公开(公告)号：US07128950B2

公开(公告)日：2006-10-31

申请号：US10754419

申请日：2004-01-08

Applicant: Robert William Bruce ,  John Douglas Evans, Sr.

Inventor： Robert William Bruce ,  John Douglas Evans, Sr.

IPC: C23C14/30

CPC classification number: C23C14/083 ,  C23C14/30 ,  C23C14/548 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.

Abstract translation: 用涂覆设备进行电子束物理气相沉积（EBPVD）处理，以在制品上产生涂层材料（例如，陶瓷热障涂层）。 EBPVD设备通常包括在升高的温度和低于大气压的压力下操作的涂覆室。 涂覆室包含坩埚和由坩埚包围并包含在坩埚内的涂层材料，并且涂层材料具有由坩埚暴露的表面。 该过程需要将电子束投射到涂层材料的表面上，其中电子束限定在涂层材料的表面与坩埚的界面处具有比在表面的中心区域具有更高强度的束图案 涂料。

公开(公告)号：US20060169920A1

公开(公告)日：2006-08-03

申请号：US11046484

申请日：2005-01-28

Applicant: Andrew Gabura ,  Geoffrey Harris

Inventor： Andrew Gabura ,  Geoffrey Harris

IPC: G01K1/08 ,  H01J3/14 ,  H01J37/08

CPC classification number: C23C14/542 ,  C23C14/30 ,  H01J2237/2487 ,  H01J2237/3132

Abstract: An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.

公开(公告)号：US06548946B1

公开(公告)日：2003-04-15

申请号：US09704923

申请日：2000-11-02

Applicant: Thomas Orrin Zengel

Inventor： Thomas Orrin Zengel

IPC: H01J1726

CPC classification number: H01J37/065 ,  H01J2237/3132

Abstract: An electron beam generator having circuit interconnections between individual components that are less prone to the adverse effects of thermal cycling. The generator includes a conductor rod within a guide tube, a center conductor secured to one end of the rod, and an outer conductor secured to the adjacent end of the guide tube. An opposite end of the center conductor has an integrally-formed flange extending radially therefrom. A first tower is secured and electrically connected to the flange, while a second and adjacent tower is electrically connected to the outer conductor. A filament is mounted to and between the first and second towers. A forward leg of the filament circuit comprises the conductor rod, the center conductor, the flange and the first tower, and the return leg of the filament circuit comprises the second tower and the guide tube interconnected by the outer conductor.

Abstract translation: 一种电子束发生器，其具有不易受到热循环的不利影响的各个部件之间的电路互连。 发电机包括导管内的导体杆，固定在杆的一端的中心导体，以及固定到导管相邻端的外导体。 中心导体的相对端具有从其径向延伸的一体形成的凸缘。 第一塔被固定并电连接到凸缘，而第二和相邻的塔电连接到外导体。 灯丝安装在第一和第二塔之间并且在第一和第二塔之间。 灯丝电路的前腿包括导体棒，中心导体，凸缘和第一塔，并且灯丝电路的返回支路包括由外部导体互连的第二塔和导管。

公开(公告)号：US06214408B1

公开(公告)日：2001-04-10

申请号：US09173743

申请日：1998-10-16

Applicant: Martin Bähr ,  Erik Laux

Inventor： Martin Bähr ,  Erik Laux

IPC: B05D306

CPC classification number: H01J37/302 ,  H01J37/3053 ,  H01J2237/30483 ,  H01J2237/3132

Abstract: A method is disclosed for the operation of a high-power electron beam for the vaporization of materials in a target. With this method, static and dynamic deflection errors are corrected. First, the static and dynamic deflection errors are ascertained by means of a teach-in process for concrete spatial coordinates and concrete frequencies of the deflection currents and stored in a memory. For the later operation, this stored data is used in such a way that input geometric data for the incidence points of the electron beam is automatically recalculated into corrected current values which bring about the exact incidence onto the input points. A corresponding procedure takes place with the input of frequencies for the deflection current. The input frequencies are automatically corrected in terms of frequency and amplitude in order to eliminate the frequency-dependent attenuation effects. Both in the correction of the static and in the correction of the dynamic deflection errors it is guaranteed by suitable interpolation methods that even the spatial coordinates and frequencies not considered in the teach-in process are taken into account. Finally, a method is specified with which it is possible by mere specification of a power distribution on a crucible surface to control the electron beam such that the specified data is satisfied.

