公开(公告)号：US08199314B2

公开(公告)日：2012-06-12

申请号：US13288133

申请日：2011-11-03

Applicant: Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

Inventor： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70783

Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

Abstract translation: 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没扫描仪的覆盖性能的方法，该扫描仪包括设置在其中的水通道中的具有透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供连接到晶片台输入和晶片台输出中的至少一个的水箱; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。

公开(公告)号：US20110115057A1

公开(公告)日：2011-05-19

申请号：US12619460

申请日：2009-11-16

Applicant: Yu-Chyi Harn ,  Sophia Wang ,  Chun-Hung Lin ,  Hsien-Wei Chen ,  Ming-Yen Chiu

Inventor： Yu-Chyi Harn ,  Sophia Wang ,  Chun-Hung Lin ,  Hsien-Wei Chen ,  Ming-Yen Chiu

IPC: H01L23/544 ,  H01L21/71 ,  H01L21/26

CPC classification number: G03F9/7084 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method and device for pattern alignment are disclosed. The device can include an exposure field; a die within the exposure field, wherein the die comprises an integrated circuit region, a seal ring region, and a corner stress relief region; and a die alignment mark disposed between the seal ring region and the corner stress relief region.

Abstract translation: 公开了一种用于图案对准的方法和装置。 该装置可以包括曝光场; 在所述曝光场内的管芯，其中所述管芯包括集成电路区域，密封环区域和拐角应力释放区域; 以及设置在密封环区域和角部应力消除区域之间的模具对准标记。

公开(公告)号：US07923076B2

公开(公告)日：2011-04-12

申请号：US11644861

申请日：2006-12-21

Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

IPC: H05H1/24 ,  C23C16/00

CPC classification number: C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

Abstract: A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 of 0° to 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting apparatus is placed in the chamber and over the pedestal. The gas-extracting apparatus comprises a gas-extracting pipe providing a pumping path for particles and side-products having a pumping direction angle θ2 of 0° to 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe.

Abstract translation: 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有在基座的法线方向与等离子体射流的排出方向之间的0°至90°之间的放电方向角度θ。 气体提取装置放置在腔室中并且在基座上方。 气体提取装置包括：气体提取管，其提供用于颗粒的泵送路径和具有泵送方向角度的副产物;在基座的法线方向和气体提取装置的泵送方向之间为0°至90°的2°; 抽管。

公开(公告)号：US07850186B2

公开(公告)日：2010-12-14

申请号：US12076961

申请日：2008-03-26

Applicant: Yuan-Chih Cheng ,  Chun-Hung Lin

Inventor： Yuan-Chih Cheng ,  Chun-Hung Lin

IPC: B62K3/02

CPC classification number: B62K19/30 ,  B62H3/12 ,  B62H5/003 ,  B62K3/04

Abstract: A bicycle frame includes a head tube, a seat tube and at least one tube connected between the head tube and the seat tube. The at least one tube includes a first longitudinal tube connected to the head tube and a second longitudinal tube connected to the seat tube, a transverse tube is connected between the first and second longitudinal tubes. The transverse tube includes a receiving space in which a lock or a light device is received.

Abstract translation: 自行车车架包括头管，座管和连接在头管和座管之间的至少一个管。 所述至少一个管包括连接到所述头管的第一纵向管和连接到所述座管的第二纵向管，横管连接在所述第一和第二纵管之间。 横管包括容纳空间，在该容纳空间中容纳锁或灯装置。

公开(公告)号：US20100113519A1

公开(公告)日：2010-05-06

申请号：US12609392

申请日：2009-10-30

Applicant: Chun-Hung Lin ,  Ching-Wen Ho

Inventor： Chun-Hung Lin ,  Ching-Wen Ho

IPC: A61K31/454 ,  A61K31/4468 ,  A61K31/45 ,  C07D211/58 ,  A61P19/02 ,  C07D211/40

CPC classification number: C07D211/40 ,  C07D211/58 ,  C07D401/10 ,  C07D405/10

Abstract: 1,5-Dideoxy-1,5-imino-D-glucitol compounds as shown in the specification. Also disclosed is a method of treating a hexosaminidase-associated disease.

Abstract translation: 1,5-二脱氧-1,5-亚氨基-D-葡萄糖醇化合物，如说明书所示。 还公开了一种治疗氨基糖苷酶相关疾病的方法。

公开(公告)号：US20100025022A1

公开(公告)日：2010-02-04

申请号：US12356078

申请日：2009-01-20

Applicant: Chiwei Tien ,  Chun-Hung Lin ,  Chien-Ming Su ,  Wen-Yu Wu ,  Min-Yuan Lin

Inventor： Chiwei Tien ,  Chun-Hung Lin ,  Chien-Ming Su ,  Wen-Yu Wu ,  Min-Yuan Lin

IPC: F24H3/02 ,  F04D29/42 ,  F28F27/00

CPC classification number: G06F1/20 ,  H01L23/467 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A fan assembly for use in an electronic device is provided. The fan assembly includes a housing, a fan, a throttle valve, and a regulator. The housing has an outlet. The fan is disposed in the housing and adapted to provide an air current. The air current generates an air volume through the outlet. The throttle valve is movably disposed in the housing at the outlet. The regulator is connected to the throttle valve to control the movement of the throttle valve to adjust the size of the outlet.

