公开(公告)号：US20090314951A1

公开(公告)日：2009-12-24

申请号：US12143247

申请日：2008-06-20

申请人： Costel Biloiu ,  Craig R. Chaney ,  Eric R. Cobb ,  Bon-Woong Koo ,  Wilhelm P. Platow

发明人： Costel Biloiu ,  Craig R. Chaney ,  Eric R. Cobb ,  Bon-Woong Koo ,  Wilhelm P. Platow

IPC分类号： H01J27/02 ,  B08B6/00

CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024 ,  H01J2237/0458 ,  H01J2237/061

摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.

摘要翻译： 在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。 当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。 等离子体增强化学反应。 在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

公开(公告)号：US20090256081A1

公开(公告)日：2009-10-15

申请号：US12417308

申请日：2009-04-02

申请人： Hiroyasu KAGA

发明人： Hiroyasu KAGA

IPC分类号： H01J3/14

CPC分类号： H01J37/12 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/0805 ,  H01J2237/31745

摘要： An object of the present invention is to provide a focused ion beam apparatus that is capable of obtaining a much larger beam current and forming a focused ion beam with smaller aberration than a conventional focused ion beam apparatus no matter whether the level of acceleration is high or low. The focused ion beam apparatus according to the present invention includes a liquid metal ion source, an extraction electrode for extracting an ion beam from the liquid metal ion source, an acceleration (ground) electrode for accelerating an ion beam, and an electrostatic lens for converging an ion beam. When the acceleration voltage applied to the liquid metal ion source is lower than an emission threshold voltage of the liquid metal ion source, the voltage of the extraction electrode is at a lower potential than the voltage of the acceleration (ground) electrode. The polarity of a voltage applied to the electrostatic lens changes in accordance with the polarity of a voltage applied to the extraction electrode. The present invention makes it possible to exercise a deceleration mode focusing method at a high acceleration voltage from the dielectric strength voltage of an electrostatic lens and exercise an acceleration mode focusing method at a low acceleration voltage with an electrostatic lens having the same focal length as for the deceleration mode focusing method.

摘要翻译： 本发明的目的是提供一种聚焦离子束装置，其能够获得比常规聚焦离子束装置更小的像差的更大的束电流并形成具有更小像差的聚焦离子束，而不管加速度水平是高还是 低。 根据本发明的聚焦离子束装置包括液体金属离子源，用于从液体金属离子源提取离子束的提取电极，用于加速离子束的加速度（接地）电极和用于会聚的静电透镜 离子束。 当施加到液体金属离子源的加速电压低于液体金属离子源的发射阈值电压时，提取电极的电压低于加速度（接地）电极的电压。 施加到静电透镜的电压的极性根据施加到引出电极的电压的极性而变化。 本发明使得可以根据静电透镜的介电强度电压来执行高加速电压的减速模式聚焦方法，并且在具有相同焦距的静电透镜的情况下以低加速度电压锻炼加速模式聚焦方法 减速模式聚焦法。

公开(公告)号：US20090242757A1

公开(公告)日：2009-10-01

申请号：US12310149

申请日：2007-08-03

申请人： Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

发明人： Takashi Ogawa ,  Yo Yamamoto ,  Hiroshi Matsumura

IPC分类号： G01N23/00 ,  H01J3/14

CPC分类号： H01J37/09 ,  H01J37/15 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0458

摘要： There are provided a charged particle beam apparatus and a method of adjusting an axis of an aperture capable of adjusting a position of a center axis of the aperture easily and accurately in a short period of time.A charged particle beam apparatus 1 includes a charged particle source 9, an aperture 18, an object lens 12, observing means 32, an aperture driving portion 19, and a control portion 30. The control portion 30 includes spot pattern forming means 33 for forming a plurality of spot patterns on a surface N1 of a sample N by irradiating a charged particle beam I, analyzing means for calculating a position of a spot center of the spot pattern and a geometrical center position of a halo, and adjusting position determining means 35 for calculating an adjusting position based on a position of intersecting lines of connecting the positions of the spot centers of the respective spot patterns and the center position of the halo, in which a position of the aperture 18 is adjusted by moving the center axis of the aperture 18 to the adjusting position.

摘要翻译： 提供了一种带电粒子束装置和一种在短时间内容易且准确地调整能够调节孔径的中心轴的位置的孔的轴线的方法。 带电粒子束装置1包括带电粒子源9，孔18，物镜12，观察装置32，孔径驱动部分19和控制部分30.控制部分30包括用于形成的斑点图案形成装置33 通过照射带电粒子束I的样品N的表面N1上的多个斑点图案，用于计算斑点图案的斑点中心的位置和光晕的几何中心位置的分析装置，以及调节位置确定装置35 用于基于连接各个斑点图案的光点中心的位置和光晕的中心位置的相交线的位置来计算调节位置，其中通过移动光圈的中心轴来调节光圈18的位置 孔18到调节位置。

