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101 条记录 (耗时 0.034 秒)

    CMOS image device with polysilicon contact studs
    72.
    发明授权
    CMOS image device with polysilicon contact studs 失效
    具有多晶硅触点螺柱的CMOS图像装置

    公开(公告)号：US07378693B2

    公开(公告)日：2008-05-27

    申请号：US11055676

    申请日：2005-02-10

    申请人： Young-Hoon Park

    发明人： Young-Hoon Park

    IPC分类号： H01L31/062 ,  H01L31/113

    CPC分类号： H01L27/1462 ,  H01L27/14636

    摘要： A CMOS image device comprises a pixel array region including a photo diode region, a floating diffusion region, and at least one MOS transistor having a gate and a junction region, a CMOS logic region disposed around the pixel array region, the CMOS logic region including a plurality of nMOS transistors and pMOS transistors, and contact studs formed on the floating diffusion region and the junction region in the pixel array region, the contact studs comprising impurity-doped polysilicon layers.

    摘要翻译： CMOS图像装置包括像素阵列区域，包括光电二极管区域，浮动扩散区域和至少一个具有栅极和结区域的MOS晶体管，设置在像素阵列区域周围的CMOS逻辑区域，CMOS逻辑区域包括 多个nMOS晶体管和pMOS晶体管，以及形成在浮动扩散区域和像素阵列区域中的接合区域的接触柱，触头柱包括杂质掺杂多晶硅层。

    Microorganism producing 5'-xanthylic acid
    74.
    发明申请
    Microorganism producing 5'-xanthylic acid 有权
    微生物产生5'-戊酸

    公开(公告)号：US20060094084A1

    公开(公告)日：2006-05-04

    申请号：US10531971

    申请日：2003-12-10

    申请人： Young-Hyeon Kwag ,  Ki-Hoon Oh ,  Jeong-Hwan Kim ,  Yoon-Suk Oh ,  Jae-Ick Sim ,  Young-Hoon Park ,  Jea-Young Chang

    发明人： Young-Hyeon Kwag ,  Ki-Hoon Oh ,  Jeong-Hwan Kim ,  Yoon-Suk Oh ,  Jae-Ick Sim ,  Young-Hoon Park ,  Jea-Young Chang

    IPC分类号： C12P19/28 ,  C12N1/21

    CPC分类号： C12P17/182 ,  C12R1/15

    摘要： The invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 producing 5′-xanthylic acid. More specifically, the invention relates to Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 which is a mutant strain of Corynebacterium ammoniagenes KCCM 10340 having a resistance to osmotic pressure. In order to obtain mutant strain having enhanced respiratory activity, the present invention adopted Corynebacterium ammoniagenes KCCM 10340 as parent strain and treated it with UV radiation and mutation derivatives such as N-methyl-N′-nitro-n-nitrosoguanidine (NTG) according to ordinary procedure. Therefore, Corynebacterium ammoniagenes CJXSP 0201 KCCM 10448 of the present invention makes it possible to overcome growth-standing phase rapidly on early culture and for same period of fermentation, can accumulate 5′-xanthylic acid in culture medium at a high yield and concentration rate.

    摘要翻译： 本发明涉及产生5'-戊酸的产氨棒杆菌CJXSP 0201 KCCM 10448。 更具体地，本发明涉及具有抗渗透压的耐氨基酸棒杆菌KCCM 10340的突变菌株的产氨棒杆菌CJXSP 0201 KCCM 10448。 为了获得具有增强的呼吸活性的突变菌株，本发明使用产氨杆菌KCCM 10340作为亲本菌株，并用UV辐射和N-甲基-N'-硝基-N-亚硝基胍（NTG）等突变衍生物按照 普通程序。 因此，本发明的产氨酸棒杆菌CJXSP 0201 KCCM 10448可以在早期培养中快速克服生长稳定期，并且在相同的发酵期内，可以以高产率和浓度的速率在培养基中积累5'-叶酸。

    CMOS image device with polysilicon contact studs
    76.
    发明申请
    CMOS image device with polysilicon contact studs 失效
    具有多晶硅触点螺柱的CMOS图像装置

    公开(公告)号：US20050199922A1

    公开(公告)日：2005-09-15

    申请号：US11055676

    申请日：2005-02-10

    申请人： Young-Hoon Park

    发明人： Young-Hoon Park

    IPC分类号： H01L27/146 ,  H01L31/062 ,  H01L31/10

    CPC分类号： H01L27/1462 ,  H01L27/14636

    摘要： A CMOS image device comprises a pixel array region including a photo diode region, a floating diffusion region, and at least one MOS transistor having a gate and a junction region, a CMOS logic region disposed around the pixel array region, the CMOS logic region including a plurality of nMOS transistors and pMOS transistors, and contact studs formed on the floating diffusion region and the junction region in the pixel array region, the contact studs comprising impurity-doped polysilicon layers.

