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    Photoresist composition with high etching resistance
    5.
    发明申请
    Photoresist composition with high etching resistance 审中-公开
    具有高抗蚀性的光刻胶组合物

    公开(公告)号：US20100239982A1

    公开(公告)日：2010-09-23

    申请号：US12801146

    申请日：2010-05-25

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397

    摘要： A resist composition includes a first polymer including a repeating unit having the following Chemical Formula 1 and a repeating unit having the following Chemical Formula 2, a second polymer including a repeating unit having the following Chemical Formula 3, a repeating unit having the following Chemical Formula 4, and a repeating unit having the following Chemical Formula 5, a photoacid generator, and a solvent.

    摘要翻译： 抗蚀剂组合物包括包含具有以下化学式1的重复单元和具有以下化学式2的重复单元的第一聚合物，包含具有以下化学式3的重复单元的第二聚合物，具有以下化学式的重复单元 4和具有以下化学式5的重复单元，光酸产生剂和溶剂。

    Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods
    6.
    发明申请
    Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods 审中-公开
    具有α-羟基，光敏聚合物，抗蚀剂组合物和相关方法的芳族（甲基）丙烯酸酯化合物

    公开(公告)号：US20090155719A1

    公开(公告)日：2009-06-18

    申请号：US12314880

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  C07C69/54 ,  G03F7/20 ,  C08F24/00

    CPC分类号： C07C69/54 ,  C07C2603/24 ,  G03F7/0397

    摘要： An aromatic (meth)acrylate compound having an α-hydroxy, the aromatic (meth)acrylate compound being represented by the following Formula 1: In Formula 1, R1 is hydrogen or a methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR, R and R′ are independently hydrogen or an alkyl, and X is an integer ranging from 1 to 6.

    摘要翻译： 具有α-羟基的芳族（甲基）丙烯酸酯化合物，芳族（甲基）丙烯酸酯化合物由下式1表示：在式1中，R 1是氢或甲基，R 2是氢，取代或未取代的烷基或 取代或未取代的芳基，AR是取代或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到AR的芳香环上，R和R'独立地是氢 或烷基，X为1〜6的整数。

    Photosensitive polymer, resist composition, and associated methods
    7.
    发明授权
    Photosensitive polymer, resist composition, and associated methods 有权
    光敏聚合物，抗蚀剂组合物和相关方法

    公开(公告)号：US08017301B2

    公开(公告)日：2011-09-13

    申请号：US12314888

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F24/00 ,  Y10S430/106 ,  Y10S430/111

    摘要： A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

    摘要翻译： 光敏聚合物，其包含由式1至3表示的重复单元：其中R1和R3独立地为氢或甲基，R2为C4至C20酸不稳定基团，R4为内酯衍生基团，AR为取代基 或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到芳族环，AR，l，m和n均为正整数，l /（1 + m + n ）为约0.1至约0.5，m /（1 + m + n）为约0.3至约0.5，并且n /（1 + m + n）为约0.1至0.4。

    L-ORNITHINE OR L-ARGININE PRODUCING STRAIN AND METHOD FOR PRODUCING L-ORNITHINE OR L-ARGININE
    8.
    发明申请
    L-ORNITHINE OR L-ARGININE PRODUCING STRAIN AND METHOD FOR PRODUCING L-ORNITHINE OR L-ARGININE 有权
    生产L-赖氨酸或L-阿奇霉素的方法和生产L-赖氨酸或L-阿魏酸的方法

    公开(公告)号：US20130023016A1

    公开(公告)日：2013-01-24

    申请号：US13512956

    申请日：2010-12-29

    申请人： Jin-Man Cho ,  Hye-Won Kim ,  Ji-Hye Lee ,  Jae-Yong Cho

    发明人： Jin-Man Cho ,  Hye-Won Kim ,  Ji-Hye Lee ,  Jae-Yong Cho

    IPC分类号： C12N9/10 ,  C12P13/10 ,  C12N1/21 ,  C12N15/54 ,  C12N15/77

    CPC分类号： C12P13/10 ,  C12N9/1029 ,  C12N9/80 ,  C12Y203/01001 ,  C12Y305/01016

    摘要： The present invention relates to a polynucleotide that is active to an acetyl glutamate synthase and acetyl ornithinase which are associated with ornithine or arginine biosynthesis from Corynebacterium glutamicum. The present invention also relates to a polypeptide encoded by said polynucleotide, a recombinant vector comprising said polynucleotide, to a transformant obtained by introducing said recombinant vector to a host microorganism for producing L-ornithine or L-arginine, and transforming the recombinant vector, and to a method for producing L-ornithine or L-arginine by culturing said transformant. The activity of the transformant of the present invention to an acetyl glutamate synthase and acetyl ornithinase is increased as compared to an intrinsic activity, and thus L-ornithine or L-arginine can be produced, at a high yield rate, from the transformant of the present invention.

    摘要翻译： 本发明涉及与谷氨酸棒杆菌的鸟氨酸或精氨酸生物合成相关的乙酰谷氨酸合成酶和乙酰鸟氨酸酶有活性的多核苷酸。 本发明还涉及由所述多核苷酸编码的多肽，包含所述多核苷酸的重组载体，通过将所述重组载体导入宿主微生物以产生L-鸟氨酸或L-精氨酸而获得的转化体，并转化重组载体，以及 涉及通过培养所述转化体生产L-鸟氨酸或L-精氨酸的方法。 与内在活性相比，本发明的转化体对乙酰谷氨酸合成酶和乙酰鸟氨酸酶的活性增加，因此L-鸟氨酸或L-精氨酸可以高产率从 本发明。

    Photosensitive polymer, resist composition, and associated methods
    10.
    发明申请
    Photosensitive polymer, resist composition, and associated methods 有权
    光敏聚合物，抗蚀剂组合物和相关方法

    公开(公告)号：US20090155720A1

    公开(公告)日：2009-06-18

    申请号：US12314888

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  C08F24/00 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  C08F24/00 ,  Y10S430/106 ,  Y10S430/111

    摘要： A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, 1/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

    摘要翻译： 光敏聚合物，其包含由式1至3表示的重复单元：其中R1和R3独立地为氢或甲基，R2为C4至C20酸不稳定基团，R4为内酯衍生基团，AR为取代基 或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到芳族环，AR，l，m和n均为正整数，1 /（1 + m + n ）为约0.1至约0.5，m /（1 + m + n）为约0.3至约0.5，并且n /（1 + m + n）为约0.1至0.4。