公开(公告)号：US20120019835A1

公开(公告)日：2012-01-26

申请号：US13146428

申请日：2009-12-15

Applicant: Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

IPC: G01B11/30 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

Abstract: Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

Abstract translation: 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测来进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

公开(公告)号：US20110255074A1

公开(公告)日：2011-10-20

申请号：US13172233

申请日：2011-06-29

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/17 ,  G01J4/00

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.

Abstract translation: 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

公开(公告)号：US07965386B2

公开(公告)日：2011-06-21

申请号：US12964249

申请日：2010-12-09

Applicant: Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima

Inventor： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/9503

Abstract: A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.

Abstract translation: 缺陷检查装置能够以高灵敏度和高速检查诸如半导体衬底或薄膜衬底的样品的顶部和边缘表面上存在的极小缺陷。 缺陷检查装置具有照明光学系统，多个检测光学单元和信号处理器。 一个或多个检测光学单元接收从样品的边缘部分衍射的光或从夹持样品的边缘把手衍射的光。 一个或多个检测光学单元基于通过监视由检测光学单元接收的衍射光的强度而获得的信号来屏蔽由检测光学单元接收的衍射光，以便检查位于边缘部分附近的样本部分 以及位于边缘把手附近的样品部分。

公开(公告)号：US20110075134A1

公开(公告)日：2011-03-31

申请号：US12964176

申请日：2010-12-09

Applicant: Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

Inventor： Sachio UTO ,  Hiroyuki Nakano ,  Yukihiro Shibata ,  Akira Hamamatsu ,  Yuta Urano

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: An apparatus for inspecting a specimen includes a first illumination unit having a laser light source and a first optical component for illuminating a specimen on which patterns are formed with a laser from a first elevation angle direction, a second illuminating unit having a light source and a second optical component for illuminating the specimen from a second elevation angle direction which is greater than the first elevation angle, a first detection optical unit which detects light from the specimen illuminated by the first illumination unit, a second detection optical unit which detects light from the specimen illuminated by the second illumination unit, and a signal processing unit which processes signals output from the first detector to detect defects in a first area on the specimen and processes signals output from the second detector to detect defects in a second area on the specimen.

Abstract translation: 一种用于检查试样的装置包括具有激光光源的第一照明单元和用于照射具有来自第一仰角方向的激光形成图案的样本的第一光学部件，具有光源的第二照明单元和 第二光学部件，用于从大于所述第一仰角的第二仰角方向照射所述试样;第一检测光学单元，其检测来自所述第一照明单元照射的样本的光;第二检测光学单元， 由第二照明单元照射的样本，以及信号处理单元，处理从第一检测器输出的信号，以检测样本上的第一区域中的缺陷，并处理从第二检测器输出的信号，以检测样本上的第二区域中的缺陷。

公开(公告)号：US20100265496A1

公开(公告)日：2010-10-21

申请号：US12827470

申请日：2010-06-30

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/00 ,  G06K9/00

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US20100182602A1

公开(公告)日：2010-07-22

申请号：US12647246

申请日：2009-12-24

Applicant: Yuta URANO ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

Inventor： Yuta URANO ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC: G01N21/88 ,  G01J4/00

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/956

Abstract: A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

Abstract translation: 提供了一种图案检查装置，用于将形成为相同的图案的彼此对应的区域的图像进行比较，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。

公开(公告)号：US20100149528A1

公开(公告)日：2010-06-17

申请号：US12713500

申请日：2010-02-26

Applicant: Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method for inspecting a defect of a surface of a sample, includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiation, correcting errors of detection timings for the plurality of scattered light rays detected in the detection step, and determining a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting errors of detection timings.

Abstract translation: 用于检查样品表面的缺陷的方法包括将多个激光束照射在样品表面上多次，使得样品表面上的激光束的照明场的至少一部分照射样品的第一区域 在多次照射中检测来自第一区域的多个散射光，校正检测步骤中检测到的多个散射光的检测定时的误差，并且确定缺陷 根据检测定时的校正误差，基于多个散射光线在样品表面上。

公开(公告)号：US20100060895A1

公开(公告)日：2010-03-11

申请号：US12506421

申请日：2009-07-21

Applicant: Yoshimasa OSHIMA ,  Yuta URANO ,  Toshiyuki NAKAO

Inventor： Yoshimasa OSHIMA ,  Yuta URANO ,  Toshiyuki NAKAO

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N2021/4707 ,  G01N2021/4709 ,  G01N2021/8864

Abstract: Scattered light that originates from the surface roughness of silicon or other metallic films is distributed more strongly at positions closer to the starting position of the scattering. Of all scattered-light detection signals obtained during multi-directional detection, therefore, only a detection signal of forward scattered light can be used to detect micro-defects, and only a detection signal of backward scattered light can be used to detect the surface roughness very accurately.

Abstract translation: 源于硅或其他金属膜的表面粗糙度的散射光在更靠近散射开始位置的位置分布得更强。 因此，在多方向检测中获得的所有散射光检测信号中，只能使用前向散射光的检测信号来检测微缺陷，只能使用后向散射光的检测信号来检测表面粗糙度 非常准确。

公开(公告)号：US20090290168A1

公开(公告)日：2009-11-26

申请号：US12470505

申请日：2009-05-22

Applicant: Akira HAMAMATSU ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiuki Nakao ,  Shigenobu Maruyama

Inventor： Akira HAMAMATSU ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30 ,  G01B11/06

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: To inspect a substrate such as a semiconductor substrate for surface roughness at high precision.The surface roughness of the substrate is measured in each frequency band of the surface roughness by applying a light to the substrate surface and detecting a scattered light or reflected light at a plurality of azimuth or elevation angles.

Abstract translation: 以高精度检查用于表面粗糙度的半导体基板等基板。 通过向基板表面施加光并以多个方位角或仰角检测散射光或反射光，测量表面粗糙度的每个频带中的基板的表面粗糙度。

公开(公告)号：US20090195775A1

公开(公告)日：2009-08-06

申请号：US12362950

申请日：2009-01-30

Applicant: Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

IPC: G01N21/88 ,  G06F19/00

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method for inspecting a defect of a surface of a sample includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiations, correcting errors of detection timings for the plurality of detected scattered light rays, correcting at least one of adding and averaging the plurality of scattered light rays, determining a defect on the sample surface based on a calculation result in accordance with the at least one of the adding and averaging.

Abstract translation: 用于检查样品表面的缺陷的方法包括：将激光束多次照射在样品表面上，使得样品表面上的激光束的照明场的至少一部分照射样品表面的第一区域 多次检测由多次照射引起的来自第一区域的多个散射光线，校正多个检测到的散射光线的检测定时的误差，校正至少一个加法和平均化 多个散射光线，根据加法和平均中的至少一个，基于计算结果确定样品表面上的缺陷。