公开(公告)号：US20060276041A1

公开(公告)日：2006-12-07

申请号：US11433508

申请日：2006-05-15

申请人： Kazuhito Uchikura ,  Tomohisa Konno ,  Nobuo Kawahashi ,  Masayuki Hattori

发明人： Kazuhito Uchikura ,  Tomohisa Konno ,  Nobuo Kawahashi ,  Masayuki Hattori

IPC分类号： C09K13/00 ,  H01L21/461 ,  C03C15/00 ,  H01L21/302

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463

摘要： A chemical mechanical polishing aqueous dispersion, including: (A) inorganic particles; (B) at least one type of particles selected from the group consisting of organic particles and organic-inorganic composite particles; (C) at least one compound selected from the group consisting of quinolinecarboxylic acid, quinolinic acid, a divalent organic acid (excluding quinolinic acid), and a hydroxyl acid; (D) at least one compound selected from the group consisting of benzotriazole and benzotriazole derivatives; (E) an oxidizing agent; and (F) water, the chemical mechanical polishing aqueous dispersion containing the component (A) in an amount of 0.05 to 2.0 wt % and the component (B) in an amount of 0.005 to 1.5 wt %, having a ratio (WA/WB) of the amount (WA) of the component (A) to the amount (WB) of the component (B) of 0.1 to 200, and having a pH of 1.0 to 5.0.

摘要翻译： 化学机械抛光水分散体，包括：（A）无机颗粒; （B）选自有机颗粒和有机 - 无机复合颗粒的至少一种类型的颗粒; （C）至少一种选自喹啉羧酸，喹啉酸，二价有机酸（不包括喹啉酸）和羟基酸的化合物; （D）至少一种选自苯并三唑和苯并三唑衍生物的化合物; （E）氧化剂; 和（F）水，含有0.05〜2.0重量％的成分（A）的化学机械研磨用水系分散体和0.005〜1.5重量％的成分（B），其比例（W

公开(公告)号：US07145595B2

公开(公告)日：2006-12-05

申请号：US10399869

申请日：2002-08-28

申请人： Toshiki Yamane ,  Masayuki Hattori ,  Jun Nishijima ,  Osamu Iijima ,  Yoshinori Koizumi

发明人： Toshiki Yamane ,  Masayuki Hattori ,  Jun Nishijima ,  Osamu Iijima ,  Yoshinori Koizumi

IPC分类号： H04N7/18

CPC分类号： G01N21/89 ,  G06T7/0002 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30164

摘要： An image processing and inspection system includes a master device (10) having a video camera (40) and a first controller (20) responsible for processing and inspecting the image of an object (1) in accordance with inspection criteria. Intercommunicated (12) with the master device (10) is a personal computer (100) equipped with a second monitor (120), and a second input member (102,104). The motion-picture taken by the camera (40) for inspection on the side of the master device (10) is transmitted to the computer (100) so as to be displayed on the second monitor (120) as a real-time image of the object (1) for easy confirmation of the object on the side of the computer (100), thereby enabling to determine the inspection criteria on the side of the computer (100) while monitoring the real-time image of the object (1).

摘要翻译： 图像处理和检查系统包括具有摄像机（40）的主设备（10）和负责根据检查标准处理和检查对象（1）的图像的第一控制器（20）。 与主设备（10）的互通（12）是配备有第二监视器（120）的个人计算机（100）和第二输入构件（102,104）。 由摄像机（40）拍摄的用于在主装置（10）侧检查的运动图像被发送到计算机（100），以便在第二监视器（120）上显示为实时图像 所述物体（1）用于容易地确认所述计算机（100）侧的物体，由此能够在监视所述物体（1）的实时图像的同时，确定所述计算机（100）侧的检查标准， 。