公开(公告)号：US07531799B2

公开(公告)日：2009-05-12

申请号：US11802298

申请日：2007-05-22

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Tomonori Nakano

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Tomonori Nakano

IPC分类号： H01J37/00

CPC分类号： H01J37/153 ,  H01J37/1478 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/2611 ,  H01J2237/2809 ,  H01J2237/2817

摘要： A scanning electron microscope includes an electron gun to generate an electron beam, and an electron optical system directing the electron beam to a specimen. The electron optical system includes an objective lens that converges the electron beam to a surface of the specimen, an aberration corrector disposed between the electron gun and the objective lens so as to at least compensate for aberration caused by the objective lens, and a tilter which tilts electron beam to be incident into the aberration corrector. The aberration corrector further compensates for aberration caused by the tilter.

摘要翻译： 扫描电子显微镜包括用于产生电子束的电子枪和将电子束引导到样品的电子光学系统。 电子光学系统包括将电子束会聚到样本表面的物镜，设置在电子枪和物镜之间的像差校正器，以至少补偿由物镜引起的像差，以及倾斜器 倾斜电子束入射到像差校正器中。 像差校正器进一步补偿由倾斜引起的像差。

公开(公告)号：US20080203300A1

公开(公告)日：2008-08-28

申请号：US11835659

申请日：2007-08-08

申请人： Naomasa SUZUKI

发明人： Naomasa SUZUKI

IPC分类号： G01N23/00

CPC分类号： H01J37/09 ,  H01J37/28 ,  H01J2237/0458 ,  H01J2237/0492

摘要： Disclosed is a scanning electron microscope capable of checking an abrupt change of probe current due to changes in intensities of the respective condenser lenses when the probe current is intended to be changed by changing the intensities of the respective condenser lenses. The scanning electron microscope includes: an electron source for generating a beam of electrons; a first and second condenser lenses each for condensing the beam of electrons; an object lens for narrowly focusing the beam of electrons on a sample; a deflecting system for two-dimensionally scanning over the sample; and a detecting system for detecting secondary electrons generated from the sample due to the irradiation of the beam of electrons on the sample. In the scanning electron microscope, a first and second aperture plates each for blocking parts of the beam of electrons unnecessary for the sample are sequentially arranged between the first and second condenser lenses.

摘要翻译： 公开了一种扫描电子显微镜，其能够通过改变各个聚光透镜的强度来检查当想要改变探针电流时由于各个聚光透镜的强度变化而引起的探针电流的突然变化。 扫描电子显微镜包括：用于产生电子束的电子源; 每个用于冷凝电子束的第一和第二聚光透镜; 用于将电子束窄聚焦在样品上的物镜; 用于在样品上二维扫描的偏转系统; 以及用于检测由于样品上的电子束的照射而从样品产生的二次电子的检测系统。 在扫描电子显微镜中，分别用于阻挡样品不需要的电子束的部分的第一和第二孔板依次布置在第一和第二聚光透镜之间。

公开(公告)号：US07378668B2

公开(公告)日：2008-05-27

申请号：US11475014

申请日：2006-06-27

申请人： Sayaka Tanimoto ,  Yasunari Sohda ,  Yasuhiro Someda ,  Masaki Hosoda

发明人： Sayaka Tanimoto ,  Yasunari Sohda ,  Yasuhiro Someda ,  Masaki Hosoda

IPC分类号： H01J3/14 ,  G21K1/08

CPC分类号： H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/3174 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/31774 ,  H01J2237/31776

摘要： In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with a sharp end face (crossover regulation edge) for regulating the height of the crossover on a beam axis. By using the crossover regulation edge to measure the shape of an electron beam, the shape of the beam on the front focal plane of the condenser lens can be always checked even if the height of the crossover formed by an electron gun or the resistance of a source forming lens is changed.

摘要翻译： 在诸如电子束光刻系统的带电粒子束施加装置中，存在促进交叉的位置调整并提高装置的生产量的技术。 聚光透镜的前焦平面设置有用于调节光束轴上的交叉点的高度的尖端（交叉调节边缘）。 通过使用交叉调节边缘来测量电子束的形状，即使电子枪形成的交叉点的高度或电子枪的电阻，也可以始终检查聚光透镜的前焦平面上的光束的形状 源形成透镜改变。

公开(公告)号：US07351983B2

公开(公告)日：2008-04-01

申请号：US11254551

申请日：2005-10-19

申请人： Kiyoshi Sakaguchi

发明人： Kiyoshi Sakaguchi

IPC分类号： H01J37/12

CPC分类号： H01J37/28 ,  H01J37/09 ,  H01J37/12 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/12 ,  H01J2237/2487 ,  H01J2237/31749

摘要： A focused ion beam (FIB) system has an ion beam from an ion source, a condenser lens, a current-limiting aperture, an electrostatic angular aperture control lens, an electrostatic objective lens, and a controller which controls the angular aperture control lens with a polarity with which charged particles are decelerated and the objective lens with a polarity with which the charged particles are accelerated.

