公开(公告)号：US20050053788A1

公开(公告)日：2005-03-10

申请号：US10823000

申请日：2004-04-13

申请人： Yasutaka Terashima ,  Yasuhiro Yoneda ,  Teruo Yamashita ,  Hideaki Koyanagi

发明人： Yasutaka Terashima ,  Yasuhiro Yoneda ,  Teruo Yamashita ,  Hideaki Koyanagi

IPC分类号： C03B11/08 ,  C03C3/068 ,  C03C3/095 ,  B32B9/04 ,  B29D11/00

CPC分类号： C03C3/068 ,  C03B11/08 ,  C03B2215/49 ,  C03B2215/69 ,  C03C3/095 ,  Y02P40/57 ,  Y10T428/31504

摘要： Theme To inhibit the lens aberration in an objective lens for recording and reproducing optical information, which is composed of a molded aspherical single lens, while attaining at the same time good lens productivity, and also to ensure excellent optical properties and to obtain a high production efficiency in a mold processing step and a press molding step conducted to manufacture the lens. Means for Solving the Problems An objective lens 1 is a lens wherein a convex aspherical surface is formed at the first surface and a numerical aperture NA satisfies the condition, NA≧0.8. It is preferable to have an aspherical surface also at the second surface. A molding material that was premolded to a prescribed shape and is in a heated and softened state is press molded by using a pair of upper and lower molds having opposing molding surfaces, a molding surface shape is transferred by using a spherical molding material with a radius r and pressing the molding material between a pair of upper and lower molds, and the paraxial curvature radius R of the convex aspherical surface satisfies the following relation r/R≦1.35. The objective lens optical system comprises an objective lens 1 and a cover glass (CG) 2.

摘要翻译： 主题为了抑制用于记录和再现光学信息的物镜中的透镜像差，其由模制的非球面单透镜组成，同时同时获得良好的透镜生产率，并且还确保优异的光学性能并获得高生产率 进行模具加工工序的效率和进行制造透镜的压制成型步骤。 解决问题的方案物镜1是在第一表面形成凸非球面并且数值孔径NA满足条件NA = 0.8的透镜。 优选在第二表面也具有非球面。 将预成型为规定形状并处于加热软化状态的成型材料通过使用具有相对成型面的一对上下模具进行加压成型，通过使用具有半径的球形成型材料转印成型面形状 并且在一对上模和下模之间挤压成型材料，并且凸非球面的近轴曲率半径R满足以下关系r / R <= 1.35。 物镜光学系统包括物镜1和盖玻璃（CG）2。

公开(公告)号：US06310135B1

公开(公告)日：2001-10-30

申请号：US08945277

申请日：1998-02-20

申请人： Akira Tanaka ,  Satoshi Tazaki ,  Yasuhiro Yoneda ,  Kishio Yokouchi

发明人： Akira Tanaka ,  Satoshi Tazaki ,  Yasuhiro Yoneda ,  Kishio Yokouchi

IPC分类号： C08L3900

CPC分类号： G03F7/0387 ,  C08G73/1025 ,  C08K5/3472 ,  H05K3/285 ,  C08L79/08

摘要： A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.

摘要翻译： 一种聚酰亚胺树脂组合物，其包含聚酰亚胺树脂（A）和至少一种选自1H-四唑，5,5'-双-1H-四唑及其衍生物的1H-四唑（B），并且具有优异的 对铜和铜合金的防锈效果。

公开(公告)号：US6160081A

公开(公告)日：2000-12-12

申请号：US183124

申请日：1998-10-30

申请人： Akira Tanaka ,  Kei Sakamoto ,  Kenichi Ito ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Yasuo Naganuma

发明人： Akira Tanaka ,  Kei Sakamoto ,  Kenichi Ito ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Yasuo Naganuma

IPC分类号： C08G73/10 ,  G03F7/037 ,  H05K1/00 ,  H05K1/03 ,  C08G69/26

CPC分类号： G03F7/037 ,  C08G73/1025 ,  H05K1/0346 ,  H05K3/4676

摘要： The invention relates to a photosensitive polyimide resin composition comprising (A) a polyamic acid having, in its main chain, repeating units formed from a polycondensation product of at least one tetracarboxylic acid or tetracarboxylic anhydride thereof with at least one diamine compound, and having actinic ray-sensitive functional groups at both terminals thereof; (B) a photosensitive auxiliary having a photopolymerizable functional group; (C) a photopolymerization initiator; and (D) a solvent, wherein 1 the polyamic acid is such that when the repeating unit represented by the formula (1) is defined as a unit molecular weight, a unit molecular weight per carboxyl group (unit molecular weight/COOH) falls within a range of from 200 to 300, and 2 the photosensitive resin composition permits the formation of a polyimide film having a residual stress of 40 MPa or lower and a coefficient of thermal expansion of 30 ppm/.degree. C. or lower on a substrate, and to said polyamic acid, a polyimide film having excellent film properties, and a pattern forming process using the photosensitive polyimide resin composition.