Abstract translation: 公开了一种用于操作用于目标物质蒸发的高功率电子束的方法。 通过这种方法，可以纠正静态和动态偏移误差。 首先，静态和动态偏移误差是借助于具体的空间坐标和偏转电流的具体频率的教学过程来确定的，并存储在存储器中。 对于稍后的操作，这种存储的数据被使用，使得电子束的入射点的输入几何数据被自动地重新计算成校正的电流值，这导致了对输入点的精确入射。 对于偏转电流的频率输入，进行相应的过程。 输入频率根据频率和幅度自动校正，以消除频率依赖的衰减效应。 在校正静态和校正动态偏转误差方面，都可以通过合适的插值方法来保证即使在教学过程中未考虑的空间坐标和频率也被考虑在内。 最后，指定一种可以通过在坩埚表面上规定功率分布来控制电子束使得满足指定数据的方法。

公开(公告)号：US5753319A

公开(公告)日：1998-05-19

申请号：US400978

申请日：1995-03-08

Applicant: Jamie Knapp ,  Luke Alec LeBlanc

Inventor： Jamie Knapp ,  Luke Alec LeBlanc

IPC: C23C14/08 ,  C23C14/10 ,  C23C14/32 ,  G21K1/06

CPC classification number: B82Y10/00 ,  C23C14/083 ,  C23C14/10 ,  C23C14/32 ,  G21K1/062 ,  G21K2201/067 ,  H01J2237/3132

Abstract: The present invention provides multilayer ion plated coatings comprising a titanium oxide as well as methods for applying such coatings onto a variety of substrates. In particular, the invention provides ion plated transparent multilayer coatings comprising layers of titanium oxide (particularly TiO.sub.x, x.apprxeq.2) and materials of low refractive indices such as SiO.sub.2, Al.sub.2 O.sub.3, MgO etc. Further provided are articles of manufacture comprising such multilayer coatings and novel deposition methods.

Abstract translation: 本发明提供了包含二氧化钛的多层离子电镀涂层以及将这些涂层施加到各种基材上的方法。 特别地，本发明提供了包含二氧化钛（特别是TiO x，x APPROX 2）层和低折射率材料如SiO 2，Al 2 O 3，MgO等的离子镀透明多层涂层。还提供了包括这种多层涂层和 新颖的沉积方法。

公开(公告)号：US5750185A

公开(公告)日：1998-05-12

申请号：US638393

申请日：1996-04-29

Applicant: Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

Inventor： Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

IPC: C23C14/30 ,  C23C14/54 ,  H01J37/304 ,  H01J37/305 ,  B05D3/06

CPC classification number: H01J37/3053 ,  C23C14/30 ,  C23C14/548 ,  H01J37/304 ,  H01J2237/3132

Abstract: A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

Abstract translation: 一种用于多组分蒸发剂的电子束沉积的方法，以确定具有恒定组成和厚度的一致的层质量。 使用所获得的信号作为参考输入，原位测量从电子束冲击点处蒸发器发射的X射线，以控制蒸发过程的参数，从而控制沉积层的沉积速率和材料组成。 该方法用于在例如带钢或塑料膜上生产耐腐蚀，耐高温，耐磨或光学层。