公开(公告)号：US20060201914A1

公开(公告)日：2006-09-14

申请号：US11369870

申请日：2006-03-08

申请人： Kazuhito Uchikura ,  Masayuki Hattori ,  Nobuo Kawahashi

发明人： Kazuhito Uchikura ,  Masayuki Hattori ,  Nobuo Kawahashi

IPC分类号： C09K13/00 ,  C03C15/00 ,  B44C1/22

CPC分类号： H01L21/3212 ,  C09G1/02

摘要： A chemical mechanical polishing aqueous dispersion, including: (A) abrasives; (B) an organic acid; (C) benzotriazole or a benzotriazole derivative; (D) a poly(meth)acrylate; (E) an oxidizing agent; and (F) water, the abrasives (A) being included in the chemical mechanical polishing aqueous dispersion in an amount of 2 to 10 wt %.

摘要翻译： 化学机械抛光水性分散体，包括：（A）研磨剂; （B）有机酸; （C）苯并三唑或苯并三唑衍生物; （D）聚（甲基）丙烯酸酯; （E）氧化剂; 和（F）水，研磨剂（A）以2〜10重量％的量包含在化学机械研磨用水系分散体中。

公开(公告)号：US07055089B2

公开(公告)日：2006-05-30

申请号：US09876742

申请日：2001-06-07

申请人： Toshiyuki Miyauchi ,  Masayuki Hattori

发明人： Toshiyuki Miyauchi ,  Masayuki Hattori

IPC分类号： H03M13/03

CPC分类号： H04L1/006 ,  H03M13/4138 ,  H04L1/0054

摘要： A decoding system and method for providing relatively high likelihood of obtaining at least two paths of getting to each decoding state from at least three paths. The system and method also selects a maximum likelihood path from the two paths, where a log likelihood of getting to a state in the decoder is determined by a soft-input value encoded with a trellis so as to provide at least three paths for getting to the state.

摘要翻译： 一种解码系统和方法，用于从至少三个路径提供获得至少两个到达每个解码状态的路径的相对较高的可能性。 系统和方法还从两个路径中选择最大似然路径，其中达到解码器中的状态的对数似然性由格网编码的软输入值确定，以便提供至少三条路径以便达到 国家。

公开(公告)号：US07010051B2

公开(公告)日：2006-03-07

申请号：US09816272

申请日：2001-03-23

申请人： Jun Murayama ,  Masayuki Hattori ,  Toshiyuki Miyauchi ,  Kouhei Yamamoto ,  Takashi Yokokawa

发明人： Jun Murayama ,  Masayuki Hattori ,  Toshiyuki Miyauchi ,  Kouhei Yamamoto ,  Takashi Yokokawa

IPC分类号： H04L5/12

CPC分类号： H03M13/29 ,  H03M13/256 ,  H03M13/258 ,  H03M13/2972 ,  H03M13/3988

摘要： Error correction coding and decoding according to a serial concatenated modulation system are carried out under high code rate. A coding apparatus 1 comprises three convolutional coders 10, 30 and 50 for carrying out convolutional operation; two interleavers 20 and 40 for rearranging order of data input; and a multi-value mapping circuit 60 for carrying out mapping of a single point on the basis of a predetermined modulation system. The coding apparatus 1 carries out convolutional operation whose code rate is “⅔” as coding of extrinsic codes by a convolutional coder 10, and carries out convolutional operation whose code rate is “1” as coding of inner codes by a convolutional coder 50, and a multi-value modulation mapping circuit 60 applies mapping to a transmission symbol of a 8 PSK modulation system to output it as a single code transmission symbol.

