利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

32 条记录 (耗时 0.037 秒)

    System and Method For Improving Immersion Scanner Overlay Performance
    1.
    发明申请
    System and Method For Improving Immersion Scanner Overlay Performance 有权
    提高浸入式扫描仪覆盖性能的系统和方法

    公开(公告)号：US20080129969A1

    公开(公告)日：2008-06-05

    申请号：US11677949

    申请日：2007-02-22

    申请人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

    发明人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70783

    摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

    摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没式扫描仪的覆盖性能的方法，其包括设置在其中的水通道中的透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供一个水箱至少一个晶片台输入和晶片台输出; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。

    Litho cluster and modulization to enhance productivity
    8.
    发明授权
    Litho cluster and modulization to enhance productivity 有权
    Litho集群和模块化以提高生产力

    公开(公告)号：US08903532B2

    公开(公告)日：2014-12-02

    申请号：US13429921

    申请日：2012-03-26

    申请人： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

    发明人： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

    IPC分类号： H01L31/18

    CPC分类号： G03F7/30 ,  G03F7/16 ,  G03F7/70991 ,  H01L21/67225 ,  H01L21/67745

    摘要： The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.

    摘要翻译： 本公开涉及一种用于半导体工件加工的平版印刷工具装置。 光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。 通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。 所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。 光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。

    Litho Cluster and Modulization to Enhance Productivity
    9.
    发明申请
    Litho Cluster and Modulization to Enhance Productivity 有权
    Litho集群和模块化以提高生产力

    公开(公告)号：US20130252175A1

    公开(公告)日：2013-09-26

    申请号：US13429921

    申请日：2012-03-26

    申请人： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

    发明人： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

    IPC分类号： G03F7/20 ,  H01L21/00

    CPC分类号： G03F7/30 ,  G03F7/16 ,  G03F7/70991 ,  H01L21/67225 ,  H01L21/67745

    摘要： The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.

    摘要翻译： 本公开涉及一种用于半导体工件加工的平版印刷工具装置。 光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。 通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。 所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。 光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。