Abstract:
In a semiconductor device of the present invention, a protection diode for protecting a device is formed on an epitaxial layer formed on a substrate. A Schottky barrier metal layer is formed on a surface of the epitaxial layer and a P-type diffusion layer is formed at a lower portion of an end portion of the Schottky barrier metal layer. Then, P-type diffusion layers are formed in a floating state closer to a cathode region side than the P-type diffusion layer, and are capacitively coupled with a metal layer to which an anode potential is applied. This structure reduces a large change in a curvature of a depletion layer, thereby improving a withstand voltage characteristic of the protection diode.
Abstract:
In a semiconductor device of the present invention, a thin gate oxide film is formed on a P-type diffusion layer. On the gate oxide film, a gate electrode is formed. N-type diffusion layers are formed in the P-type diffusion layer, and the N-type diffusion layer is used as a drain region. The N-type diffusion layer is diffused in a γ shape at least below the gate electrode. With the structure described above, a diffusion region of the N-type diffusion layer expands and comes to be a low-concentration region in the vicinity of a surface of an epitaxial layer. Thus, it is possible to reduce an electric field from the gate electrode and an electric field between a source and a drain.
Abstract:
The present invention is relative to a disc cartridge in which an optical disc (3), an inner shell (4) and shutter members (5a), (5b) are housed in a main cartridge body unit (2), formed by abutting and combining upper and lower shells (6), (7), and in which the inner shell is run in rotation to cause the shutter members (5a), (5b) to open or close an aperture (24) provided in the main cartridge body unit (2). On an inner side of the peripheral wall sections of the upper and lower shells, abutted to each other, a crank-shaped dust intrusion prohibiting unit (21A) is provided for prohibiting intrusion of dust and dirt from the abutting surfaces of the peripheral wall sections of the upper and lower shells towards the optical disc housed in the main cartridge body unit to protect the optical disc housed in the main cartridge body unit. The inner shell provided in the main cartridge body unit includes an aperture (44) in register with an aperture in the main cartridge body unit, and includes a connecting portion (43a) bridging an open end side of the aperture. This connecting portion has a height not protruding towards the lower shell.
Abstract:
An optical information medium having an ink-accepting layer that may secure a high-gloss printed surface similar to print image quality of print image on photographic paper is provided. The optical disk is constituted by sequentially laminating concavo-convex information pits, a recording layer, a reflective layer, a protective layer, a second printing layer, and an ink-accepting layer on a transparent substrate made of synthetic resin such as polycarbonate. In the formation of the ink-accepting layer, the following proportions of the following constituents in percent by weight are milled to prepare an ink for printing: 5 to 15% urethane acrylate; 70 to 80% water-soluble monomer; 5 to 15% water-soluble monomer soluble resin; 5 to 15% photopolymerization initiator; 5 to 15% dyestuff fixing agent; and
Abstract:
An optical information medium having an ink-accepting layer that may secure a high-gloss printed surface similar to print image quality of print image on photographic paper is provided. The optical disk 1 is constituted by sequentially laminating concavo-convex information pits 3, a recording layer 4, a reflective layer 5, a protective layer 6, a second printing layer 7, and an ink-accepting layer 8 on a transparent substrate 2 made of synthetic resin such as polycarbonate. In the formation of the ink-accepting layer 8, the following proportions of the following constituents in percent by weight are milled to prepare an ink for printing: 5 to 15% urethane acrylate; 70 to 80% water-soluble monomer; 5 to 15% water-soluble monomer soluble resin; 5 to 15% photopolymerization initiator; 5 to 15% dyestuff fixing agent; and
Abstract:
A tape cartridge is configured to include a cartridge case, a hub, around which a magnetic tape is wound around and is housed in the cartridge case rotatably, and a drive apparatus for driving the hub to rotate, the drive apparatus being arranged between a bottom portion of the hub and the cartridge case.
Abstract:
In order to improve the characteristics of the high breakdown voltage MOS, a semiconductor device of the present invention is characterized in that an LDMOS transistor, which comprises a source region 4, a channel region 8, and a drain region 5, and a gate electrode 7 formed on the channel region 8, and a drift region formed between the channel region 8 and the drain region 5, wherein an N−-type low concentration layer 22 serving as the drift region is formed shallowly at least below the gate electrode 7 (first N−-type layer 22A) but formed deeply in a neighborhood of the drain region 5 (second N−-type layer 22B).
Abstract:
A withstand voltage against electrostatic discharge of a high voltage MOS transistor is improved. An N−-type drain layer is not formed under an N+-type drain layer, while a P+-type buried layer is formed in a region under the N+-type drain layer. A PN junction of high impurity concentration is formed between the N+-type drain layer and the P+-type buried layer. In other words, a region having low junction breakdown voltage is formed locally. The surge current flows through the PN junction into the silicon substrate before the N−-type drain layer below a gate electrode is thermally damaged. Hence, the ESD withstand voltage is improved.
Abstract:
A semiconductor device has a gate electrode formed on P type semiconductor substrate through a gate insulation film, a low concentration N− type drain region formed so as to be adjacent to the gate electrode, a high concentration N+ type drain region separated from the other end of said gate electrode and included in said low N− type drain region, and a middle concentration N type layer at a region spanning at least from said gate electrode to said high concentration N+ type drain region, and formed so that impurity concentration becomes low at a region near the gate electrode.
Abstract:
A transistor of a semiconductor device has an increased driving capacity. The semiconductor device has a first gate insulation film formed by a selective oxidation, a second gate insulation film formed by thermal oxidation and a gate electrode formed across the first and the second gate insulation films. The second gate insulation film is composed of a thicker gate insulation film and a thinner gate insulation film.