    摘要翻译： CMOS图像装置包括像素阵列区域，包括光电二极管区域，浮动扩散区域和至少一个具有栅极和结区域的MOS晶体管，设置在像素阵列区域周围的CMOS逻辑区域，CMOS逻辑区域包括 多个nMOS晶体管和pMOS晶体管，以及形成在浮动扩散区域和像素阵列区域中的接合区域的接触柱，触头柱包括杂质掺杂多晶硅层。

    Quaternary ammonium salt for photo-curable antifogging composition, method for preparing the same, and photo-curable antifogging composition
    77.
    发明授权
    Quaternary ammonium salt for photo-curable antifogging composition, method for preparing the same, and photo-curable antifogging composition 失效
    用于光固化防雾组合物的季铵盐，其制备方法和光固化防雾组合物

    公开(公告)号：US6096925A

    公开(公告)日：2000-08-01

    申请号：US88784

    申请日：1998-06-01

    申请人： Haeng-Woo Lee ,  Young-Hoon Park ,  Sang-Keun Kim ,  Eun-A Shin

    发明人： Haeng-Woo Lee ,  Young-Hoon Park ,  Sang-Keun Kim ,  Eun-A Shin

    IPC分类号： C07C213/06 ,  C03C17/32 ,  C07C217/28 ,  C08F2/50 ,  C08F20/36 ,  C09K3/18 ,  C07C233/00

    CPC分类号： C03C17/32 ,  C07C217/28 ,  C09K3/18 ,  Y02P20/55

    摘要： Disclosed is a photo-curable antifogging composition which may be applied to substrates such as glass, various plastic materials and the like to give antifogging property on the surface of these substrates. The main ingredient of the composition is a quaternary ammonium salt of the following formula (1): wherein:R.sup.1 is CH.sub.3 (CH.sub.2).sub.n CH.sub.2 or CH.sub.3 (CH.sub.2).sub.n CH.sub.2 C.sub.6 H.sub.4 wherein n is an integer from 1 to 16 inclusive;R.sup.2 and R.sup.3 are the same or different from each other, and represent CH.sub.2 .dbd.C(CH.sub.3)COOCH.sub.2 CH(OH)CH.sub.2, CH.sub.2 .dbd.CHCOOCH.sub.2 CH(OH)CH.sub.2 or H, with the proviso that R.sup.2 and R.sup.3 may not be H at the same time;R.sup.4 is H, CH.sub.3, CH.sub.3 CH.sub.2 or CH.sub.3 CH.sub.2 CH.sub.2 ; andX is CH.sub.3 OSO.sub.3, CH.sub.3 CH.sub.2 OSO.sub.3, CH.sub.3 COO, CF.sub.3 COO, CH.sub.3 (CH.sub.2).sub.n COO wherein n is an integer from 1 to 16 inclusive, CH.sub.3 (CH.sub.2).sub.7 CH.dbd.CH(CH.sub.2).sub.7 COO, C.sub.6 H.sub.5 COO, C.sub.6 H.sub.5 CH(OH)COO, HOOCCH.sub.2 CH(OH)COO, Cl or Br.

    摘要翻译： 公开了可应用于诸如玻璃，各种塑料材料等的基材的光固化防雾组合物，以在这些基材的表面上具有防雾性。 组合物的主要成分是下式（1）的季铵盐：其中：R 1是CH 3（CH 2）n CH 2或CH 3（CH 2）n CH 2 C 6 H 4，其中n是1至16的整数; R2和R3彼此相同或不同，并且表示CH2 = C（CH3）COOCH2CH（OH）CH2，CH2 = CHCOOCH2CH（OH）CH2或H，条件是R2和R3可以不相同 时间; R4是H，CH3，CH3CH2或CH3CH2CH2; （CH 2）7 CH = CH（CH 2）7 COO，C 6 H 5 COO，C 6 H 5 CH（OH）COO，HOOCCH 2 CH（OH），（CH 2）n COO， ）COO，Cl或Br。