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138 条记录 (耗时 0.015 秒)

    Process for production of molded composites
    71.
    发明授权
    Process for production of molded composites 失效
    模塑复合材料的生产工艺

    公开(公告)号：US4776992A

    公开(公告)日：1988-10-11

    申请号：US888914

    申请日：1986-07-25

    申请人： Edward Irving ,  Terence J. Smith

    发明人： Edward Irving ,  Terence J. Smith

    IPC分类号： B05D7/24 ,  B05D3/06 ,  B29C35/08 ,  B29C37/00 ,  B29C41/02 ,  B29K61/04 ,  B29K63/00 ,  B29K105/08 ,  C08F2/48 ,  C08G8/28 ,  C08G18/28 ,  C08G59/16 ,  C08J5/00 ,  C08J5/04 ,  C08L61/06

    CPC分类号： B29C37/0032 ,  C08G18/28 ,  C08G59/1461 ,  C08G8/28 ,  C08J5/00 ,  C08J5/04 ,  C08J5/24 ,  C08L61/06 ,  B29C2035/0833 ,  B29C2037/0035 ,  Y10S430/148 ,  Y10S522/913

    摘要： Coated, reinforced composites are prepared by a process in which(i) a liquid composition comprising a photocurable residue and a residue having at least one epoxide group or phenolic hydroxyl group is applied to the surface of a mould,(ii) the composition is exposed to actinic radiation until it solidifies,(iii) reinforcement and a thermosettable composition are applied to the solidified layer, this composition containing an epoxide resin or a phenolic resin,(iv) the assembly is heated to form a cured moulding, and(v) the moulding is removed from the mould.The composition used in the first stage may be a mixture of a photocurable resin and an epoxide or phenolic resin, or a dual-functional resin having, in the same molecule, at least one photocurable group and at least one epoxide or phenolic hydroxyl group, which resin photocures in stage (ii) to produce a thermosettable resin, or it may be an epoxide resin or a phenolic resin together with a curing agent that is activated by heat and one that is activated by actinic radiation.

    摘要翻译： 涂覆的增强复合材料通过以下方法制备，其中（i）包含可光固化残余物和具有至少一个环氧基团或酚羟基的残基的液体组合物施加到模具的表面，（ii）组合物暴露 （iii）将增强物和可热固组合物施加到固化层上，该组合物含有环氧树脂或酚醛树脂，（iv）将组合物加热以形成固化的模塑件，和（v） 模具从模具中取出。 在第一阶段中使用的组合物可以是光固化树脂和环氧化物或酚醛树脂的混合物，或者在相同分子中具有至少一个光固化基团和至少一个环氧化物或酚羟基的双官能树脂， 阶段（ii）中的树脂光固化以产生可热固化的树脂，或者它可以是环氧树脂或酚醛树脂以及由热激活的固化剂和由光化辐射活化的固化剂。

    Physical development utilizing 1-phenyl-3-pyrazolidone or a benzene diamine combined with a polyhydroxybenzene in acidic medium
    75.
    发明授权
    Physical development utilizing 1-phenyl-3-pyrazolidone or a benzene diamine combined with a polyhydroxybenzene in acidic medium 失效
    在酸性介质中使用与苯甲酸组合的1-苯基-3-吡唑烷酮或苯并二苯胺的物理开发

    公开(公告)号：US3713824A

    公开(公告)日：1973-01-30

    申请号：US3713824D

    申请日：1970-01-05

    申请人： ITEK CORP

    发明人： MANHARDT J

    IPC分类号： G03C1/705 ,  G03C5/58 ,  G03C5/24

    CPC分类号： G03C1/705 ,  G03C5/58 ,  Y10S430/148

    摘要： THIS INVENTION RELATES TO PHYSICAL DEVELOPMENT OF A PHOTOGRAPHIC REPRODUCTION SYSTEM WITH A PHYSICAL DEVELOPER. THE STEP OF PHYSICAL DEVELOPMENT COMPRISES CONTACTING AN EXPOSED PHOTOSENSITIVE LAYER CONTAINING THE OXIDIZING COMPONENT OF A CHEMICAL REDOX SYSTEM, SUCH AS SILVER NITRATE, WITH THE REDUCING COMPONENT OF THE REDOX SYSTEM WHERE THE REDUCING COMPONENT IS A MIXTURE OF A SLOW-ACTING REDUCING AGENT AND A FAST-ACTING REDUCING AGENT. THE USE OF A MIXED REDUCING AGENT AS DESCRIBED PERMITS DEVELOPMENT OF IMAGES OF IMPROVED DENSITY AND CONTRAST BECAUSE DEVELOPMENT INITIATES AND TAKES PLACE WITHIN THE PHOTOSENSITIVE LAYER RATHER THAN ON ITS SURFACE OR BEYOND ITS SURFACE AS TYPICALLY ENCOUNTERED WITH PRIOR ART DEVELOPERS. AN OVERALL PROCESS IN ACCORDANCE WITH THE INVENTION COMPRISES SELECTIVELY EXPOSING THE REPRODUCTION SYSTEM TO ACTIVATING RADIATION AND DEVELOPING IN THE MANNER ABOVE DESCRIBED. A PORTION OR ALL OF THE OXIDIZING COMPONENT OF THE REDOX SYSTEM MAY BE CONTAINED WITHIN THE PHOTOSENSITIVE LAYER AT THE TIME OF EXPOSURE TO GIVE A DIRECT READ-OUT OR IT IS POSSIBLE TO APPLY ALL OF THE OXIDIZING COMPONENT AT A TIME SUBSEQUENT TO EXPOSURE FOLLOWED BY CONTACT WITH THE REDUCING PORTION OF THE REDOX SYSTEM. A PHOTOSENSITIVE LAYER COMPRISING A PHOTOCONDUCTOR THAT BECOMES REVERSIBLY ACTIVATED UPON EXPOSURE TO ACTIVATING RADIATION IS PREFERRED. TITANIUM DIOXIDE HAVING A PARTICLE SIZE LESS THAN ABOUT 250 MILLIMICRONS AND WHICH HAS BEEN HEATED AT A TEMPERATURE BETWEEN ABOUT 200* C. AND 950* C. IS THE PREFERRED PHOTOCONDUCTOR.