Abstract translation: 提供了一种用于电子设备的风扇组件。 风扇组件包括外壳，风扇，节流阀和调节器。 房屋有一个出口。 风扇设置在壳体中并适于提供气流。 气流通过出口产生空气量。 节流阀可移动地设置在出口处的壳体中。 调节器连接到节流阀，以控制节流阀的运动，以调节出口的尺寸。

公开(公告)号：US20090212526A1

公开(公告)日：2009-08-27

申请号：US12071415

申请日：2008-02-21

Applicant: Chun-Hung Lin

Inventor： Chun-Hung Lin

IPC: B62K3/02

CPC classification number: B62K13/02 ,  B62K3/06 ,  B62K15/00 ,  B62K19/06 ,  B62K19/24

Abstract: A bicycle frame includes a front part and a rear part. The front part includes head tube, a seat tube and a down tube connected between the head tube and the seat tube. A first connection portion is connected to the conjunction portion of the seat tube and the down tube. The rear part includes a second connection portion, a connection plate extending from a top end of the second connection portion, and two chain stays and two seat stays extending from the connection plate. The connection plate is fixed to the seat tube by at least one bolt, and the first and second connection portions are connected to each other by at least two bolts. The first connection portion includes a ridge which is engaged with the groove defined in the second connection portion.

Abstract translation: 自行车车架包括前部和后部。 前部包括头管，座管和连接在头管和座管之间的下管。 第一连接部分连接到座管和下管的连接部分。 后部包括第二连接部分，从第二连接部分的顶端延伸的连接板，以及从连接板延伸的两个链条支柱和两个座椅支架。 连接板通过至少一个螺栓固定到座管，并且第一和第二连接部通过至少两个螺栓彼此连接。 第一连接部分包括与限定在第二连接部分中的槽接合的脊。

公开(公告)号：US20090169822A1

公开(公告)日：2009-07-02

申请号：US12343540

申请日：2008-12-24

Applicant: Chih-Wei Chen ,  Chin-Jyi Wu ,  Wen-Tzong Hsieh ,  Wen-Tung Hsu ,  Chun-Hung Lin

Inventor： Chih-Wei Chen ,  Chin-Jyi Wu ,  Wen-Tzong Hsieh ,  Wen-Tung Hsu ,  Chun-Hung Lin

IPC: B32B5/18 ,  B05D1/00 ,  B05D1/08 ,  B05D1/04 ,  B32B3/00

CPC classification number: G02B1/118 ,  B32B1/08 ,  C23C4/00 ,  Y10T428/24496 ,  Y10T428/24612

Abstract: A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.

Abstract translation: 提供一种制造防反射结构的方法。 该方法包括以下步骤：首先，在被动对象区域中提供被处理对象。 接下来，在反应区域中设置等离子体源。 然后，等离子体源被离子化以在大气压下形成等离子体。 接下来，待处理物体的表面通过等离子体处理，以在待处理物体的表面上形成多个微突起。

公开(公告)号：US07532300B2

公开(公告)日：2009-05-12

申请号：US11503191

申请日：2006-08-14

Applicant: Huang-Chin Tang ,  Chun-Hung Lin ,  Chih-Wei Chen ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chin-Yang Lee

Inventor： Huang-Chin Tang ,  Chun-Hung Lin ,  Chih-Wei Chen ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chin-Yang Lee

IPC: G02F1/13 ,  C09K19/00

CPC classification number: G02F1/13378 ,  Y10T428/1005

Abstract: A method for producing an alignment layer for a liquid crystal panel, which is produced by modifying an alignment film in a fixed direction and at a fixed angle by using an atmospheric pressure plasma source to form a uniform and isotropic alignment layer on the surface of the substrate. The resultant alignment layer has good uniformity and high anchoring energy, and the pre-tilt angle can be selected as desired. In addition, there are no problems with static charge generation, dust pollution and the like as in the prior arts. The method of the present invention is not restricted by vacuum apparatuses that need ion alignment or vacuum plasma alignment and the like and is not restricted by the size of the equipment. Therefore, the method of the present invention is suitable for treating the surface of an alignment layer of a large size liquid crystal panel.

Abstract translation: 一种用于制造液晶面板取向层的方法，其通过使用大气压等离子体源在固定方向和固定角度下修正取向膜而在其表面上形成均匀且各向同性的取向层 基质。 所得到的取向层具有良好的均匀性和较高的锚固能，并且可以根据需要选择预倾角。 此外，与现有技术相同，静电荷产生，粉尘污染等没有问题。 本发明的方法不受需要离子对准或真空等离子体对准等的真空装置的限制，并且不受设备尺寸的限制。 因此，本发明的方法适用于处理大尺寸液晶面板的取向层的表面。

公开(公告)号：US07507313B2

公开(公告)日：2009-03-24

申请号：US11527443

申请日：2006-09-27

Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

IPC: C23F1/00 ,  H01L21/306

CPC classification number: H01J37/32825 ,  G02F1/1303 ,  G02F2001/1316 ,  G03F7/427 ,  H01J37/32366 ,  H01J37/32623 ,  H05H2001/3463

Abstract: A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.

Abstract translation: 公开了一种从基板上去除膜的膜去除方法和装置。 该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上， 为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物 条件。