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    Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article
    71.
    发明授权
    Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article 有权
    包含光生酸化合物和包含其的光致抗蚀剂组合物，包含光致抗蚀剂的涂覆制品和制造制品的方法

    公开(公告)号：US09029065B2

    公开(公告)日：2015-05-12

    申请号：US13661553

    申请日：2012-10-26

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Cong Liu ,  Mingqi Li ,  Shintaro Yamada

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C07C381/12 ,  C07C309/06 ,  C07C309/04 ,  C07C303/32 ,  C07C309/12 ,  C07C309/17

    CPC classification number: C07C381/12 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

    Abstract: A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.

    Abstract translation: 具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述 ，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

    PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
    73.
    发明申请
    PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
    光电发生器，光电元件，涂覆基板和形成电子器件的方法

    公开(公告)号：US20150064620A1

    公开(公告)日：2015-03-05

    申请号：US14012577

    申请日：2013-08-28

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Irvinder Kaur ,  Emad Aqad ,  Cong Liu ,  Cheng Bai Xu

    IPC: C07D317/72 ,  G03F7/20 ,  G03F7/004

    CPC classification number: C07D317/72 ,  C07D319/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002

    Abstract: A photoacid generator compound has formula (1) wherein n is zero or 1; and R1-R6 are each independently hydrogen, halogen, or unsubstituted or substituted C1-20 linear or branched alkyl, C1-20 cycloalkyl, C6-20 aryl, C3-20 heteroaryl, or an acid-generating group having the structure *L-Z−M+] wherein L is an unsubstituted or substituted C1-50 divalent group; Z− is a monovalent anionic group; and M+ is an iodonium or sulfonium cation. Geminal R groups can combine to form a ring with the carbon to which they are attached, as long as no more than two such rings are formed. At least one of R1-R6 includes the acid-generating group or two germinal R groups combine to form the acid-generating group. Also described are a photoresist composition incorporating the photoacid generator compound, a coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using a layer of the photoresist composition.

    Abstract translation: 光酸产生剂化合物具有式（1），其中n为0或1; 和R 1 -R 6各自独立地为氢，卤素或未取代或取代的C 1-20直链或支链烷基，C 1-20环烷基，C 6-20芳基，C 3-20杂芳基或具有结构* LZ -M +]其中L是未取代或取代的C 1-50二价基团; Z-是一价阴离子基团; 而M +是碘鎓或锍阳离子。 只要不超过两个这样的环形成，Geminal R基团可以结合形成与它们所连接的碳的环。 R1-R6中的至少一个包括产酸基团或两个生发R基团结合形成产酸基团。 还描述了包含光致酸产生剂化合物的光致抗蚀剂组合物，包括光致抗蚀剂组合物层的涂布基材，以及使用光致抗蚀剂组合物层形成电子器件的方法。

    Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer
    75.
    发明授权
    Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer 有权
    环脂族单体，包含其的聚合物和包含该聚合物的光致抗蚀剂组合物

    公开(公告)号：US08790861B2

    公开(公告)日：2014-07-29

    申请号：US13723973

    申请日：2012-12-21

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Cong Liu ,  Mingqi Li ,  Cheng-Bai Xu

    IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  C07C69/54 ,  C08F20/68

    CPC classification number: G03F7/039 ,  C07C69/54 ,  C07C2601/08 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

    Abstract translation: 单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇 ，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。

    CYCLOALIPHATIC MONOMER, POLYMER COMPRISING THE SAME, AND PHOTORESIST COMPOSITION COMPRISING THE POLYMER
    76.
    发明申请
    CYCLOALIPHATIC MONOMER, POLYMER COMPRISING THE SAME, AND PHOTORESIST COMPOSITION COMPRISING THE POLYMER 审中-公开
    环己烷单体，包含该聚合物的聚合物和包含聚合物的光聚合组合物

    公开(公告)号：US20130171429A1

    公开(公告)日：2013-07-04

    申请号：US13711175

    申请日：2012-12-11

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Cong Liu ,  Mingqi Li ,  Cheng-Bai Xu

    IPC: C07C69/533 ,  G03F7/027

    CPC classification number: C07C69/533 ,  C07C69/54 ,  C07C2601/08 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/2041 ,  Y10T428/24802

    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

    Abstract translation: 单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇 ，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。

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