    Method of producing pattern-formed structure and photomask used in the same
    78.
    发明授权
    Method of producing pattern-formed structure and photomask used in the same 有权
    产生图案形成结构的方法和使用的光掩模

    公开(公告)号：US07846647B2

    公开(公告)日：2010-12-07

    申请号：US10922217

    申请日：2004-08-18

    申请人： Hironori Kobayashi

    发明人： Hironori Kobayashi

    IPC分类号： G03F7/26 ,  G03F7/20

    CPC分类号： B82Y30/00 ,  G03F7/0007 ,  G03F7/001 ,  G03F7/11 ,  G03F7/2014 ,  Y10S430/148

    摘要： The present invention discloses a method of producing a pattern-formed structure, comprising the processes of: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 μm therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer. According to this method, a highly precise pattern can be formed without necessity to carry out any post-treatment after exposure. Further, there is no concern that the pattern-formed structure itself deteriorates because the produced pattern-formed structure is free of the photocatalyst.

    摘要翻译： 本发明公开了一种图案形成结构的制造方法，其特征在于，包括以下工序：制备具有特征可修改层的图案形成结构的基板，其表面的特性可以通过光催化剂的作用进行改性; 制备含有形成在基材上的含光催化剂层的含光催化剂的层侧基材，含有光催化剂的层含有光催化剂; 将图案形成结构的基板和含有光催化剂的层侧基板排列成使得特征可修改层面对含有光催化剂的层，间隙不大于200μm; 以及从预定方向向特征可修改层照射能量，并修改特征可修饰层的表面的特性，从而在特征可修饰层形成图案。 根据该方法，可以形成高精度图案，而不需要在曝光后进行任何后处理。 此外，由于所生成的图案形成结构体不含光催化剂，因此不会担心图案形成结构本身会劣化。

    Laser patterning method for fabricating disc stamper
    79.
    发明授权
    Laser patterning method for fabricating disc stamper 失效
    用于制造圆盘压模的激光图案化方法

    公开(公告)号：US07741006B2

    公开(公告)日：2010-06-22

    申请号：US11743678

    申请日：2007-05-03

    申请人： Chin-Tien Yang ,  Ming-Fang Hsu ,  Sheng-Li Chang ,  Tzuan-Ren Jeng

    发明人： Chin-Tien Yang ,  Ming-Fang Hsu ,  Sheng-Li Chang ,  Tzuan-Ren Jeng

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/40

    CPC分类号： C25D1/10 ,  C23C18/00 ,  Y10S430/146 ,  Y10S430/148 ,  Y10S430/151

    摘要： A method for fabricating a disc stamper is provided. First, a substrate is provided. Next, a layer of a coatable inorganic material is coated on the substrate, wherein the coatable inorganic material is an oxide, in which the chemical element constitution is more than one element selected from the group consisting of Te, Al, Zr, and Ti. Next, a laser beam is utilized to perform direct write on the layer of the coatable inorganic material to form a relief pattern. Thereafter, a metal layer is electroplated on the relief pattern. Next, the metal layer is separated from the relief pattern. The layer of the coatable inorganic material is utilized to form the relief pattern, so that it is more compatibility to equipment apparatus and lower cost in contrast with sputtered PTM process.

    摘要翻译： 提供了一种用于制造盘压模的方法。 首先，提供基板。 接下来，在基材上涂布可涂覆无机材料层，其中可涂覆无机材料是氧化物，其中化学元素组成是选自Te，Al，Zr和Ti中的一种以上的元素。 接下来，利用激光束对可涂覆无机材料的层进行直接写入以形成浮雕图案。 此后，在浮雕图案上电镀金属层。 接下来，金属层与浮雕图案分离。 使用可涂覆无机材料层形成浮雕图案，与溅射PTM工艺相比，其与设备设备的兼容性更低，成本更低。

    Photosensitive lithographic printing plate and method for making a printing plate
    80.
    发明授权
    Photosensitive lithographic printing plate and method for making a printing plate 有权
    感光平版印刷版和制版印版的方法

    公开(公告)号：US07316887B2

    公开(公告)日：2008-01-08

    申请号：US11299792

    申请日：2005-12-13

    申请人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

    发明人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

    IPC分类号： G03C1/00

    CPC分类号： G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/2055 ,  Y10S430/146 ,  Y10S430/148

    摘要： A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 μJ/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0

    摘要翻译： 感光性平版印刷版包括在支撑体上依次形成的感光层和保护层，其中感光层在390〜430nm的波长范围内具有光谱灵敏度的最大峰值，光敏平版印刷的最小曝光 波长410nm的图像形成用印刷板（S410）为至多100μJ/ cm 2以下，波长为450nm的图像形成的最小曝光（S450）与 波长410nm的图像形成的最小曝光（S410）为0