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192 条记录 (耗时 0.034 秒)

    Sample Holder, Inspection Apparatus, and Inspection Method
    72.
    发明申请
    Sample Holder, Inspection Apparatus, and Inspection Method 审中-公开
    样品持有人，检验仪器和检验方法

    公开(公告)号：US20110284745A1

    公开(公告)日：2011-11-24

    申请号：US13099544

    申请日：2011-05-03

    申请人： Hidetoshi Nishiyama ,  Nobuo Saotome ,  Mitsuo Suga

    发明人： Hidetoshi Nishiyama ,  Nobuo Saotome ,  Mitsuo Suga

    IPC分类号： G01N23/22 ,  G01N23/00 ,  G21K5/08

    CPC分类号： H01J37/20 ,  G01N23/2204 ,  H01J2237/2003 ,  H01J2237/2004

    摘要： A sample holder, inspection apparatus, and an inspection method using the sample holder having a film including a first surface and a second surface. A liquid sample may be held on the first surface. The film is made of two or more layers. A primary beam irradiation device is installed in a reduced-pressure space. Consequently, the sample can be observed or inspected while maintaining the sample at the atmospheric pressure.

    摘要翻译： 使用具有包括第一表面和第二表面的膜的样品保持器的样品保持器，检查装置和检查方法。 液体样品可以保持在第一表面上。 该片由两层或多层制成。 主光束照射装置安装在减压空间中。 因此，可以在将样品保持在大气压力的同时观察或检查样品。

    PATTERN DEFECT INSPECTING APPARATUS AND METHOD
    73.
    发明申请
    PATTERN DEFECT INSPECTING APPARATUS AND METHOD 审中-公开
    图案缺陷检查装置及方法

    公开(公告)号：US20110221886A1

    公开(公告)日：2011-09-15

    申请号：US13059908

    申请日：2009-07-08

    申请人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

    发明人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

    IPC分类号： H04N7/18

    CPC分类号： G01N21/956 ,  G01N21/94 ,  H01L22/12

    摘要： In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.

    摘要翻译： 近年来，为了减少制造时间和减少因素的早期检测，需要减少半导体制造工序中的晶片检查时间。 为了满足这一要求，需要减少检查参数设置所需的时间以及检查所需的时间。 基于与运输系统2有关的速度或位置变化信息，通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像，也可以在运输系统2的加速/减速期间进行检查。 以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性，并且使得可以在短时间内确认是否存在缺陷。

    APPARATUS AND METHOD FOR INSPECTING AN OBJECT SURFACE DEFECT
    74.
    发明申请
    APPARATUS AND METHOD FOR INSPECTING AN OBJECT SURFACE DEFECT 审中-公开
    用于检查物体表面缺陷的装置和方法

    公开(公告)号：US20110141272A1

    公开(公告)日：2011-06-16

    申请号：US13059523

    申请日：2009-07-10

    申请人： Sachio Uto ,  Hidetoshi Nishiyama ,  Kei Shimura ,  Masaaki Ito

    发明人： Sachio Uto ,  Hidetoshi Nishiyama ,  Kei Shimura ,  Masaaki Ito

    IPC分类号： H04N7/18 ,  G01N21/956

    CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501

    摘要： Disclosed is an apparatus having a light source of a deep ultraviolet ray for detecting a small foreign matter or pattern defect, which may arise during a process for manufacturing a semiconductor device or the like, in high resolution. The apparatus comprises a means for detecting a damage on an optical system due to a wavelength reduction thereby to save a damaged portion, and a means for comparing an optical system arrangement with that at the manufacturing time and detecting the abnormality thereof, to thereby make a correction, so that the apparatus can inspect the defect on an object substrate stably at a high speed and in high sensitivity. Also disclosed is a method for the stable inspection. The apparatus is provided, in the optical path of the optical system, with a means for detecting the intensity and the convergent state of an illumination light, and a means for detecting the abnormality of the optics system and for saving an abnormal portion from alignment with an optical axis. The apparatus is constituted such that the optical system is adjusted to make corrections for the optical conditions at the manufacturing time, thereby to elongate the lifetime of the optical system in the inspecting apparatus and to detect the small defect stably.

    摘要翻译： 公开了一种具有用于检测在高分辨率的半导体器件等的制造工艺期间可能出现的小异物或图案缺陷的深紫外线光源的装置。 该装置包括用于检测由于波长减小而导致的光学系统的损坏从而节省损坏部分的装置，以及用于将光学系统布置与制造时间布置进行比较并检测其异常的装置，从而使 校正，使得设备可以高速和高灵敏度稳定地检查对象基板上的缺陷。 还公开了用于稳定检查的方法。 该装置在光学系统的光路中设置有用于检测照明光的强度和收敛状态的装置，以及用于检测光学系统的异常并且用于保存异常部分与对准的装置 光轴。 该装置被构造成使得光学系统被调整以对制造时的光学条件进行校正，从而延长了检查装置中的光学系统的寿命并且稳定地检测小缺陷。