摘要翻译： 根据串行级联调制方式的纠错编码和解码是以高码率进行的。 编码装置1包括用于进行卷积运算的三个卷积编码器10,30和50; 两个交织器20和40用于重新排列数据输入的顺序; 以及多值映射电路60，用于基于预定的调制系统执行单个点的映射。 编码装置1通过卷积编码器10进行码本为“2/3”的卷积运算，进行卷积编码器10的外部码的编码，并且通过卷积编码器50进行码率为“1”的卷积运算 ，并且多值调制映射电路60将映射应用于8PSK调制系统的发送符号，以将其作为单个码传输符号输出。

公开(公告)号：US20050284844A1

公开(公告)日：2005-12-29

申请号：US11165278

申请日：2005-06-24

申请人： Masayuki Hattori ,  Yuji Namie ,  Nobuo Kawahashi

发明人： Masayuki Hattori ,  Yuji Namie ,  Nobuo Kawahashi

IPC分类号： C03C15/00 ,  C09K13/00 ,  C11D7/06 ,  C11D7/22 ,  C11D7/32 ,  C11D7/34 ,  C11D11/00 ,  C23F1/00 ,  H01L21/02 ,  H01L21/306

CPC分类号： H01L21/02074 ,  C11D3/3765 ,  C11D3/3773 ,  C11D7/06 ,  C11D7/3209 ,  C11D11/0047

摘要： A cleaning composition for semiconductor components comprises a water-soluble polymer (a) having a specific molecular weight and a compound (b) represented by the following formula (1): NR4OH  (1) wherein each R is independently a hydrogen atom or an alkyl group of 1 to 6 carbon atoms. A process for manufacturing a semiconductor device comprises chemical mechanical polishing a semiconductor component, and cleaning the semiconductor component with the cleaning composition for semiconductor components. The cleaning composition exerts a high cleaning effect on impurities remaining on a polished surface of a semiconductor component after chemical mechanical polishing, and becomes little burden on the environment.

摘要翻译： 用于半导体组件的清洁组合物包括具有特定分子量的水溶性聚合物（a）和由下式（1）表示的化合物（b）：<？在线公式描述=“在线配方” end =“lead”→NR 4 OH（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中每个R独立地为氢原子 或1〜6个碳原子的烷基。 半导体器件的制造方法包括半导体部件的化学机械研磨，以及半导体部件用清洗组合物的半导体部件的清洗。 清洗组合物对化学机械抛光后残留在半导体组件的抛光表面上的杂质产生高清洁效果，并且对环境的负担很小。

公开(公告)号：US20050229085A1

公开(公告)日：2005-10-13

申请号：US10509475

申请日：2003-03-14

申请人： Marten Van Dijk ,  Kouhei Yamamoto ,  Masayuki Hattori

发明人： Marten Van Dijk ,  Kouhei Yamamoto ,  Masayuki Hattori

IPC分类号： G06F11/10 ,  G11B20/12 ,  G11B20/18 ,  H03M13/15 ,  H03M13/27 ,  H03M13/29 ,  H03M13/00

CPC分类号： H03M13/2906 ,  G11B20/1833

摘要： The present invention relates to a method of embedding an additional layer of error correction into an error correcting code, wherein information is encoded into code words of said code over a first Galois field and wherein a number of code words rare arranged in the columns of a code block comprising a user data sub-block and a parity data sub-block In order to provide an additional layer of error correction that can be easily implemented without losing compatibility improving the error correction capabilities, a method is proposed comprising the steps of:—encoding the rows of at least said user data sub-block separately or in groups using a horizontal error correcting code over a second Galois field larger than said first Galois field to obtain horizontal parities,—embedding said horizontal parities as additional layer in said error correcting code.

摘要翻译： 本发明涉及一种将错误校正的附加层嵌入到纠错码中的方法，其中信息通过第一伽罗瓦域编码成所述码的码字，并且其中少数排列在 代码块，其包括用户数据子块和奇偶校验数据子块为了提供可以容易地实现的附加的纠错层，而不失去改进纠错能力的兼容性，提出了一种方法，包括以下步骤： 在大于所述第一伽罗瓦域的第二伽罗瓦域上使用水平纠错码，分别地或以组分组编码至少所述用户数据子块的行以获得水平奇偶校验， - 将所述水平奇偶校验作为所述纠错中的附加层 码。