公开(公告)号：US5338913A

公开(公告)日：1994-08-16

申请号：US997596

申请日：1992-12-28

Applicant: Peter W. Finn ,  Larry F. Willitzer ,  Karl-Heinz Maurer

Inventor： Peter W. Finn ,  Larry F. Willitzer ,  Karl-Heinz Maurer

IPC: C23C14/30 ,  H01J37/305 ,  B23K15/00

CPC classification number: C23C14/30 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam gun with liquid cooled rotatable crucible is disclosed including a metallic bellows connected to the housing for the rotatable crucible at a 90.degree. angle and the bellows contractible to a minimum length that is a straight line between the axis of the housing and the remote end of the bellows with the bellows permitting rotation about the housing axis as the crucible is rotated to place different pockets in target position of the E-gun.

Abstract translation: 公开了一种具有液体冷却的可旋转坩埚的电子束枪，其包括连接到用于可旋转坩埚的壳体的金属波纹管，角度为90度，并且波纹管可收缩到最小长度，该最小长度是在壳体的轴线和远程 波纹管的端部，当波纹管允许在坩埚旋转时绕壳体轴线旋转，以将不同的口袋放置在电子枪的目标位置。

公开(公告)号：US5138232A

公开(公告)日：1992-08-11

申请号：US716788

申请日：1991-06-18

Applicant: Reiner Schleiff ,  Tomas Baumecker ,  Vladimir Ibl

Inventor： Reiner Schleiff ,  Tomas Baumecker ,  Vladimir Ibl

IPC: H01J37/04 ,  H01J37/06 ,  H01J37/24 ,  H01J37/248

CPC classification number: H01J37/243 ,  H01J2237/06308 ,  H01J2237/3132

Abstract: The invention described here is concerning a power supply device of a thermionic emitting cathode, an electron source in an electron vapor deposition plant. This device is provided with a transmitter whose secondary feeds the thermionic emitting cathode and whose primary is supplied with pulse width modulated and controlled heater current (I.sub.HC). The control of this heater current (I.sub.HC) is provided directly by introducing the heater current nominal value (I.sub.HC nominal) from the outside or in a manner that the current emitted (I.sub.EC) from the thermionic emitting cathode is monitored and fed galvanically decoupled to the controller. Here the galvanic decoupled connection is achieved by a pulse width modulated, optical signal.

Abstract translation: 这里描述的本发明涉及一种热电子发射阴极的电源装置，一种电子气相沉积装置中的电子源。 该装置具有发射器，其二次供给热电子发射阴极并且其初级被提供脉冲宽度调制和控制的加热器电流（IHC）。 通过从外部引入加热器电流标称值（IHC标称值）直接提供对该加热器电流（IHC）的控制，或者使得从热离子发射阴极发射的电流（IEC）被监控并且被电流去耦到 控制器。 这里通过脉宽调制的光信号实现电流去耦连接。

公开(公告)号：US5111022A

公开(公告)日：1992-05-05

申请号：US397521

申请日：1989-08-23

Applicant: James L. Harper ,  Charles H. Hill

Inventor： James L. Harper ,  Charles H. Hill

IPC: C23C14/30 ,  H01J37/305

CPC classification number: H01J37/3053 ,  C23C14/30 ,  H01J2237/002 ,  H01J2237/3132

Abstract: A circulating coolant reservoir is used to uniformly cool a removable crucible in an electron beam gun assembly for vaporizing material to be deposited at another location. The outer surface of the crucible is substantially immersed in the coolant reservoir and coolant is circulated around the outer surface from diametrically opposed inlet and outlet lines whose axes are tangent to the reservoir walls and with an upwardly spiraling groove in the crucible outer surface.

Abstract translation: 循环冷却剂储存器用于均匀地冷却电子束枪组件中的可移除的坩埚，以便蒸发待在另一位置沉积的材料。 坩埚的外表面基本上浸没在冷却剂储存器中，并且冷却剂在径向相对的入口和出口管线周围围绕外表面循环，其入口和出口管线的轴线与储存器壁相切，并且在坩埚外表面中具有向上螺旋形的槽。