12846470

申请日：2010-07-29

申请人： Artur Hoegele ,  Markus Deguenther

发明人： Artur Hoegele ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G02B11/04

CPC分类号： G03F7/7015 ,  G03F7/70141 ,  G03F7/70191

摘要： An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

摘要翻译： 照明光学器件照射用于微光刻的投影曝光装置的物体场。 照明光学器件包括引导一束有用光的光学部件的聚光器组。 束导向部件的目标组布置在冷凝器组的下游。 冷凝器组的至少一个部件和物镜组的至少一个部件可移位以补偿处于实际照明状态的物场偏离所期望的照明状态。

公开(公告)号：US20100149504A1

公开(公告)日：2010-06-17

申请号：US12637889

申请日：2009-12-15

申请人： Markus Deguenther

发明人： Markus Deguenther

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03B27/70

CPC分类号： G03F7/70566 ,  G03F7/70116

摘要： Illumination devices of a microlithographic projection exposure apparatus, include a deflection device with which at least two light beams impinging on the deflection device can be variably deflected independently of one another by variation of the deflection angle in each case in such a way that each of the light beams can be directed onto at least one location in a pupil plane of the illumination device via at least two different beam paths; wherein, on the beam paths, at least one optical property of the respective light beam is influenced differently.

摘要翻译： 微光刻投影曝光装置的照明装置包括偏转装置，利用该偏转装置，通过每种情况下的偏转角的变化，入射在偏转装置上的至少两束光束可以彼此独立地偏转，使得每个 光束可以经由至少两个不同的光束路径被引导到照明装置的光瞳平面中的至少一个位置; 其中，在光束路径上，各个光束的至少一个光学特性受到不同的影响。

公开(公告)号：US20100060873A1

公开(公告)日：2010-03-11

申请号：US12533756

申请日：2009-07-31

申请人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

发明人： Markus Deguenther ,  Paul Graeupner ,  Juergen Fischer

IPC分类号： G03B27/70

CPC分类号： G03F7/70216 ,  G03F7/70116 ,  G03F7/70158

摘要： An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

摘要翻译： 用于在微光刻曝光设备中照射掩模的照明系统具有光轴和光瞳表面。 该系统可以包括反射或透明的束偏转元件阵列，例如反射镜。 每个偏转元件可以适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件可以布置在第一平面中。 该系统还可以包括光栅元件，其包括多个微透镜和/或衍射结构。 可以布置在第一平面中的光束偏转元件）和可以布置在第二平面中的光栅元件可以共同地产生二维远场强度分布。 光学成像系统可以将第一平面与第二平面光学共轭。

公开(公告)号：US20070206171A1

公开(公告)日：2007-09-06

申请号：US11505408

申请日：2006-08-17

申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

IPC分类号： G03B27/54

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US20060244941A1

公开(公告)日：2006-11-02

申请号：US11409387

申请日：2006-04-13

申请人： Toralf Gruner ,  Markus Deguenther

发明人： Toralf Gruner ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70558

摘要： A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.