    Sample inspection apparatus, sample inspection method and sample inspection system
    75.
    发明授权
    Sample inspection apparatus, sample inspection method and sample inspection system 有权
    样品检验仪器，样品检验方法和样品检测系统

    公开(公告)号：US07923700B2

    公开(公告)日：2011-04-12

    申请号：US11960267

    申请日：2007-12-19

    申请人： Hidetoshi Nishiyama

    发明人： Hidetoshi Nishiyama

    IPC分类号： H01J37/20

    CPC分类号： G01N23/2251 ,  H01J37/20 ,  H01J37/228 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/2608 ,  H01J2237/2808

    摘要： Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it with a primary beam (e.g., an electron beam or other charged-particle beam) via the film. The apparatus has the film, a vacuum chamber, primary beam irradiation column, signal detector, and a controller for controlling the operations of the beam irradiation column and signal detector. The sample is held on a first surface of the film opened to permit access to the film. The vacuum chamber reduces the pressure of the ambient in contact with a second surface of the film. The irradiation column irradiates the sample with the primary beam via the film from the second surface side. The detector detects a secondary signal produced from the sample in response to the irradiation.

    摘要翻译： 提供样品检查装置，样品检查方法和样品检查系统，其可以通过用初级束（例如电子束或其他带电粒子束）照射样品来检查样品时对保持在膜上的样品的刺激 ）通过电影。 该装置具有膜，真空室，主光束照射柱，信号检测器和用于控制光束照射柱和信号检测器的操作的控制器。 样品被保持在薄膜的第一表面上，以允许接近薄膜。 真空室减小与膜的第二表面接触的环境的压力。 照射列从第二表面侧通过膜从主光束照射样品。 检测器响应于照射而检测从样品产生的二次信号。

    Pattern defect inspection apparatus and method
    76.
    发明授权
    Pattern defect inspection apparatus and method 有权
    图案缺陷检查装置及方法

    公开(公告)号：US07746453B2

    公开(公告)日：2010-06-29

    申请号：US12113781

    申请日：2008-05-01

    申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

    发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

    摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

    摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

    Method And Apparatus For Reviewing Defects
    77.
    发明申请
    Method And Apparatus For Reviewing Defects 有权
    检查缺陷的方法和装置

    公开(公告)号：US20100019150A1

    公开(公告)日：2010-01-28

    申请号：US12573479

    申请日：2009-10-05

    申请人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    发明人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    IPC分类号： G01N23/00

    CPC分类号： G01N23/225 ,  G02B15/14 ,  G02B21/0016 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01K3/02

    摘要： A method of inspecting defects of a sample includes a first step for, on a basis of position information of defects on a sample placed on a movable table which is previously detected and obtained by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of defects re-detected of the first detection result, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. The method includes classifying types of defects on basis of the first detection result and the second detection result.

    摘要翻译： 检查样本缺陷的方法包括：第一步骤，基于放置在可移动台上的样本上的缺陷的位置信息，该样本预先由另一检查系统检测并获得，驱动所述台，使得缺陷到达 进入具有调整焦点的光学显微镜的观察区域，第二步骤，用于重新检测缺陷以获得第一检测结果;第三步骤，基于缺陷的位置信息来校正缺陷的位置信息 - 检测到第一检测结果，以及第四步骤，用于检查其位置信息被校正以获得第二检测结果的缺陷。 该方法包括基于第一检测结果和第二检测结果对缺陷的类型进行分类。

    Method and apparatus for reviewing defects
    78.
    发明授权
    Method and apparatus for reviewing defects 有权
    检查缺陷的方法和装置

    公开(公告)号：US07601954B2

    公开(公告)日：2009-10-13

    申请号：US11668510

    申请日：2007-01-30

    申请人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    发明人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    IPC分类号： G01N23/00

    CPC分类号： G01N23/225 ,  G02B15/14 ,  G02B21/0016 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01K3/02

    摘要： A method and an apparatus for reviewing defects detected by an optical particle inspection system or an optical profile inspection system in detail by an electron microscope are provided. In order to putting defects to be reviewed in the viewing field of the electron microscope and reducing the size of the apparatus, the electron microscope reviews defects detected by an optical defect inspection system. In the electron microscope, an optical microscope for reviewing detects is arranged, and when focusing of this optical microscope is carried out, the illumination position and the detection position of the optical microscope are not changed to the sample.

    摘要翻译： 提供了一种用于通过电子显微镜详细检查由光学粒子检查系统或光学轮廓检查系统检测到的缺陷的方法和装置。 为了在电子显微镜的观察区域中提供缺陷以及减小设备的尺寸，电子显微镜检查由光学缺陷检查系统检测到的缺陷。 在电子显微镜中，设置检查用光学显微镜，当进行该光学显微镜的聚焦时，光学显微镜的照明位置和检测位置不变为样品。