公开(公告)号：US06927403B2

公开(公告)日：2005-08-09

申请号：US10216547

申请日：2002-08-09

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Wilhelm Egle ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Wilhelm Egle ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

IPC分类号： G02B5/08 ,  G02B5/10 ,  G02B17/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  G01N21/64

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70275

摘要： There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.

摘要翻译： 提供了波长<= 193nm的照明系统。 照明系统包括物平面，与物平面共轭的平面，物平面和共轭平面之间的第一集电体，以及共轭平面之后的第二集电体。 第一个收集器将来自物平面的光束束聚焦在共轭平面中。 第一和第二收集器中的至少一个包括镜壳。 射线以相对于镜壳的表面切线小于20°的入射角撞击镜壳。

公开(公告)号：US20050088760A1

公开(公告)日：2005-04-28

申请号：US10919583

申请日：2004-08-17

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC分类号： G02B17/06 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G02B17/00

CPC分类号： B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US20050083503A1

公开(公告)日：2005-04-21

申请号：US10921447

申请日：2004-08-19

申请人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jorg Schultz

发明人： Martin Antoni ,  Isabel Escudero-Sanz ,  Wolfgang Singer ,  Johannes Wangler ,  Jorg Schultz

IPC分类号： G02B13/18 ,  G02B13/24 ,  G02B17/00 ,  G02B17/06 ,  G02B19/00 ,  G02B27/00 ,  G02B27/09 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G02B5/32

CPC分类号： G02B27/0983 ,  G02B17/0621 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70233 ,  Y10S359/90

摘要： There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light path from an object plane to an image plane, andan arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.

摘要翻译： 提供了用于照明系统的多镜系统，特别是对于波长<= 193nm的光刻。 该系统包括沿着从物平面到像平面的光路行进的光线，以及图像平面中的弧形场，由此在弧形场的中间的径向方向限定了扫描方向。 第一反射镜和第二反射镜被布置在具有这样的位置的光路中，使得像面中的弧形场的边缘锐度在扫描方向上小于5mm。 此外，相对于第一和第二反射镜的表面法线，光线入射在第一反射镜和第二反射镜上，入射角<= 30°或> = 60°。

公开(公告)号：US07329886B2

公开(公告)日：2008-02-12

申请号：US10755846

申请日：2004-01-12

申请人： Wolfgang Singer ,  Martin Antoni ,  Nils Dieckmann ,  Dirk Rothweiler ,  Jörg Schultz

发明人： Wolfgang Singer ,  Martin Antoni ,  Nils Dieckmann ,  Dirk Rothweiler ,  Jörg Schultz

IPC分类号： G21K5/04

CPC分类号： G21K5/04 ,  B82Y10/00 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00

摘要： There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.

摘要翻译： 提供照明系统。 照明系统包括第一光源和第二光源，每个光源用于提供波长<= 193nm的光和光学元件。 第一光源照亮光学元件的第一区域，第二光源照亮光学元件的第二区域。

公开(公告)号：US09155728B2

公开(公告)日：2015-10-13

申请号：US12875220

申请日：2010-09-03

申请人： Wolfgang Singer

发明人： Wolfgang Singer

IPC分类号： A61K31/44

CPC分类号： A61K31/505 ,  A61K31/197 ,  A61K31/44 ,  A61K31/4425 ,  A61K2300/00

摘要： This document provides methods and materials related to treating orthostatic hypotension and/or postural tachycardia syndrome. For example, methods and materials for using a composition containing 3,4-diaminopyridine, 4-aminopyridine, or both to treat patients with orthostatic hypotension, postural tachycardia syndrome, or both orthostatic hypotension and postural tachycardia syndrome are provided.

摘要翻译： 本文件提供与治疗直立性低血压和/或姿势性心动过速综合征相关的方法和材料。 例如，提供了使用含有3,4-二氨基吡啶，4-氨基吡啶或两者的组合物来治疗患有直立性低血压，姿势性心动过速综合征或两者的直立性低血压和姿势性心动过速综合征的方法和材料。

公开(公告)号：US08687289B2

公开(公告)日：2014-04-01

申请号：US13312196

申请日：2011-12-06

申请人： Hans-Juergen Mann ,  Wolfgang Singer

发明人： Hans-Juergen Mann ,  Wolfgang Singer

IPC分类号： G02B17/02

摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

公开(公告)号：US08605257B2

公开(公告)日：2013-12-10

申请号：US11628356

申请日：2005-06-03

申请人： Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer ,  Guenter Scheible ,  Sigrid Scheible

发明人： Patrick Scheible ,  Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer

IPC分类号： G03B27/72 ,  G03B27/68

CPC分类号： G02B13/02 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70308

摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.

摘要翻译： 在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖 系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布 与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

公开(公告)号：US20110063596A1

公开(公告)日：2011-03-17

申请号：US12949985

申请日：2010-11-19

申请人： Hans-Juergen Mann ,  Wolfgang Singer

发明人： Hans-Juergen Mann ,  Wolfgang Singer

IPC分类号： G03B27/54

CPC分类号： G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

摘要翻译： 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

公开(公告)号：US20110053989A1

公开(公告)日：2011-03-03

申请号：US12875220

申请日：2010-09-03

申请人： Wolfgang Singer

发明人： Wolfgang Singer

IPC分类号： A61K31/44

CPC分类号： A61K31/505 ,  A61K31/197 ,  A61K31/44 ,  A61K31/4425 ,  A61K2300/00

摘要： This document provides methods and materials related to treating orthostatic hypotension and/or postural tachycardia syndrome. For example, methods and materials for using a composition containing 3,4-diaminopyridine, 4-aminopyridine, or both to treat patients with orthostatic hypotension, postural tachycardia syndrome, or both orthostatic hypotension and postural tachycardia syndrome are provided.

摘要翻译： 本文件提供与治疗直立性低血压和/或姿势性心动过速综合征相关的方法和材料。 例如，提供了使用含有3,4-二氨基吡啶，4-氨基吡啶或两者的组合物来治疗患有直立性低血压，姿势性心动过速综合征或两者的直立性低血压和姿势性心动过速综合征的方法和材料。

公开(公告)号：US20100265478A1

公开(公告)日：2010-10-21

申请号：US12825001

申请日：2010-06-28

申请人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Bärbel Schwaer ,  Olaf Rogalsky ,  Arif Kazi

发明人： Helmut Beierl ,  Sascha Bleidistel ,  Wolfgang Singer ,  Toralf Gruner ,  Alexander Epple ,  Norbert Wabra ,  Susanne Beder ,  Jochen Weber ,  Heiko Feldmann ,  Bärbel Schwaer ,  Olaf Rogalsky ,  Arif Kazi

IPC分类号： G03B27/68

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。