摘要翻译： 聚焦离子束（FIB）系统具有来自离子源的离子束，聚光透镜，限流孔，静电角孔控制透镜，静电物镜和控制角孔控制透镜的控制器， 使带电粒子减速的极性和具有加速带电粒子的极性的物镜。

公开(公告)号：US20080073581A1

公开(公告)日：2008-03-27

申请号：US11640931

申请日：2006-12-19

申请人： Tadashi Ikejiri

发明人： Tadashi Ikejiri

IPC分类号： H01J37/08

CPC分类号： H01J37/09 ,  H01J37/304 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/24405 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/30455 ,  H01J2237/31703

摘要： An ion beam irradiating apparatus has: a beam profile monitor 14 which measures a beam current density distribution in y direction of an ion beam 4 in the vicinity of a target 8; movable shielding plate groups 18a, 18b respectively having plural movable shielding plates 16 which are arranged in the y direction so as to be opposed to each other across an ion beam path on an upstream side of the position of the target, the movable shielding plates being mutually independently movable in x direction; shielding-plate driving devices 22a, 22b which reciprocally drive the movable shielding plates 16 constituting the groups, in the x direction in a mutually independent manner; and a shielding-plate controlling device 24 which, on the basis of measurement information obtained by the monitor 14, controls the shielding-plate driving devices 22a, 22b to relatively increase an amount of blocking the ion beam 4 by the opposed movable shielding plates 16 which correspond to a position where a measured y-direction beam current density is relatively large, thereby uniformity of the beam current density distribution in the y direction.

摘要翻译： 离子束照射装置具有：测量靶8附近的离子束4的y方向的束电流密度分布的光束轮廓监视器14; 分别具有多个可移动屏蔽板16的可移动屏蔽板组18a，18b，它们沿着y方向布置成在目标位置的上游侧的离子束路径彼此相对，可移动屏蔽 板可沿x方向相互独立移动; 以相互独立的方式沿x方向往复驱动构成组的可动屏蔽板16的屏蔽板驱动装置22a，22b; 以及屏蔽板控制装置24，其基于由监视器14获得的测量信息来控制屏蔽板驱动装置22a，22b，以相对增加通过相对的可移动屏蔽物阻挡离子束4的量 板16对应于测量的y方向电流密度相对较大的位置，从而在y方向上的束电流密度分布的均匀性。

公开(公告)号：US20070120071A1

公开(公告)日：2007-05-31

申请号：US11594691

申请日：2006-11-08

申请人： Michael Steigerwald ,  Dirk Preikszas ,  Volker Drexel

发明人： Michael Steigerwald ,  Dirk Preikszas ,  Volker Drexel

IPC分类号： G21G5/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/0458 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2448

摘要： An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

摘要翻译： 一种具有用于产生电子束的光束发生器，用于将电子束聚焦在物体上的物镜的电子束装置，以及用于检测物体上分散的或被物体发射的电子的至少一个检测器。 此外，描述了用于检测电子的检测器系统。 利用具有根据本发明的检测器系统的电子束装置，可以以简单的方式进行选择，特别是根据反向散射和二次电子。 同时，使用检测器系统可以检测尽可能多的电子。 为此目的，电子束装置表现出至少一个分配给检测器的可调节膜片。 检测器系统呈现一个检测器，在该检测器上容纳用于将电子反射到检测器上的反射器。

公开(公告)号：US07223983B2

公开(公告)日：2007-05-29

申请号：US11196256

申请日：2005-08-04

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Tomonori Nakano

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Tomonori Nakano

IPC分类号： H01J3/14 ,  H01J37/28

CPC分类号： H01J37/153 ,  H01J37/1478 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/2611 ,  H01J2237/2809 ,  H01J2237/2817

摘要： The present invention provides a charged particle beam column that does not cause displacement of an image or degradation of a resolution of images when a charged particle beam is tilted at a large angle. In the charged particle beam column including an aberration corrector, a deflector is used to control the direction of incidence of the charged particle beam on a second condenser lens but the object point of a condenser lens is not shifted. Consequently, the converging charged particle beam is tilted at a large angle with respect to the surface of a specimen without the necessity of shifting the object point of an objective lens lying on the optical axis of the charged particle beam column. At this time, the aberration corrector prevents a shift of an image or degradation of a resolution derived from the tilt of the charged particle beam.

摘要翻译： 本发明提供一种带电粒子束柱，当带电粒子束以大角度倾斜时，其不会引起图像的位移或图像的分辨率的劣化。 在包括像差校正器的带电粒子束列中，使用偏转器来控制带电粒子束在第二聚光透镜上的入射方向，但聚光透镜的物点不发生偏移。 因此，会聚带电粒子束相对于试样的表面倾斜大角度，而不需要移动位于带电粒子束柱的光轴上的物镜的物点。 此时，像差校正器防止图像的偏移或由带电粒子束的倾斜导致的分辨率的劣化。