公开(公告)号：US06901548B2

公开(公告)日：2005-05-31

申请号：US09821008

申请日：2001-03-29

申请人： Masayuki Hattori ,  Jun Murayama ,  Toshiyuki Miyauchi ,  Kouhei Yamamoto ,  Takashi Yokokawa

发明人： Masayuki Hattori ,  Jun Murayama ,  Toshiyuki Miyauchi ,  Kouhei Yamamoto ,  Takashi Yokokawa

IPC分类号： G06F11/10 ,  H03M13/25 ,  H03M13/27 ,  H03M13/29 ,  H03M13/45 ,  H04L1/00 ,  H04L27/00 ,  H04L27/18 ,  H03M13/00

CPC分类号： H03M13/256 ,  H03M13/258 ,  H03M13/2972 ,  H03M13/3988

摘要： To carry out error correction coding and decoding according to a serially concatenated coded modulation system with a small circuit scale and high performance. A coding apparatus 1 is designed so that an interleaver 20 interleaves order of bits so that all weights are coded by a convolutional coder 30 with respect to data comprising a series of 3 bits supplied from a convolutional coder 10; the convolutional coder 30 makes as small as possible the total value of the hamming distance of input bit between passes to be the minimum Euclidean distance with respect to data of 3 bits supplied from the interleaver 20; and a multi-value modulation mapping circuit 40 causes the hamming distance of input bits in the convolutional coder 30 as the distance between signal point on the I/Q plane is smaller to subject data of 3 bits supplied from the convolutional coder 30 to mapping.

摘要翻译： 根据串行级联的编码调制系统，具有小电路规模和高性能，进行纠错编码和解码。 编码装置1被设计成使得交织器20交织比特的顺序，使得所有权重相对于包括从卷积编码器10提供的一系列3比特的数据由卷积编码器30编码; 卷积编码器30相对于从交织器20提供的3比特的数据，尽可能地使输入比特的汉明距离的总值为最小欧几里得距离; 并且多值调制映射电路40使卷积编码器30中的输入比特的汉明距离随着I / Q平面上的信号点之间的距离变小，从卷积编码器30提供的3比特数据映射。

公开(公告)号：US06684365B1

公开(公告)日：2004-01-27

申请号：US09393074

申请日：1999-09-07

申请人： Jun Murayama ,  Takashi Yokokawa ,  Masayuki Hattori

发明人： Jun Murayama ,  Takashi Yokokawa ,  Masayuki Hattori

IPC分类号： H03M1303

CPC分类号： H03M13/296 ,  H03M13/23 ,  H03M13/27 ,  H03M13/2746 ,  H03M13/2771 ,  H03M13/2957

摘要： Encoded data having a small code word weighting are not output. In a step S21, a sequence p[i] (0≦i

摘要翻译： 不输出具有小码字加权的编码数据。 在步骤S21中，在步骤S22中，将序列p [i]（0 <= i

公开(公告)号：US06559056B2

公开(公告)日：2003-05-06

申请号：US09858924

申请日：2001-05-17

申请人： Masayuki Hattori ,  Hitoshi Kishimoto ,  Nobuo Kawahashi

发明人： Masayuki Hattori ,  Hitoshi Kishimoto ,  Nobuo Kawahashi

IPC分类号： H01L21302

CPC分类号： H01L21/31053 ,  C09G1/02

摘要： The object of the present invention is to provide an aqueous dispersion for chemical mechanical polishing which can be polished working film for semiconductor devices and which is useful for STI. The aqueous dispersion for chemical mechanical polishing of the invention is characterized by comprising an inorganic abrasive such as silica, ceria and the like, and organic particles composed of a resin having anionic group such as carboxyl group into the molecular chains. The removal rate for silicon oxide film is at least 5 times, particularly 10 times the removal rate for silicon nitride film. The aqueous dispersion may also contain an anionic surfactant such as potassium dodecylbenzene sulfonate and the like. And a base may also be included in the aqueous dispersion for adjustment og the pH to further enhance the dispersability, removal rate and selectivity.