Fabrication of floating guard rings using selective regrowth
    85.
    发明授权
    Fabrication of floating guard rings using selective regrowth 失效
    使用选择性再生长制造浮动护环

    公开(公告)号:US08592298B2

    公开(公告)日:2013-11-26

    申请号:US13335355

    申请日:2011-12-22

    IPC分类号: H01L21/3205

    摘要: A method for fabricating edge termination structures in gallium nitride (GaN) materials includes providing a n-type GaN substrate having a first surface and a second surface, forming an n-type GaN epitaxial layer coupled to the first surface of the n-type GaN substrate, and forming a growth mask coupled to the n-type GaN epitaxial layer. The method further includes patterning the growth mask to expose at least a portion of the n-type GaN epitaxial layer, and forming at least one p-type GaN epitaxial structure coupled to the at least a portion of the n-type GaN epitaxial layer. The at least one p-type GaN epitaxial structure comprises at least one portion of an edge termination structure. The method additionally includes forming a first metal structure electrically coupled to the second surface of the n-type GaN substrate.

    摘要翻译: 一种用于制造氮化镓(GaN)材料中的边缘端接结构的方法包括提供具有第一表面和第二表面的n型GaN衬底,形成耦合到n型GaN的第一表面的n型GaN外延层 并且形成耦合到n型GaN外延层的生长掩模。 该方法进一步包括图案化生长掩模以暴露n型GaN外延层的至少一部分,以及形成耦合到n型GaN外延层的至少一部分的至少一个p型GaN外延结构。 所述至少一个p型GaN外延结构包括边缘端接结构的至少一部分。 该方法还包括形成电耦合到n型GaN衬底的第二表面的第一金属结构。

    Integrated vapor delivery systems for chemical vapor deposition precursors
    86.
    发明授权
    Integrated vapor delivery systems for chemical vapor deposition precursors 有权
    用于化学气相沉积前体的综合蒸汽输送系统

    公开(公告)号:US08571817B2

    公开(公告)日:2013-10-29

    申请号:US12208255

    申请日:2008-09-10

    IPC分类号: G01F1/34

    CPC分类号: C23C16/4482 C23C16/52

    摘要: One disclosed feature of the embodiments is a control processor in a vapor delivery system for chemical vapor deposition precursors. A pressurization rate processor calculates first and second pressurization rate curves at first and second time instants. A volume calculator computes consumed volume based on first and second volumes at the respective first and second time instants. The first and second volumes are computed using slopes of lines fitting the first and second pressurization rate curves.

    摘要翻译: 实施例的一个公开的特征是用于化学气相沉积前体的蒸气输送系统中的控制处理器。 加压率处理器计算第一和第二时刻的第一和第二加压速率曲线。 体积计算器基于相应的第一和第二时刻的第一和第二体积计算消耗的体积。 使用适合第一和第二加压速率曲线的线的斜率来计算第一和第二体积。