摘要翻译： 本发明涉及一种感光性聚酰亚胺树脂组合物，其包含（A）在其主链中具有由至少一种四羧酸或其四羧酸酐与至少一种二胺化合物的缩聚产物形成的并具有光化性的重复单元的聚酰胺酸 两端的光敏功能基团; （B）具有可光聚合官能团的光敏助剂; （C）光聚合引发剂; 和（D）溶剂，其中+ E，crc 1 + EE聚酰胺酸使得当由式（1）表示的重复单元定义为单位分子量时，每个羧基的单位分子量（单位分子量 重量/ COOH）在200〜300的范围内，并且+ E，crc 2 + EE，感光性树脂组合物能够形成残留应力为40MPa以下，聚酰亚胺膜的热膨胀系数为30 ppm /℃以下，以及所述聚酰胺酸，具有优异膜特性的聚酰亚胺膜和使用感光性聚酰亚胺树脂组合物的图案形成方法。

公开(公告)号：US5804354A

公开(公告)日：1998-09-08

申请号：US876794

申请日：1997-06-16

申请人： Keiji Watanabe ,  Yasuhiro Yoneda ,  Takashi Maruyama ,  Keiko Yano ,  Tomio Nakamura ,  Shigeru Shimizu ,  Takashi Saitoh ,  Takahisa Namiki ,  Ei Yano ,  Miwa Igarashi ,  Yoko Kuramitsu

发明人： Keiji Watanabe ,  Yasuhiro Yoneda ,  Takashi Maruyama ,  Keiko Yano ,  Tomio Nakamura ,  Shigeru Shimizu ,  Takashi Saitoh ,  Takahisa Namiki ,  Ei Yano ,  Miwa Igarashi ,  Yoko Kuramitsu

IPC分类号： C08G73/02 ,  H01B1/12 ,  G03C5/00

CPC分类号： H01B1/128 ,  C08G73/0266 ,  Y10S430/143

摘要： A composition for forming a conductivity imparting agent comprising: (a) 0.1 to 20 parts by weight of sulfonated polyaniline having a content of a sulfonic acid group of 20 to 80% with respect to an aromatic ring of the sulfonated polyaniline; (b) 100 parts by weight of a solvent; (c) 0.01 to 10 parts by weight of an amine and/or quaternary ammonium salt; and (d) 0.001 to 100 parts by weight of at least one kind of a sulfonic acid group-containing component selected from the following (A) and (B); (A) compounds having a sulfonic acid group; and (B) polymers having a sulfonic acid group.

摘要翻译： 一种用于形成导电性赋予剂的组合物，其包含：（a）相对于所述磺化聚苯胺的芳环，为0.1〜20重量份磺酸基含量为20〜80％的磺化聚苯胺; （b）100重量份溶剂; （c）0.01至10重量份的胺和/或季铵盐; 和（d）0.001至100重量份选自以下（A）和（B）的至少一种含磺酸基的组分; （A）具有磺酸基的化合物; 和（B）具有磺酸基的聚合物。

公开(公告)号：US5783359A

公开(公告)日：1998-07-21

申请号：US848521

申请日：1997-04-28

申请人： Shigeru Tomisawa ,  Yasuhiro Yoneda ,  Masahiko Sugimura

发明人： Shigeru Tomisawa ,  Yasuhiro Yoneda ,  Masahiko Sugimura

IPC分类号： G03F7/012 ,  G03F7/004 ,  H01L21/027 ,  G03C1/695

CPC分类号： G03F7/0048 ,  G03F7/012

摘要： This invention relates to a rubber photoresist composite which can be applied evenly on a large-sized or square-shaped baseboard and a method for producing a circuit board using thereof. A rubber photoresist composite of this invention comprises a photosensitive agent, a cyclized rubber and a solvent, said solvent including a solvent component having a boiling point ranging from 150.degree. C. to 220.degree. C. The rubber photoresist composite can be applied evenly on the baseboard rotated at a high speed by a spinner.

摘要翻译： 本发明涉及可以均匀地涂敷在大型或正方形基板上的橡胶光致抗蚀剂复合体及其制造方法。 本发明的橡胶光致抗蚀剂复合材料包括感光剂，环化橡胶和溶剂，所述溶剂包括沸点范围为150-220℃的溶剂组分。橡胶光致抗蚀剂复合材料可以均匀地涂在 底座用旋转器高速旋转。

公开(公告)号：US5777068A

公开(公告)日：1998-07-07

申请号：US527057

申请日：1995-09-12

申请人： Akira Tanaka ,  Satoshi Tazaki ,  Kei Sakamoto ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Daisuke Mizutani ,  Yoshikatsu Ishizuki

发明人： Akira Tanaka ,  Satoshi Tazaki ,  Kei Sakamoto ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Daisuke Mizutani ,  Yoshikatsu Ishizuki

IPC分类号： G03F7/037 ,  C08G73/10 ,  C08G69/26

CPC分类号： G03F7/037

摘要： Provided are photosensitive resin compositions comprising a polyamic compound having, at each terminal thereof, a specific actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group and a solvent. The photosensitive resin compositions of the invention are excellent in resist properties such as sensitivity and good in storage stability and can provide a film small in residual stress.

摘要翻译： 提供了含有聚酰胺化合物的光敏树脂组合物，其每个末端具有具有可光聚合碳 - 碳双键的取代基的特定光化射线敏感性官能团，具有光聚合官能团的光敏助剂和溶剂。 本发明的感光性树脂组合物的抗敏性优异，例如灵敏度好，保存稳定性好，能够提供残留应力小的膜。

公开(公告)号：US4863833A

公开(公告)日：1989-09-05

申请号：US027089

申请日：1987-03-16

申请人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii

发明人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii

IPC分类号： G03F7/004 ,  G03F7/075

CPC分类号： G03F7/0757 ,  Y10S438/948

摘要： A high-energy radiation-sensitive pattern-forming resist material consisting of polysilsesquioxane having no hydroxyl group in its molecule. The pattern-forming material of this invention has an improved sensitivity to high-energy radiation exposure, a high resistance to dry etching, a high resolution capability, and an improved thermal stability.

公开(公告)号：US4345020A

公开(公告)日：1982-08-17

申请号：US212609

申请日：1980-12-03

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： G03F7/004 ,  C08F20/00 ,  C08F20/02 ,  C08F20/26 ,  C08F220/00 ,  C08F220/04 ,  C08F220/10 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid having from 3 to 12 carbon atoms and from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b), ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1. The polymer composition is preferably in the form of either a copolymer having the units (a), (b) and (c), or a polymer blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.

摘要翻译： 一种可交联正性电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，包括：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）.COOR，其中R是 具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自具有3至12个碳原子和1至3个羧基的单烯属不饱和羧酸的单元，和（c）衍生自甲基丙烯酸 酰氯。

公开(公告)号：US4276365A

公开(公告)日：1981-06-30

申请号：US061291

申请日：1979-07-02

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： G03F7/039 ,  G03C1/68

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： PCT No. PCT/JP78/00022 Sec. 371 Date July 7, 1979 Sec. 102(e) Date July 2, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00284 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray- resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid from 3 to 12 carbon atoms and having from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b) ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1.

摘要翻译： PCT No.PCT / JP78 / 00022 Sec。 371日期1979年7月7日 102（e）日期1979年7月2日PCT申请日1978年11月6日PCT公布。 出版物WO79 / 00284 日期：1979年5月31日一种可交联正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自3至12个碳原子并具有1至3个羧基的单烯属不饱和羧酸的单元和（c ）单元衍生自甲基丙烯酰氯。

公开(公告)号：US4273856A

公开(公告)日：1981-06-16

申请号：US112309

申请日：1979-07-02

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： C08F220/00 ,  C08F20/52 ,  C08F220/04 ,  C08F220/10 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： PCT No. PCT/JP78/00021 Sec. 371 Date July 2, 1979 Sec. 102(e) Date July 7, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00283 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition comprising, in polymerized form,(a) from about 70 to about 99% by mole of units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3). COORwhere R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, a benzyl group or a cyclohexyl group,(b) from about 1 to about 20% by mole of units derived from methacrylamide, and(c) from about 0.05 to about 20% by mole of units derived from methacrylic acid chloride;each amount of the units (a), (b) and (c) being based on the total moles of the units (a), (b) and (c). The polymer composition is preferably in the form of either a copolymer comprised of the units (a), (b) and (c), or a blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.

摘要翻译： PCT No.PCT / JP78 / 00021 Sec。 371日期1979年7月2日 102（e）日期1979年7月7日PCT提交1978年11月6日PCT公布。 出版物WO79 / 00283 日期：1979年5月31日一种可交联的正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含聚合形式的（a）约70-约99摩尔％的衍生自 式：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）约1至约20摩尔％来自甲基丙烯酰胺的单元，和（c）约0.05 至约20摩尔％的衍生自甲基丙烯酰氯的单元; 单位（a），（b）和（c）的单位为单位（a），（b）和（c）的总摩尔数。 聚合物组合物优选为由单元（a），（b）和（c）组成的共聚物的形式，或由单元（b）和单元（a）的一部分组成的共聚物的共混物， 和由单元（c）和单元（a）的其余部分组成的共聚物。 抗蚀剂聚合物组合物具有增强的灵敏度以及良好的耐热性，对比度和分辨率。